Efrain Altamirano Sánchez

622 total citations
59 papers, 318 citations indexed

About

Efrain Altamirano Sánchez is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Efrain Altamirano Sánchez has authored 59 papers receiving a total of 318 indexed citations (citations by other indexed papers that have themselves been cited), including 54 papers in Electrical and Electronic Engineering, 17 papers in Biomedical Engineering and 11 papers in Surfaces, Coatings and Films. Recurrent topics in Efrain Altamirano Sánchez's work include Semiconductor materials and devices (35 papers), Advancements in Photolithography Techniques (21 papers) and Integrated Circuits and Semiconductor Failure Analysis (17 papers). Efrain Altamirano Sánchez is often cited by papers focused on Semiconductor materials and devices (35 papers), Advancements in Photolithography Techniques (21 papers) and Integrated Circuits and Semiconductor Failure Analysis (17 papers). Efrain Altamirano Sánchez collaborates with scholars based in Belgium, Japan and United States. Efrain Altamirano Sánchez's co-authors include Boon Teik Chan, Annelies Delabie, Yoann Tomczak, Gregory N. Parsons, Werner Boullart, Yusuke Oniki, Frank Holsteyns, M. Demand, Vasile Paraschiv and Alessandro Vaglio Pret and has published in prestigious journals such as Chemistry of Materials, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and Microelectronic Engineering.

In The Last Decade

Efrain Altamirano Sánchez

53 papers receiving 309 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Efrain Altamirano Sánchez Belgium 9 297 80 72 50 27 59 318
Trace Hurd United States 7 231 0.8× 67 0.8× 59 0.8× 118 2.4× 11 0.4× 16 274
Tomo Ueno Japan 11 288 1.0× 217 2.7× 54 0.8× 61 1.2× 15 0.6× 36 358
T. Iwabuchi Japan 11 366 1.2× 204 2.5× 76 1.1× 59 1.2× 17 0.6× 31 422
N. Klymko United States 11 364 1.2× 77 1.0× 113 1.6× 40 0.8× 11 0.4× 25 422
D. Louis France 11 269 0.9× 47 0.6× 61 0.8× 102 2.0× 10 0.4× 28 295
S. Patra India 10 176 0.6× 187 2.3× 43 0.6× 21 0.4× 34 1.3× 28 300
I. Kawanabe Japan 7 371 1.2× 138 1.7× 124 1.7× 31 0.6× 35 1.3× 7 444
X. Mellhaoui France 10 346 1.2× 130 1.6× 164 2.3× 51 1.0× 32 1.2× 10 397
D. Dobuzinsky United States 7 238 0.8× 71 0.9× 49 0.7× 95 1.9× 17 0.6× 17 264
Anthony R. Forte United States 9 245 0.8× 25 0.3× 108 1.5× 19 0.4× 60 2.2× 16 284

Countries citing papers authored by Efrain Altamirano Sánchez

Since Specialization
Citations

This map shows the geographic impact of Efrain Altamirano Sánchez's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Efrain Altamirano Sánchez with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Efrain Altamirano Sánchez more than expected).

Fields of papers citing papers by Efrain Altamirano Sánchez

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Efrain Altamirano Sánchez. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Efrain Altamirano Sánchez. The network helps show where Efrain Altamirano Sánchez may publish in the future.

