Lieve Van Look

1.4k total citations
82 papers, 1.2k citations indexed

About

Lieve Van Look is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Condensed Matter Physics. According to data from OpenAlex, Lieve Van Look has authored 82 papers receiving a total of 1.2k indexed citations (citations by other indexed papers that have themselves been cited), including 49 papers in Electrical and Electronic Engineering, 31 papers in Atomic and Molecular Physics, and Optics and 30 papers in Condensed Matter Physics. Recurrent topics in Lieve Van Look's work include Advancements in Photolithography Techniques (47 papers), Physics of Superconductivity and Magnetism (30 papers) and Integrated Circuits and Semiconductor Failure Analysis (22 papers). Lieve Van Look is often cited by papers focused on Advancements in Photolithography Techniques (47 papers), Physics of Superconductivity and Magnetism (30 papers) and Integrated Circuits and Semiconductor Failure Analysis (22 papers). Lieve Van Look collaborates with scholars based in Belgium, Netherlands and Germany. Lieve Van Look's co-authors include V. V. Moshchalkov, M. J. Van Bael, R. Jonckheere, K. Temst, Joost Bekaert, Y. Bruynseraede, S. Raedts, A. V. Silhanek, Bei Zhu and Erik Rosseel and has published in prestigious journals such as Physical Review Letters, Physical review. B, Condensed matter and Physical Review B.

In The Last Decade

Lieve Van Look

77 papers receiving 1.1k citations

Peers

Lieve Van Look

CMP

AMPO

EEE

A. Aassime France

S. Hasuo Japan

S. M. Faris United States

Shinichi Yorozu Japan

P. Grambow Germany

S. Takada Japan

O. Buisson France

Linus A. Fetter United States

Dietmar Weinmann France

H. J. Fink United States

A. Aassime France

Lieve Van Look

245 ×0.3

CMP

1.7k ×2.9

AMPO

450 ×1.5

EEE

356 ×1.6

156 ×1.0

Citations per year, relative to Lieve Van Look Lieve Van Look (= 1×) peers A. Aassime

Countries citing papers authored by Lieve Van Look

Since Specialization

Citations

This map shows the geographic impact of Lieve Van Look's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Lieve Van Look with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Lieve Van Look more than expected).

Fields of papers citing papers by Lieve Van Look

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Lieve Van Look. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Lieve Van Look. The network helps show where Lieve Van Look may publish in the future.

Co-authorship network of co-authors of Lieve Van Look

This figure shows the co-authorship network connecting the top 25 collaborators of Lieve Van Look. A scholar is included among the top collaborators of Lieve Van Look based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Lieve Van Look. Lieve Van Look is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Davydova, Natalia, Vincent Wiaux, Frank Timmermans, et al.. (2024). High NA EUV stitching: mask performance is a key. 9256. 36–36. 1 indexed citations

Philipsen, Vicky, Andreas Frommhold, Inhwan Lee, et al.. (2024). Mask innovations on the eve of high NA EUV lithography. Japanese Journal of Applied Physics. 63(4). 40804–40804. 2 indexed citations

Davydova, Natalia, et al.. (2024). An experimental stitching study on the eve of high-NA EUV. 27–27. 1 indexed citations

Bekaert, Joost, Lieve Van Look, Joern-Holger Franke, et al.. (2024). High-NA EUV mask pattern characterization using advanced mask CD-SEM metrology. 40–40. 3 indexed citations

Davydova, Natalia, Lieve Van Look, Vincent Wiaux, et al.. (2023). Stitching for high-NA: zooming in on CDU budget. 2–2. 2 indexed citations

Look, Lieve Van, Werner Gillijns, & Emily Gallagher. (2021). Impact of mask corner rounding on pitch 40 nm contact hole variability. 998405. 48–48. 3 indexed citations

Frommhold, Andreas, et al.. (2019). Predicting stochastic defects across the process window. 10959. 6–6. 2 indexed citations

Look, Lieve Van, et al.. (2019). Evaluation of local CD and placement distribution on EUV mask and its impact on wafer. 27–27. 3 indexed citations

Look, Lieve Van, et al.. (2018). Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300. 20–20. 15 indexed citations

10.

Chan, Boon Teik, Dieter Van den Heuvel, Lieve Van Look, et al.. (2015). Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9423. 94230M–94230M. 12 indexed citations

11.

Look, Lieve Van, Paulina Rincon Delgadillo, Ivan Pollentier, et al.. (2014). High throughput grating qualification of directed self-assembly patterns using optical metrology. Microelectronic Engineering. 123. 175–179. 6 indexed citations

12.

Li, Fahong, et al.. (2012). High-speed, full 3D feature metrology for litho monitoring, matching, and model calibration with scatterometry. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8324. 83240R–83240R. 3 indexed citations

13.

Look, Lieve Van. (2011). Pellicle contribution to optical proximity and critical dimension uniformity for 1.35 numerical aperture immersion ArF lithography. Journal of Micro/Nanolithography MEMS and MOEMS. 10(1). 13009–13009. 2 indexed citations

14.

Bekaert, Joost, et al.. (2007). Combined illumination sources for hyper-NA contact hole printing. Solid State Technology. 50(11). 48–50. 1 indexed citations

15.

Look, Lieve Van, et al.. (2005). Image imbalance compensation in alternating phase-shift masks towards the 45nm node through-pitch imaging. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5992. 59921S–59921S. 1 indexed citations

16.

Hébert, Sébastien S., et al.. (2003). Vortex avalanches in a Pb film with a square antidot array. Physical review. B, Condensed matter. 67(22). 23 indexed citations

17.

Bael, M. J. Van, Joost Bekaert, K. Temst, et al.. (2001). Local Observation of Field Polarity Dependent Flux Pinning by Magnetic Dipoles. Physical Review Letters. 86(1). 155–158. 106 indexed citations

18.

Bruyndoncx, V., J. G. Rodrigo, Teresa Puig, et al.. (1999). Giant vortex state in perforated aluminum microsquares. Physical review. B, Condensed matter. 60(6). 4285–4292. 55 indexed citations

19.

Peteghem, Carlos Van, et al.. (1989). Chemiluminescence immunoassay for the detection and quantification of methylestosterone residues in muscle tissue. Journal of Chromatography B Biomedical Sciences and Applications. 489(1). 219–223. 11 indexed citations

20.

Look, Lieve Van, et al.. (1989). Thin-layer chromatographic method for the detection of anabolics in fatty tissues. Journal of Chromatography B Biomedical Sciences and Applications. 489(1). 213–218. 15 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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