Michael J. Leeson

526 total citations
27 papers, 444 citations indexed

About

Michael J. Leeson is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Michael J. Leeson has authored 27 papers receiving a total of 444 indexed citations (citations by other indexed papers that have themselves been cited), including 24 papers in Electrical and Electronic Engineering, 17 papers in Surfaces, Coatings and Films and 6 papers in Biomedical Engineering. Recurrent topics in Michael J. Leeson's work include Advancements in Photolithography Techniques (23 papers), Electron and X-Ray Spectroscopy Techniques (13 papers) and Integrated Circuits and Semiconductor Failure Analysis (11 papers). Michael J. Leeson is often cited by papers focused on Advancements in Photolithography Techniques (23 papers), Electron and X-Ray Spectroscopy Techniques (13 papers) and Integrated Circuits and Semiconductor Failure Analysis (11 papers). Michael J. Leeson collaborates with scholars based in United States, Belgium and Japan. Michael J. Leeson's co-authors include Heidi B. Cao, Hai Deng, Takahiro Kozawa, Seiichi Tagawa, Todd R. Younkin, Kevin S. Jack, Idriss Blakey, Andrew K. Whittaker, Roel Gronheid and Hiroki Yamamoto and has published in prestigious journals such as Journal of Applied Physics, Chemistry of Materials and Macromolecules.

In The Last Decade

Michael J. Leeson

27 papers receiving 434 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Michael J. Leeson United States	10	382	207	146	57	47	27	444
Takeshi Ohfuji Japan	11	296 0.8×	71 0.3×	171 1.2×	38 0.7×	31 0.7×	53	336
Toshiyuki Kai Japan	15	637 1.7×	386 1.9×	224 1.5×	24 0.4×	37 0.8×	22	673
Andreas Frommhold United Kingdom	11	283 0.7×	129 0.6×	117 0.8×	50 0.9×	11 0.2×	41	328
Munirathna Padmanaban United States	9	222 0.6×	72 0.3×	89 0.6×	64 1.1×	31 0.7×	62	301
Vikram Singh India	12	289 0.8×	35 0.2×	92 0.6×	72 1.3×	10 0.2×	31	326
Paulina Rincon Delgadillo Belgium	12	188 0.5×	56 0.3×	109 0.7×	270 4.7×	79 1.7×	24	335
Jeffrey Smith United States	7	296 0.8×	35 0.2×	91 0.6×	210 3.7×	36 0.8×	15	369
Ian Cayrefourcq France	11	289 0.8×	19 0.1×	63 0.4×	85 1.5×	27 0.6×	47	340
Yann Mignot United States	6	103 0.3×	35 0.2×	40 0.3×	93 1.6×	42 0.9×	25	184
J. Guillet France	9	347 0.9×	31 0.1×	71 0.5×	256 4.5×	7 0.1×	22	376

Countries citing papers authored by Michael J. Leeson

Since Specialization

Citations

This map shows the geographic impact of Michael J. Leeson's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Michael J. Leeson with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Michael J. Leeson more than expected).

Fields of papers citing papers by Michael J. Leeson

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Michael J. Leeson. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Michael J. Leeson. The network helps show where Michael J. Leeson may publish in the future.

Co-authorship network of co-authors of Michael J. Leeson

This figure shows the co-authorship network connecting the top 25 collaborators of Michael J. Leeson. A scholar is included among the top collaborators of Michael J. Leeson based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Michael J. Leeson. Michael J. Leeson is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Pret, Alessandro Vaglio, Roel Gronheid, Jan Engelen, et al.. (2013). Mask Effects on Resist Variability in Extreme Ultraviolet Lithography. Japanese Journal of Applied Physics. 52(6S). 06GC02–06GC02. 1 indexed citations

Pret, Alessandro Vaglio, Roel Gronheid, Jan Engelen, et al.. (2012). Evidence of speckle in extreme-UV lithography. Optics Express. 20(23). 25970–25970. 6 indexed citations

