Takeshi Ohfuji

419 total citations
53 papers, 336 citations indexed

About

Takeshi Ohfuji is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Computational Mechanics. According to data from OpenAlex, Takeshi Ohfuji has authored 53 papers receiving a total of 336 indexed citations (citations by other indexed papers that have themselves been cited), including 50 papers in Electrical and Electronic Engineering, 21 papers in Biomedical Engineering and 10 papers in Computational Mechanics. Recurrent topics in Takeshi Ohfuji's work include Advancements in Photolithography Techniques (41 papers), Nanofabrication and Lithography Techniques (11 papers) and Laser Material Processing Techniques (8 papers). Takeshi Ohfuji is often cited by papers focused on Advancements in Photolithography Techniques (41 papers), Nanofabrication and Lithography Techniques (11 papers) and Laser Material Processing Techniques (8 papers). Takeshi Ohfuji collaborates with scholars based in Japan and United States. Takeshi Ohfuji's co-authors include Masayuki Endo, Katsumi Maeda, Masaru Sasago, Etsuo Hasegawa, Hiroaki Morimoto, Kunihiro Ichimura, Minoru Toriumi, Koji Arimitsu, Makoto Takahashi and Shigeyuki Iwasa and has published in prestigious journals such as Journal of Materials Chemistry, Japanese Journal of Applied Physics and Journal of Photopolymer Science and Technology.

In The Last Decade

Takeshi Ohfuji

48 papers receiving 292 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Takeshi Ohfuji Japan 11 296 171 71 38 31 53 336
Munirathna Padmanaban United States 9 222 0.8× 89 0.5× 72 1.0× 64 1.7× 31 1.0× 62 301
Jean‐Baptiste Doucet France 10 205 0.7× 130 0.8× 33 0.5× 22 0.6× 15 0.5× 40 313
Seiji Nagahara Japan 11 429 1.4× 202 1.2× 184 2.6× 122 3.2× 36 1.2× 44 502
Vikram Singh India 12 289 1.0× 92 0.5× 35 0.5× 72 1.9× 10 0.3× 31 326
S. Barnola France 15 467 1.6× 149 0.9× 38 0.5× 238 6.3× 22 0.7× 49 530
Maxime Argoud France 12 271 0.9× 143 0.8× 44 0.6× 251 6.6× 39 1.3× 48 368
Jeffrey Smith United States 7 296 1.0× 91 0.5× 35 0.5× 210 5.5× 36 1.2× 15 369
Patricia Pimenta‐Barros France 11 240 0.8× 98 0.6× 31 0.4× 213 5.6× 33 1.1× 47 307
K. Menguelti Luxembourg 11 289 1.0× 108 0.6× 31 0.4× 106 2.8× 5 0.2× 24 351
Julius Joseph Santillan Japan 16 832 2.8× 408 2.4× 397 5.6× 26 0.7× 26 0.8× 101 901

Countries citing papers authored by Takeshi Ohfuji

Since Specialization
Citations

This map shows the geographic impact of Takeshi Ohfuji's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Takeshi Ohfuji with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Takeshi Ohfuji more than expected).

Fields of papers citing papers by Takeshi Ohfuji

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Takeshi Ohfuji. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Takeshi Ohfuji. The network helps show where Takeshi Ohfuji may publish in the future.

