Andrew Grenville

822 total citations
58 papers, 650 citations indexed

About

Andrew Grenville is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Computational Mechanics. According to data from OpenAlex, Andrew Grenville has authored 58 papers receiving a total of 650 indexed citations (citations by other indexed papers that have themselves been cited), including 49 papers in Electrical and Electronic Engineering, 21 papers in Surfaces, Coatings and Films and 17 papers in Computational Mechanics. Recurrent topics in Andrew Grenville's work include Advancements in Photolithography Techniques (34 papers), Laser Material Processing Techniques (12 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). Andrew Grenville is often cited by papers focused on Advancements in Photolithography Techniques (34 papers), Laser Material Processing Techniques (12 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). Andrew Grenville collaborates with scholars based in United States, Belgium and Japan. Andrew Grenville's co-authors include Jason K. Stowers, M. Rothschild, Douglas A. Keszler, Jan Sedláček, Vladimir Liberman, Stephen T. Meyers, Benjamin L. Clark, Alex P. G. Robinson, Roberto Fallica and Andreas Frommhold and has published in prestigious journals such as Applied Physics Letters, Optics Letters and Journal of Non-Crystalline Solids.

In The Last Decade

Andrew Grenville

54 papers receiving 604 citations

Peers

Andrew Grenville

EEE

SCF

Russell B. Goodman United States

Bradley L. Thiel United States

Yoshihiro Sugita Japan

Y. Takai Japan

Akiko N. Itakura Japan

Jakub Szajman Australia

Michel Cathelinaud France

Nathalie Brun France

T. Eickhoff Germany

Marc Schnieper Switzerland

Russell B. Goodman United States

Andrew Grenville

386 ×0.7

EEE

94 ×0.4

SCF

237 ×1.1

126 ×1.1

66 ×0.9

Citations per year, relative to Andrew Grenville Andrew Grenville (= 1×) peers Russell B. Goodman

Countries citing papers authored by Andrew Grenville

Since Specialization

Citations

This map shows the geographic impact of Andrew Grenville's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Andrew Grenville with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Andrew Grenville more than expected).

Fields of papers citing papers by Andrew Grenville

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Andrew Grenville. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Andrew Grenville. The network helps show where Andrew Grenville may publish in the future.

Co-authorship network of co-authors of Andrew Grenville

This figure shows the co-authorship network connecting the top 25 collaborators of Andrew Grenville. A scholar is included among the top collaborators of Andrew Grenville based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Andrew Grenville. Andrew Grenville is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Stowers, Jason K., et al.. (2019). Advances in metal oxide resist performance and production (Conference Presentation). 41–41. 1 indexed citations

Stowers, Jason K., Jeremy T. Anderson, Brian Cardineau, et al.. (2016). Metal oxide EUV photoresist performance for N7 relevant patterns and processes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9779. 977904–977904. 34 indexed citations

Grenville, Andrew, Jeremy T. Anderson, Benjamin L. Clark, et al.. (2015). Integrated fab process for metal oxide EUV photoresist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9425. 94250S–94250S. 67 indexed citations

Chakravarti, Amitav, Andrew Grenville, Vicki G. Morwitz, Jane Tang, & Gülden Ülkümen. (2012). Malleable conjoint partworths: How the breadth of response scales alters price sensitivity. Journal of Consumer Psychology. 23(4). 515–525. 1 indexed citations

Stowers, Jason K., Benjamin L. Clark, Douglas A. Keszler, et al.. (2011). Directly patterned inorganic hardmask for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7969. 796915–796915. 53 indexed citations

Heo, Jaeseok, Jung‐Han Kim, Kwon‐Shik Park, et al.. (2010). 17.4L: LateNews Paper : Contact Resistance and Process Integration Effects on HighPerformance Oxide TFTs with SolutionDeposited Semiconductor and Gate Dielectric Layers. SID Symposium Digest of Technical Papers. 41(1). 241–244. 5 indexed citations

Tang, Jane, et al.. (2009). Influencing feature price tradeoff decisions in CBC experiments. London School of Economics and Political Science Research Online (London School of Economics and Political Science). 3 indexed citations

Liberman, Vladimir, S. T. Palmacci, D. E. Hardy, M. Rothschild, & Andrew Grenville. (2005). Controlled contamination studies in 193-nm immersion lithography. 13–13. 8 indexed citations

Grenville, Andrew, Scott D. Hector, Leonardus H. A. Leunissen, et al.. (2005). Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations. 56–56. 7 indexed citations

10.

Rothschild, M., T. M. Bloomstein, Roderick R. Kunz, et al.. (2004). Liquid immersion lithography: Why, how, and when?. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(6). 2877–2881. 35 indexed citations

11.

French, Roger H., Robert C. Wheland, Weiming Qiu, et al.. (2002). 157-nm pellicles: polymer design for transparency and lifetime. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 576–576. 12 indexed citations

12.

Reu, Phillip L., et al.. (2002). Experimental and Numerical Studies of the Response of Photomask Hard Pellicles to Acoustic Excitation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4889. 1121–1121. 4 indexed citations

13.

Liberman, Vladimir, et al.. (1999). Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications. Optics Letters. 24(1). 58–58. 25 indexed citations

14.

Liberman, Vladimir, et al.. (1999). Excimer-laser-induced densification of fused silica:laser-fluence and material-grade effects on the scaling law. Journal of Non-Crystalline Solids. 244(2-3). 159–171. 22 indexed citations

15.

Liberman, Vladimir, et al.. (1998). Damage testing of pellicles for 193-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3334. 480–480. 1 indexed citations

16.

Edmeads, John, Andrew Grenville, & Michel Aubé. (1996). Migraine Variability: An Underrecognized Impediment to Effective Treatment. Pain Research and Management. 1(4). 215–218. 1 indexed citations

17.

Rothschild, M., J.A. Burns, Anthony R. Forte, et al.. (1996). How practical is 193 nm lithography?. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(6). 4157–4161. 6 indexed citations

18.

Jeong, Hongsik, et al.. (1993). Optical projection system for gigabit dynamic random access memories. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 11(6). 2675–2679. 1 indexed citations

19.

Hsieh, Robert, Andrew Grenville, G. Owen, & R. F. W. Pease. (1992). All-reflective phase-shifting masks for Markle–Dyson optics. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 3042–3046. 1 indexed citations

20.

Grenville, Andrew, et al.. (1991). Markle–Dyson optics for 0.25 μm lithography and beyond. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 9(6). 3108–3112. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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