Cheng, Han‐Hao, Imelda Keen, Idriss Blakey, et al.. (2012). EUVL compatible LER solutions using functional block copolymers. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8323. 83231O–83231O. 5 indexed citations

Pret, Alessandro Vaglio, Roel Gronheid, Todd R. Younkin, Michael J. Leeson, & Pei-yang Yan. (2012). Impact of EUV mask surface roughness on LER. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83220N–83220N. 5 indexed citations

Gronheid, Roel, Todd R. Younkin, Michael J. Leeson, et al.. (2011). EUV secondary electron blur at the 22nm half pitch node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7969. 796904–796904. 3 indexed citations

Blakey, Idriss, James P. Blinco, Han‐Hao Cheng, et al.. (2011). Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymers. Journal of Materials Chemistry. 21(15). 5629–5629. 44 indexed citations

Cheng, Han‐Hao, Imelda Keen, Idriss Blakey, et al.. (2011). Electron beam induced freezing of positive tone, EUV resists for directed self assembly applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7970. 79701V–79701V. 4 indexed citations

Blakey, Idriss, James P. Blinco, Roel Gronheid, et al.. (2010). Extreme ultraviolet (EUV) degradation of poly(olefin sulfone)s: Towards applications as EUV photoresists. Radiation Physics and Chemistry. 80(2). 236–241. 22 indexed citations

Gronheid, Roel, et al.. (2009). EUV resist requirements: absorbance and acid yield. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 17 indexed citations

10.

Saeki, Akinori, Takahiro Kozawa, Seiichi Tagawa, et al.. (2008). Simulation of amine concentration dependence on line edge roughness after development in electron beam lithography. Journal of Applied Physics. 104(2). 6 indexed citations

11.

Saeki, Akinori, Takahiro Kozawa, Seiichi Tagawa, et al.. (2008). Monte Carlo simulation on line edge roughness after development in chemically amplified resist of post-optical lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6923. 69230S–69230S. 2 indexed citations

12.

Saeki, Akinori, Takahiro Kozawa, Seiichi Tagawa, et al.. (2007). Line edge roughness after development in a positive-tone chemically amplified resist of post-optical lithography investigated by Monte Carlo simulation and a dissolution model. Nanotechnology. 19(1). 15705–15705. 16 indexed citations

13.

Yamamoto, Hiroki, Takahiro Kozawa, Seiichi Tagawa, et al.. (2007). Polymer-Structure Dependence of Acid Generation in Chemically Amplified Extreme Ultraviolet Resists. Japanese Journal of Applied Physics. 46(2L). L142–L142. 67 indexed citations

14.

Woodward, John T., et al.. (2007). Component segregation in model chemically amplified resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6519. 651915–651915. 8 indexed citations

15.

Kozawa, Takahiro, Seiichi Tagawa, Heidi B. Cao, Hai Deng, & Michael J. Leeson. (2007). Acid distribution in chemically amplified extreme ultraviolet resist. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 25(6). 2481–2485. 132 indexed citations

16.

Lavery, Kristopher A., Bryan D. Vogt, Vivek M. Prabhu, et al.. (2006). Fundamentals of the reaction-diffusion process in model EUV photoresists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 615313–615313. 7 indexed citations

17.

Zhang, Guojing, Pei-yang Yan, Ted Liang, et al.. (2006). EUV mask process development and integration. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6283. 62830G–62830G. 9 indexed citations

18.

Leeson, Michael J., et al.. (2004). Synthesis and Reactivity of 3-Diazo-4-oxocoumarins for Photolithographic Applications. Chemistry of Materials. 16(9). 1763–1769. 3 indexed citations

19.

Willson, C. Grant, et al.. (1997). Non-chemically amplified 248-nm resist materials. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3049. 226–226. 3 indexed citations

20.

Leeson, Michael J., et al.. (1991). Phase-locked millimeter-wave two-port second-harmonic Gunn oscillators. IEEE Transactions on Microwave Theory and Techniques. 39(10). 1746–1753. 13 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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