Co-authorship network of co-authors of Takeshi Ohfuji

This figure shows the co-authorship network connecting the top 25 collaborators of Takeshi Ohfuji. A scholar is included among the top collaborators of Takeshi Ohfuji based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Takeshi Ohfuji. Takeshi Ohfuji is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Ohfuji, Takeshi, et al.. (2002). Influence of the baking process for chemically amplified resist on CD performance. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4889. 599–599. 3 indexed citations
2.
Toriumi, Minoru, et al.. (2000). Temperature dependence of acid molecular diffusion in resist polymer films simulated by molecular dynamics. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 1056–1056. 6 indexed citations
3.
Ohfuji, Takeshi, Masayuki Endo, & Hiroaki Morimoto. (1999). Theoretical analysis of line-edge roughness using FFT techniques. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3678. 732–732. 9 indexed citations
4.
Toriumi, Minoru, Takeshi Ohfuji, Masayuki Endo, & Hiroaki Morimoto. (1999). Analysis of molecular diffusion in resist polymer films simulated by molecular dynamics. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3678. 368–368. 11 indexed citations
5.
Yamaguchi, Atsuko, Makoto Takahashi, Nobuyuki Matsuzawa, et al.. (1999). Dissolution Rate Analysis of ArF Resists Based on the Percolation Model. Japanese Journal of Applied Physics. 38(7R). 4033–4033. 1 indexed citations
6.
Ohfuji, Takeshi, et al.. (1998). Nonhomogeneous Pattern Formation in the Dissolution Processes of Novolak-Diazonaphthoquinone Resists. Japanese Journal of Applied Physics. 37(11R). 6266–6266. 3 indexed citations
7.
Naito, Takuya, Makoto Takahashi, Takeshi Ohfuji, & Masaru Sasago. (1998). Negative-type chemically amplified resists for ArF excimer laser lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3333. 503–503. 5 indexed citations
8.
Zhao, Wenwei, Yusuke Sakurai, Takeshi Ohfuji, Masaru Sasago, & Seiichi Tagawa. (1998). Cyclization Reaction in Acrylonitrile-Contained Acrylic Copolymers and Its Possible Application for the Improvement of Dry Etch Resistance for Photoresists.. Journal of Photopolymer Science and Technology. 11(3). 525–532.
9.
Ohfuji, Takeshi, Makoto Takahashi, Tohru Ogawa, et al.. (1997). Acid amplification of chemically amplified resists for 193-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3049. 76–76. 2 indexed citations
10.
Ogawa, Tohru, et al.. (1997). Fabrication of 0.13-µm Device Patterns by Argon Fluoride Excimer Laser Lithography with Practical Resolution Enhancement Techniques. Japanese Journal of Applied Physics. 36(12S). 7482–7482. 8 indexed citations
11.
Ohfuji, Takeshi, et al.. (1997). Characterization of Chemically Amplified Resists with "Acid Amplifier" for 193 nm Lithography.. Journal of Photopolymer Science and Technology. 10(4). 551–558. 10 indexed citations
12.
Mori, Shigeyasu, et al.. (1997). High-sensitivity silylation process for 193-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3049. 146–146. 11 indexed citations
13.
Seki, Y., Takashi Saitō, Katsumi Maeda, et al.. (1997). ArF excimer-laser exposure durability of chromium-fluoride-attenuated phase-shift masks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3096. 286–286. 2 indexed citations
14.
Yamaguchi, Atsuko, et al.. (1997). Time-dependent simulation of acid and product distributions in chemically amplified resist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3049. 180–180. 3 indexed citations
15.
16.
Iwasa, Shigeyuki, et al.. (1996). Design and Characterization of Alicyclic Polymers with Alkoxy-ethyl Protecting Groups for ArF Chemically Amplified Resists.. Journal of Photopolymer Science and Technology. 9(3). 447–456. 17 indexed citations
17.
Ohfuji, Takeshi, et al.. (1996). Dissolution behavior of alicyclic polymers designed for ArF excimer laser lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2724. 386–386. 10 indexed citations
18.
Ohfuji, Takeshi, et al.. (1996). Prospect and challenges of ArF excimer laser lithography processes and materials. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(6). 4203–4206. 11 indexed citations
19.
Ohfuji, Takeshi, Koji Nakano, Katsumi Maeda, & Etsuo Hasegawa. (1995). Reaction modeling of chemically amplified resists for ArF excimer laser lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(6). 3022–3025. 7 indexed citations
20.
Inada, T., et al.. (1983). MeV backscattering analysis of annealing behaviors of ion-implanted arsenic in silicon. Nuclear Instruments and Methods in Physics Research. 218(1-3). 607–611. 7 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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