Jeffrey C. Shearer

1.4k total citations
17 papers, 111 citations indexed

About

Jeffrey C. Shearer is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Materials Chemistry. According to data from OpenAlex, Jeffrey C. Shearer has authored 17 papers receiving a total of 111 indexed citations (citations by other indexed papers that have themselves been cited), including 12 papers in Electrical and Electronic Engineering, 7 papers in Biomedical Engineering and 4 papers in Materials Chemistry. Recurrent topics in Jeffrey C. Shearer's work include Advancements in Photolithography Techniques (6 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers) and Semiconductor materials and devices (5 papers). Jeffrey C. Shearer is often cited by papers focused on Advancements in Photolithography Techniques (6 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers) and Semiconductor materials and devices (5 papers). Jeffrey C. Shearer collaborates with scholars based in United States, Netherlands and Italy. Jeffrey C. Shearer's co-authors include Ellen R. Fisher, Eloisa Sardella, Roberto Gristina, Pietro Favia, Patrick R. McCurdy, John Arnold, Indira Seshadri, Karen Petrillo, Andrew Metz and Jeffrey Smith and has published in prestigious journals such as Applied Surface Science, Review of Scientific Instruments and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

In The Last Decade

Jeffrey C. Shearer

15 papers receiving 110 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Jeffrey C. Shearer United States	7	46	40	36	33	14	17	111
Weiyi Tang China	6	16 0.3×	47 1.2×	54 1.5×	26 0.8×	15 1.1×	8	140
Bailin Zhang China	7	65 1.4×	29 0.7×	8 0.2×	50 1.5×	8 0.6×	13	142
Assaf Simon Israel	5	50 1.1×	71 1.8×	11 0.3×	48 1.5×	13 0.9×	6	138
Junye Dong New Zealand	5	19 0.4×	79 2.0×	23 0.6×	25 0.8×	3 0.2×	7	166
Noel M. Dawson United States	7	93 2.0×	44 1.1×	13 0.4×	52 1.6×	14 1.0×	11	170
Rebecca Fong United Kingdom	5	14 0.3×	21 0.5×	10 0.3×	31 0.9×	21 1.5×	11	106
Jiawei Liu China	6	100 2.2×	38 0.9×	11 0.3×	15 0.5×	4 0.3×	13	141
Milana Ibragimova Kazakhstan	6	40 0.9×	96 2.4×	3 0.1×	42 1.3×	8 0.6×	13	162
Menglei Xu Belgium	10	227 4.9×	89 2.2×	7 0.2×	26 0.8×	4 0.3×	30	253

Countries citing papers authored by Jeffrey C. Shearer

Since Specialization

Citations

This map shows the geographic impact of Jeffrey C. Shearer's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jeffrey C. Shearer with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jeffrey C. Shearer more than expected).

Fields of papers citing papers by Jeffrey C. Shearer

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jeffrey C. Shearer. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jeffrey C. Shearer. The network helps show where Jeffrey C. Shearer may publish in the future.

Co-authorship network of co-authors of Jeffrey C. Shearer

This figure shows the co-authorship network connecting the top 25 collaborators of Jeffrey C. Shearer. A scholar is included among the top collaborators of Jeffrey C. Shearer based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jeffrey C. Shearer. Jeffrey C. Shearer is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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17 of 17 papers shown

Agrawal, Richa, Nathan Marchack, Marinus Hopstaken, et al.. (2025). Single-step deep reactive ion etch of silicon for through-via applications with alternative gas mixtures. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 43(3).

Smith, Jeffrey, Xinghua Sun, Richard A. Farrell, et al.. (2018). Self-aligned blocking integration demonstration for critical sub-30-nm pitch Mx level patterning with EUV self-aligned double patterning. Journal of Micro/Nanolithography MEMS and MOEMS. 18(1). 1–1. 5 indexed citations

Pai, Vinay, et al.. (2018). Particle reduction in back end of line plasma-etching process: CFM: Contamination free manufacturing. 222–225. 1 indexed citations

Smith, Jeffrey, Xinghua Sun, Richard J. Farrell, et al.. (2018). Self-aligned blocking integration demonstration for critical sub-30nm pitch Mx level patterning with EUV self-aligned double patterning. 20–20. 3 indexed citations

Silva, Anuja De, Karen Petrillo, Luciana Meli, et al.. (2017). Single-expose patterning development for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431G–101431G. 7 indexed citations

Bonam, Ravi, Chi‐Chun Liu, Stuart Sieg, et al.. (2017). Comprehensive analysis of line-edge and line-width roughness for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431A–101431A. 3 indexed citations

Bonam, Ravi, Raja Muthinti, Chi‐Chun Liu, et al.. (2017). An OCD perspective of line edge and line width roughness metrology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10145. 1014511–1014511. 1 indexed citations

Niu, Chunping, M. Raymond, V. Kamineni, et al.. (2016). Interface preservation during Ge-rich source/drain contact formation. 320–323.

Tang, Hao, Jeffrey C. Shearer, Nicole Saulnier, et al.. (2015). Reduction of Critical Dimension Difference in Litho-Etch-Litho- Etch Double Patterning Process. Journal of Photopolymer Science and Technology. 28(1). 13–16. 3 indexed citations

10.

Sardella, Eloisa, et al.. (2015). N₂/H₂o Plasma Assisted Functionalization of Poly(ε‐caprolactone) Porous Scaffolds: Acidic/Basic Character versus Cell Behavior. Plasma Processes and Polymers. 12(8). 786–798. 15 indexed citations

11.

Hawker, Morgan J., et al.. (2015). Allylamine and Allyl Alcohol Plasma Copolymerization: Synthesis of Customizable Biologically‐Reactive Three‐Dimensional Scaffolds. Plasma Processes and Polymers. 12(12). 1435–1450. 7 indexed citations

12.

Shearer, Jeffrey C. & Ellen R. Fisher. (2013). Design and operation of a rotating drum radio frequency plasma reactor for the modification of free nanoparticles. Review of Scientific Instruments. 84(6). 63904–63904. 8 indexed citations

13.

Shearer, Jeffrey C. & Ellen R. Fisher. (2012). Enhancing Surface Functionality of Supported Fe<SUB>2</SUB>O<SUB>3</SUB> Nanoparticles Using Pulsed Plasma Deposition of Allyl Alcohol. Nanoscience and Nanotechnology Letters. 4(3). 358–363. 3 indexed citations

14.

Shearer, Jeffrey C., et al.. (2011). Comparing Isoelectric Point and Surface Composition of Plasma Modified Native and Deposited SiO₂ Films Using Contact Angle Titrations and X‐ray Photoelectron Spectroscopy. Plasma Processes and Polymers. 8(10). 951–964. 16 indexed citations

15.

Shearer, Jeffrey C., et al.. (2010). Isoelectric points of plasma‐modified and aged silicon oxynitride surfaces measured using contact angle titrations. Surface and Interface Analysis. 43(9). 1257–1270. 12 indexed citations

16.

Shearer, Jeffrey C., et al.. (2009). Composite SiO2/TiO2 and amine polymer/TiO2 nanoparticles produced using plasma-enhanced chemical vapor deposition. Applied Surface Science. 256(7). 2081–2091. 26 indexed citations

17.

Shearer, Jeffrey C., et al.. (2007). Enhanced surface functionality via plasma modification and plasma deposition techniques to create more biologically relevant materials. Digital Collections of Colorado (Colorado State University). 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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