Hideo Hada

603 total citations
50 papers, 515 citations indexed

About

Hideo Hada is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Hideo Hada has authored 50 papers receiving a total of 515 indexed citations (citations by other indexed papers that have themselves been cited), including 50 papers in Electrical and Electronic Engineering, 27 papers in Biomedical Engineering and 19 papers in Surfaces, Coatings and Films. Recurrent topics in Hideo Hada's work include Advancements in Photolithography Techniques (50 papers), Integrated Circuits and Semiconductor Failure Analysis (30 papers) and Nanofabrication and Lithography Techniques (23 papers). Hideo Hada is often cited by papers focused on Advancements in Photolithography Techniques (50 papers), Integrated Circuits and Semiconductor Failure Analysis (30 papers) and Nanofabrication and Lithography Techniques (23 papers). Hideo Hada collaborates with scholars based in Japan and Israel. Hideo Hada's co-authors include Junichi Onodera, Takeo Watanabe, Hiroo Kinoshita, Kazuhiro Hamamoto, Hiroshi Fukuda, Atsuko Yamaguchi, Mitsuru Ueda, Tadashi Arai, Iwao Nishiyama and Hiroaki Oizumi and has published in prestigious journals such as Japanese Journal of Applied Physics, Microelectronic Engineering and Journal of Photopolymer Science and Technology.

In The Last Decade

Hideo Hada

49 papers receiving 480 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Hideo Hada Japan 12 490 223 204 33 25 50 515
Adam R. Pawloski United States 12 376 0.8× 199 0.9× 133 0.7× 15 0.5× 23 0.9× 30 432
Warren Montgomery United States 10 409 0.8× 187 0.8× 186 0.9× 8 0.2× 14 0.6× 34 463
Julius Joseph Santillan Japan 16 832 1.7× 397 1.8× 408 2.0× 13 0.4× 14 0.6× 101 901
Andreas Frommhold United Kingdom 11 283 0.6× 129 0.6× 117 0.6× 11 0.3× 22 0.9× 41 328
Seiji Nagahara Japan 11 429 0.9× 184 0.8× 202 1.0× 9 0.3× 20 0.8× 44 502
Kimiyoshi Deguchi Japan 10 285 0.6× 95 0.4× 170 0.8× 9 0.3× 54 2.2× 37 356
Michael J. Leeson United States 10 382 0.8× 207 0.9× 146 0.7× 16 0.5× 6 0.2× 27 444
James S. Greeneich United States 8 264 0.5× 134 0.6× 86 0.4× 12 0.4× 12 0.5× 16 301
Tom Wallow United States 10 255 0.5× 129 0.6× 91 0.4× 4 0.1× 17 0.7× 32 286
John J. Biafore United States 13 470 1.0× 284 1.3× 139 0.7× 2 0.1× 11 0.4× 68 486

Countries citing papers authored by Hideo Hada

Since Specialization
Citations

This map shows the geographic impact of Hideo Hada's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Hideo Hada with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Hideo Hada more than expected).

Fields of papers citing papers by Hideo Hada

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Hideo Hada. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Hideo Hada. The network helps show where Hideo Hada may publish in the future.

Co-authorship network of co-authors of Hideo Hada

This figure shows the co-authorship network connecting the top 25 collaborators of Hideo Hada. A scholar is included among the top collaborators of Hideo Hada based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Hideo Hada. Hideo Hada is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Hada, Hideo, et al.. (2010). Fundamental Studies on the Acid Generator to Improve the Resolution, Line Width Roughness, and Sensitivity Tradeoff under Ionizing Radiation. Japanese Journal of Applied Physics. 49(6S). 06GF03–06GF03. 4 indexed citations
2.
Hada, Hideo, et al.. (2009). Decomposition Analysis of Chemically Amplified Resists for Improving Critical Dimension Control. Japanese Journal of Applied Physics. 48(6S). 06FC08–06FC08. 9 indexed citations
3.
Seshimo, Takehiro, et al.. (2009). Studies of the Photo Acid Generator Material Design for Chemically Amplified Photoresists. Japanese Journal of Applied Physics. 48(6S). 06FC07–06FC07. 22 indexed citations
4.
Hada, Hideo, et al.. (2009). Decomposition analysis of molecular resists to further CD control. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7273. 727330–727330. 1 indexed citations
5.
Oizumi, Hiroaki, Yuusuke Tanaka, Hideo Hada, et al.. (2007). Patterning capability of new molecular resist in EUV lithography. Microelectronic Engineering. 84(5-8). 1049–1053. 10 indexed citations
6.
Oizumi, Hiroaki, et al.. (2007). Evaluation of New Molecular Resist for EUV Lithography. Journal of Photopolymer Science and Technology. 20(3). 403–410. 22 indexed citations
7.
Ogata, Toshiyuki, et al.. (2006). Characteristics of low E a 193-nm chemical amplification resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 615328–615328. 2 indexed citations
8.
Ogata, Toshiyuki, et al.. (2006). Thermolysis of Polymethacrylates for 193 nm Resist. Journal of Photopolymer Science and Technology. 19(6). 705–708. 3 indexed citations
9.
Hada, Hideo, Junichi Onodera, Tadashi Arai, et al.. (2006). Molecular resists based on cholate derivatives for electron-beam lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 61532D–61532D. 9 indexed citations
10.
Ogata, Toshiyuki, et al.. (2006). Low-Ea Chemical Amplification Resists for 193 nm Lithography. Japanese Journal of Applied Physics. 45(6S). 5450–5450. 2 indexed citations
11.
Yamaguchi, Atsuko, Hiroshi Fukuda, Tadashi Arai, et al.. (2005). Spectral analysis of line-edge roughness in polyphenol EB-resists and its impact on transistor performance. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(6). 2711–2715. 42 indexed citations
12.
Watanabe, Takeo, et al.. (2005). Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography. Japanese Journal of Applied Physics. 44(7S). 5866–5866. 10 indexed citations
13.
Hada, Hideo, et al.. (2005). Molecular resists based on cholate derivatives for electron-beam lithography. 68–69. 1 indexed citations
14.
Hamamoto, Kazuhiro, Takeo Watanabe, Noriyuki Sakaya, et al.. (2005). Cleaning of extreme ultraviolet lithography optics and masks using 13.5nm and 172nm radiation. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(1). 247–251. 25 indexed citations
15.
Hamamoto, Kazuhiro, Takeo Watanabe, Noriyuki Sakaya, et al.. (2004). Outgassing Characteristics of Structural Materials and the Removal of Contaminants from EUVL Masks using 172-nm Radiation. Journal of Photopolymer Science and Technology. 17(3). 367–372. 2 indexed citations
16.
Hada, Hideo, et al.. (2004). Evaluation of resist outgassing by EUV irradiation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 686–686. 7 indexed citations
17.
Ogata, Toshiyuki, et al.. (2003). Effects of Protecting Group of Fluoroalcohol on Lithographic Performance.. Journal of Photopolymer Science and Technology. 16(5). 707–712.
18.
Hamamoto, Kazuhiro, et al.. (2002). Characteristics of CA Resist in EUV Lithography.. Journal of Photopolymer Science and Technology. 15(3). 361–366. 15 indexed citations
19.
Watanabe, Takeo, Kazuhiro Hamamoto, Hiroo Kinoshita, et al.. (2001). Resist Outgassing by EUV Irradiation.. Journal of Photopolymer Science and Technology. 14(4). 555–560. 11 indexed citations
20.
Watanabe, Takeo, et al.. (2000). <title>Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3997. 600–607. 9 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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