Co-authorship network of co-authors of Efrain Altamirano Sánchez

This figure shows the co-authorship network connecting the top 25 collaborators of Efrain Altamirano Sánchez. A scholar is included among the top collaborators of Efrain Altamirano Sánchez based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Efrain Altamirano Sánchez. Efrain Altamirano Sánchez is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Sebaai, Farid, et al.. (2024). Extreme silicon thinning for back side power delivery network: Si thinning stopping on scaled SiGe etch stop layer. Microelectronic Engineering. 294. 112246–112246.
2.
Pacco, Antoine, et al.. (2024). Etching of tungsten via a combination of thermal oxide formation and wet-chemical oxide dissolution. Microelectronic Engineering. 297. 112304–112304.
3.
Kim, Dong Gyu, et al.. (2023). Investigation of Selective Wet Etching of SiGe Substrates for High-Performance Device Manufacturing. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 346. 34–39. 1 indexed citations
4.
Liu, Wen, et al.. (2023). SiGe Selective Etching to Enable Bottom and Middle Dielectric Isolations for Advanced Gate-All-Around FET Architecture. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 346. 23–28. 2 indexed citations
5.
Kenis, Karine, et al.. (2023). Monitoring of Trace Molecular Impurities in Clean-Room Air. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 346. 183–188. 1 indexed citations
6.
Oniki, Yusuke, Efrain Altamirano Sánchez, Hans Mertens, et al.. (2022). Highly selective isotropic chemical dry etching for gate-all-around devices: nanosheet, forksheet and complementary FETs. 6–6. 2 indexed citations
7.
Le, Quoc Toan, et al.. (2021). Removal of Post Etch Residue on BEOL Low-K with Nanolift. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 314. 277–281. 1 indexed citations
8.
Harada, Ken, et al.. (2021). Si<sub>1-X</sub>Ge<sub>X</sub> Selective Etchant for Gate-All-Around Transistors. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 314. 71–76. 2 indexed citations
9.
Martens, Koen, Bert Du Bois, Yong Kong Siew, et al.. (2019). 1/f Noise in Fully Integrated Electrolytically Gated FinFETs with Fin Width Down to 20nm. Infoscience (Ecole Polytechnique Fédérale de Lausanne). 1 indexed citations
10.
Oniki, Yusuke, Efrain Altamirano Sánchez, & Frank Holsteyns. (2019). (Invited) Selective Etches for Gate-All-Around (GAA) Device Integration: Opportunities and Challenges. ECS Meeting Abstracts. MA2019-02(23). 1092–1092. 2 indexed citations
11.
Tomczak, Yoann, et al.. (2018). Area-Selective Atomic Layer Deposition of TiN, TiO2, and HfO2 on Silicon Nitride with inhibition on Amorphous Carbon. Chemistry of Materials. 30(10). 3223–3232. 73 indexed citations
12.
Philipsen, Vicky, Laurent Souriau, Efrain Altamirano Sánchez, et al.. (2017). Single element and metal alloy novel EUV mask absorbers for improved imaging (Conference Presentation). 15–15. 5 indexed citations
13.
Horiguchi, Naoto, Alexey Milenin, Efrain Altamirano Sánchez, et al.. (2016). Patterning challenges in advanced device architectures: FinFETs to nanowires. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9782. 10. 4 indexed citations
14.
Lorusso, Gian F., et al.. (2016). Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9778. 97780V–97780V. 12 indexed citations
15.
McKenzie, Douglas S., Munirathna Padmanaban, G. Mannaert, et al.. (2016). Spin-on Metal Oxides and Their Applications for Next Generation Lithography. Journal of Photopolymer Science and Technology. 29(1). 59–67. 6 indexed citations
16.
Sánchez, Efrain Altamirano, Gian F. Lorusso, T. Hopf, et al.. (2016). Self-aligned quadruple patterning to meet requirements for fins with high density. SPIE Newsroom. 5 indexed citations
17.
Schepper, Peter De, et al.. (2014). Hydrogen plasma treatment: the evolution of roughness in frequency domain. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9054. 90540C–90540C. 3 indexed citations
18.
Paraschiv, Vasile, Werner Boullart, & Efrain Altamirano Sánchez. (2012). Dry Etching of Mo based layers and its interdependence with a poly-Si/MoOxNy/TiN/HfO2 gate stack. Microelectronic Engineering. 105. 60–64. 4 indexed citations
19.
Sánchez, Efrain Altamirano, Yoko Yamaguchi, Naoto Horiguchi, et al.. (2011). Dry Etch Fin Patterning of a Sub-22nm Node SRAM Cell: EUV Lithography New Dry Etch Challenges. ECS Transactions. 34(1). 377–382. 2 indexed citations
20.
Roig, J., et al.. (2011). Wafer Bevel Protection During Deep Reactive Ion Etching. IEEE Transactions on Semiconductor Manufacturing. 24(2). 358–365. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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2026