Roberto Fallica

979 total citations
62 papers, 736 citations indexed

About

Roberto Fallica is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Materials Chemistry. According to data from OpenAlex, Roberto Fallica has authored 62 papers receiving a total of 736 indexed citations (citations by other indexed papers that have themselves been cited), including 57 papers in Electrical and Electronic Engineering, 32 papers in Surfaces, Coatings and Films and 17 papers in Materials Chemistry. Recurrent topics in Roberto Fallica's work include Advancements in Photolithography Techniques (42 papers), Integrated Circuits and Semiconductor Failure Analysis (30 papers) and Electron and X-Ray Spectroscopy Techniques (28 papers). Roberto Fallica is often cited by papers focused on Advancements in Photolithography Techniques (42 papers), Integrated Circuits and Semiconductor Failure Analysis (30 papers) and Electron and X-Ray Spectroscopy Techniques (28 papers). Roberto Fallica collaborates with scholars based in Belgium, Switzerland and Italy. Roberto Fallica's co-authors include Yasin Ekinci, Claudia Wiemer, Massimo Longo, Andreas Frommhold, Robert Kirchner, Alex P. G. Robinson, Jason K. Stowers, Danilo De Simone, Albert M. Brouwer and Lianjia Wu and has published in prestigious journals such as Nano Letters, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Roberto Fallica

59 papers receiving 710 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Roberto Fallica Belgium 16 589 280 227 219 52 62 736
B.S. Dassanayake Sri Lanka 16 477 0.8× 418 1.5× 204 0.9× 110 0.5× 52 1.0× 65 731
Raphaël Renoud France 15 320 0.5× 295 1.1× 164 0.7× 161 0.7× 119 2.3× 44 520
Ivan Pollentier Belgium 17 805 1.4× 123 0.4× 285 1.3× 237 1.1× 40 0.8× 97 916
Chengqing Wang United States 13 180 0.3× 180 0.6× 136 0.6× 96 0.4× 19 0.4× 20 428
F. Hosokawa Japan 10 228 0.4× 212 0.8× 348 1.5× 78 0.4× 55 1.1× 26 644
Koji Asakawa Japan 12 296 0.5× 224 0.8× 145 0.6× 238 1.1× 39 0.8× 45 515
Russell B. Goodman United States 13 386 0.7× 126 0.5× 94 0.4× 237 1.1× 38 0.7× 31 532
T. Bret Switzerland 17 443 0.8× 152 0.5× 423 1.9× 110 0.5× 25 0.5× 31 739
Päivikki Repo Finland 12 902 1.5× 477 1.7× 84 0.4× 530 2.4× 40 0.8× 21 1.0k
Futing Yi China 11 209 0.4× 219 0.8× 45 0.2× 185 0.8× 45 0.9× 52 384

Countries citing papers authored by Roberto Fallica

Since Specialization
Citations

This map shows the geographic impact of Roberto Fallica's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Roberto Fallica with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Roberto Fallica more than expected).

Fields of papers citing papers by Roberto Fallica

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Roberto Fallica. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Roberto Fallica. The network helps show where Roberto Fallica may publish in the future.

Co-authorship network of co-authors of Roberto Fallica

This figure shows the co-authorship network connecting the top 25 collaborators of Roberto Fallica. A scholar is included among the top collaborators of Roberto Fallica based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Roberto Fallica. Roberto Fallica is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Fallica, Roberto, et al.. (2025). Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 43(2).
2.
Fallica, Roberto, et al.. (2024). Laboratory-based 3D X-ray standing-wave analysis of nanometre-scale gratings. Journal of Applied Crystallography. 57(5). 1288–1298. 2 indexed citations
3.
Dorney, Kevin M., Fabian Holzmeier, Esben W. Larsen, et al.. (2024). Actinic inspection of the extreme ultraviolet optical parameters of lithographic materials enabled by a table-top, coherent extreme ultraviolet source. Journal of Micro/Nanopatterning Materials and Metrology. 23(4). 1 indexed citations
4.
Dorney, Kevin M., Fabian Holzmeier, Esben W. Larsen, et al.. (2023). Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry. University of Twente Research Information. 62–62. 5 indexed citations
5.
6.
Suh, Hyo Seon, et al.. (2023). Mitigating stochastics in EUV lithography by directed self-assembly. 27–27. 8 indexed citations
7.
Fallica, Roberto, et al.. (2022). Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers. Journal of Micro/Nanopatterning Materials and Metrology. 21(3). 14 indexed citations
8.
Simone, Danilo De, Romuald Blanc, Roberto Fallica, et al.. (2019). Staggered pillar patterning using 0.33NA EUV lithography. 10586. 25–25.
9.
Fallica, Roberto, Benjamin Watts, Benedikt Rösner, et al.. (2018). Changes in the near edge x-ray absorption fine structure of hybrid organic–inorganic resists upon exposure. Nanotechnology. 29(36). 36LT03–36LT03. 6 indexed citations
10.
Fallica, Roberto, Dimitrios Kazazis, Robert Kirchner, et al.. (2017). Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography. arXiv (Cornell University). 14 indexed citations
11.
Mantovan, R., Roberto Fallica, Claudia Wiemer, et al.. (2017). Atomic-scale study of the amorphous-to-crystalline phase transition mechanism in GeTe thin films. Scientific Reports. 7(1). 8234–8234. 21 indexed citations
12.
Buitrago, Elizabeth, Gijsbert Rispens, Michaela Vockenhuber, et al.. (2017). State-of-the-art EUV materials and processes for the 7nm node and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101430T–101430T. 15 indexed citations
13.
Fallica, Roberto, Robert Kirchner, Helmut Schift, & Yasin Ekinci. (2017). High-resolution grayscale patterning using extreme ultraviolet interference lithography. Microelectronic Engineering. 177. 1–5. 20 indexed citations
14.
Fallica, Roberto, Jason K. Stowers, Andrew Grenville, et al.. (2016). Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet. Journal of Micro/Nanolithography MEMS and MOEMS. 15(3). 33506–33506. 58 indexed citations
15.
Frommhold, Andreas, et al.. (2016). Optimization and sensitivity enhancement of high-resolution molecular resist for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 977614–977614. 8 indexed citations
16.
Buitrago, Elizabeth, Roberto Fallica, Daniel Fan, et al.. (2016). From powerful research platform for industrial EUV photoresist development, to world record resolution by photolithography: EUV interference lithography at the Paul Scherrer Institute. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9926. 99260T–99260T. 4 indexed citations
17.
Battaglia, Jean‐Luc, et al.. (2014). Thermal conductivity measurement of a Sb2Te3 phase change nanowire. Applied Physics Letters. 104(26). 19 indexed citations
18.
Battaglia, Jean‐Luc, et al.. (2014). Effect of a thin Ti interfacial layer on the thermal resistance of Ge2Sb2Te5-TiN stack. Applied Physics Letters. 105(12). 12 indexed citations
19.
Longo, Massimo, Roberto Fallica, Claudia Wiemer, et al.. (2012). Metal Organic Chemical Vapor Deposition of Phase Change Ge1Sb2Te4Nanowires. Nano Letters. 12(3). 1509–1515. 25 indexed citations
20.
Longo, Massimo, O. Salicio, Claudia Wiemer, et al.. (2008). Growth study of GexSbyTez deposited by MOCVD under nitrogen for non-volatile memory applications. Journal of Crystal Growth. 310(23). 5053–5057. 18 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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