Hoa D. Truong

701 total citations
33 papers, 590 citations indexed

About

Hoa D. Truong is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Hoa D. Truong has authored 33 papers receiving a total of 590 indexed citations (citations by other indexed papers that have themselves been cited), including 31 papers in Electrical and Electronic Engineering, 19 papers in Biomedical Engineering and 7 papers in Surfaces, Coatings and Films. Recurrent topics in Hoa D. Truong's work include Advancements in Photolithography Techniques (30 papers), Nanofabrication and Lithography Techniques (14 papers) and Electron and X-Ray Spectroscopy Techniques (7 papers). Hoa D. Truong is often cited by papers focused on Advancements in Photolithography Techniques (30 papers), Nanofabrication and Lithography Techniques (14 papers) and Electron and X-Ray Spectroscopy Techniques (7 papers). Hoa D. Truong collaborates with scholars based in United States and Japan. Hoa D. Truong's co-authors include William D. Hinsberg, Daniel P. Sanders, Steven J. Holmes, Joy Cheng, Robert D. Allen, Stefan Harrer, Matthew Colburn, Alexander Friz, Phillip J. Brock and Nicolette Fender and has published in prestigious journals such as ACS Nano, Polymers for Advanced Technologies and Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.

In The Last Decade

Hoa D. Truong

32 papers receiving 554 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Hoa D. Truong United States	12	392	275	273	138	89	33	590
Mark Somervell United States	17	381 1.0×	272 1.0×	300 1.1×	83 0.6×	97 1.1×	42	568
Heidi B. Cao United States	17	783 2.0×	420 1.5×	91 0.3×	65 0.5×	333 3.7×	42	892
Anthony E. Novembre United States	12	352 0.9×	166 0.6×	58 0.2×	59 0.4×	164 1.8×	86	525
Gunnar Kircher Germany	9	52 0.1×	63 0.2×	67 0.2×	95 0.7×	91 1.0×	16	328
S.H. Mousavi Iran	15	177 0.5×	226 0.8×	276 1.0×	24 0.2×	23 0.3×	38	474
Anuja De Silva United States	12	395 1.0×	213 0.8×	108 0.4×	53 0.4×	130 1.5×	47	501
Yit‐Yian Lua United States	12	225 0.6×	126 0.5×	152 0.6×	13 0.1×	27 0.3×	16	361
Akira Heya Japan	12	448 1.1×	80 0.3×	354 1.3×	37 0.3×	32 0.4×	92	533
Hiroyuki Hieda Japan	12	156 0.4×	178 0.6×	342 1.3×	81 0.6×	87 1.0×	28	553

Countries citing papers authored by Hoa D. Truong

Since Specialization

Citations

This map shows the geographic impact of Hoa D. Truong's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Hoa D. Truong with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Hoa D. Truong more than expected).

Fields of papers citing papers by Hoa D. Truong

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Hoa D. Truong. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Hoa D. Truong. The network helps show where Hoa D. Truong may publish in the future.

Co-authorship network of co-authors of Hoa D. Truong

This figure shows the co-authorship network connecting the top 25 collaborators of Hoa D. Truong. A scholar is included among the top collaborators of Hoa D. Truong based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Hoa D. Truong. Hoa D. Truong is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Truong, Hoa D., Martha I. Sanchez, Daniel P. Sanders, et al.. (2019). Model reactivity of inorganic and organometallic materials in EUV (Conference Presentation). 4–4. 1 indexed citations

Sundberg, Linda K., Gregory M. Wallraff, Luisa Bozano, et al.. (2014). ICE: Ionic contrast enhancement for organic solvent negative tone develop. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9051. 90510S–90510S. 2 indexed citations

Sanchez, M., Linda K. Sundberg, G. M. Wallraff, et al.. (2013). Monitoring the evolution of line edge roughness during resist development using an analog of quenched flow kinetics. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8682. 868218–868218. 2 indexed citations

Ayothi, Ramakrishnan, Jed W. Pitera, Linda K. Sundberg, et al.. (2012). Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 30(6). 06F506–06F506. 2 indexed citations

Bencher, Chris, Jeffrey Smith, Yongmei Chen, et al.. (2011). Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 89 indexed citations

Allen, Robert D., Phillip J. Brock, Mark Sherwood, et al.. (2009). Investigation of Polymer-bound PAGs: Synthesis, Characterization and Initial Structure/Property Relationships of Anion-bound Resists. Journal of Photopolymer Science and Technology. 22(1). 25–29. 33 indexed citations

Ito, Hiroshi, Hoa D. Truong, & P. J. Brock. (2008). Lactones in 193 nm resists: What do they do?. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6923. 692318–692318. 8 indexed citations

Sanders, Daniel P., Linda K. Sundberg, Phillip J. Brock, et al.. (2008). Self-segregating materials for immersion lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6923. 692309–692309. 5 indexed citations

Itô, Hiroshi, Hoa D. Truong, Robert D. Allen, et al.. (2006). ArF excimer laser resists based on fluoroalcohol. Polymers for Advanced Technologies. 17(2). 104–115. 12 indexed citations

10.

Itô, Hiroshi, Hoa D. Truong, Sean Burns, Dirk Pfeiffer, & David R. Medeiros. (2006). Bilayer Resists for 193 nm Lithography: SSQ and POSS. Journal of Photopolymer Science and Technology. 19(3). 305–311. 4 indexed citations

11.

Itô, Hiroshi, Hoa D. Truong, Sean Burns, et al.. (2005). Characterization and Lithographic Performance of Silsesquioxane 193 nm Bilayer Resists. Journal of Photopolymer Science and Technology. 18(3). 355–364. 3 indexed citations

12.

Ito, Hiroshi, Hoa D. Truong, Sean Burns, et al.. (2005). Silsesquioxane-based 193 nm bilayer resists: characterization and lithographic evaluation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5753. 109–109. 1 indexed citations

13.

Li, Wenjie, Pushkara R. Varanasi, Kuang‐Jung Chen, et al.. (2003). Rational design in cyclic olefin resists for sub-100-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5039. 61–61. 10 indexed citations

14.

Ito, Hiroshi, Hoa D. Truong, Masaki Okazaki, et al.. (2002). Aliphatic platforms for the design of 157-nm chemically amplified resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4690. 18–18. 16 indexed citations

15.

Kajita, Toru, Yukio Nishimura, Masafumi Yamamoto, et al.. (2001). 193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform chemistries. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4345. 712–712. 6 indexed citations

16.

Itô, Hiroshi, Gregory M. Wallraff, Phillip J. Brock, et al.. (2001). Polymer design for 157-nm chemically amplified resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4345. 273–273. 32 indexed citations

17.

Varanasi, Pushkara R., George M. Jordhamo, Arpan P. Mahorowala, et al.. (2001). IBM 193-nm bilayer resist: materials, lithographic performance, and optimization. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4345. 50–50. 5 indexed citations

18.

Itô, Hiroshi, Robert D. Allen, Thomas I. Wallow, et al.. (2000). Dissolution/swelling behavior of cycloolefin polymers in aqueous base. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 2–2. 11 indexed citations

19.

Allen, Robert D., et al.. (2000). Progress in 193nm Resists: Impact of The Development Process on Anhydride-Containing Resist Materials.. Journal of Photopolymer Science and Technology. 13(4). 595–599. 1 indexed citations

20.

Nguyen, Huu Tho, et al.. (1990). <title>Massively parallel processors in real-time applications</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1246. 107–119. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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