Jeffrey C. Shearer

1.4k citations

17 papers · 111 indexed · h-index 7

Co-authors: Ellen R. Fisher Roberto Gristina Eloisa Sardella Pietro Favia Patrick R. McCurdy John Arnold Adoracion Pegalajar‐Jurado Yongan Xu
Topics: Advancements in Photolithography Techniques (6 papers)Integrated Circuits and Semiconductor Failure Analysis (6 papers)Semiconductor materials and devices (5 papers)
Cited by: Surfaces, Coatings and Films Biomaterials Materials Chemistry
Journals: Applied Surface Science Review of Scientific Instruments Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
Partner nations: United States Netherlands Italy

In The Last Decade

Jeffrey C. Shearer

15 papers receiving 110 citations

Peers

Countries citing papers authored by Jeffrey C. Shearer

Since Specialization

Citations

This map shows the geographic impact of Jeffrey C. Shearer's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jeffrey C. Shearer with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jeffrey C. Shearer more than expected).

Fields of papers citing papers by Jeffrey C. Shearer

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jeffrey C. Shearer. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jeffrey C. Shearer. The network helps show where Jeffrey C. Shearer may publish in the future.

Co-authorship network of co-authors of Jeffrey C. Shearer

This figure shows the co-authorship network connecting the top 25 collaborators of Jeffrey C. Shearer. A scholar is included among the top collaborators of Jeffrey C. Shearer based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jeffrey C. Shearer. Jeffrey C. Shearer is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

Sort: Min cites: Since: Top N: Style:

17 of 17 papers shown

#	Work	Indexed citations
1	Single-step deep reactive ion etch of silicon for through-via applications with alternative gas mixtures 2025 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Richa Agrawal,Nathan Marchack,(unknown),(unknown),(unknown),(unknown),(unknown),Marinus Hopstaken,B. To,(unknown),(unknown),Jeffrey C. Shearer,Robert L. Bruce	0
2	Self-aligned blocking integration demonstration for critical sub-30nm pitch Mx level patterning with EUV self-aligned double patterning 2018 ·(unknown),(unknown),Jeffrey Smith,Xinghua Sun,Richard J. Farrell,Jeffrey C. Shearer,Yongan Xu,(unknown),Andrew Metz,(unknown),(unknown),John Arnold,Nelson Felix	3
3	Self-aligned blocking integration demonstration for critical sub-30-nm pitch Mx level patterning with EUV self-aligned double patterning 2018 ·Journal of Micro/Nanolithography MEMS and MOEMS ·(unknown),(unknown),Jeffrey Smith,Xinghua Sun,Richard A. Farrell,Jeffrey C. Shearer,Yongan Xu,(unknown),Andrew Metz,(unknown),(unknown),John Arnold,Nelson Felix	5
4	Particle reduction in back end of line plasma-etching process: CFM: Contamination free manufacturing 2018 ·(unknown),(unknown),Vinay Pai,Jeffrey C. Shearer,Spyridon Skordas	1
5	Single-expose patterning development for EUV lithography 2017 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Anuja De Silva,Karen Petrillo,Luciana Meli,Jeffrey C. Shearer,(unknown),Lei Sun,Indira Seshadri,Tae-Hwan Oh,Seulgi Han,Nicole Saulnier,(unknown),John Arnold,Bassem Hamieh,Nelson Felix,Tsuyoshi Furukawa,(unknown),Ramakrishnan Ayothi	7
6	Comprehensive analysis of line-edge and line-width roughness for EUV lithography 2017 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ravi Bonam,Chi‐Chun Liu,(unknown),Stuart Sieg,Indira Seshadri,Nicole Saulnier,Jeffrey C. Shearer,Raja Muthinti,R. Patlolla,Huai Huang	3
7	An OCD perspective of line edge and line width roughness metrology 2017 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ravi Bonam,Raja Muthinti,(unknown),Chi‐Chun Liu,Stuart Sieg,Indira Seshadri,Nicole Saulnier,Jeffrey C. Shearer,R. Patlolla,Huai Huang	1
8	Interface preservation during Ge-rich source/drain contact formation 2016 ·Chunping Niu,M. Raymond,V. Kamineni,Jody Fronheiser,(unknown),(unknown),(unknown),(unknown),Praneet Adusumilli,Adra Carr,Jeffrey C. Shearer,J. Demarest,Li Jun Jiang,J. Li,Robert Hengstebeck	0
9	Reduction of Critical Dimension Difference in Litho-Etch-Litho- Etch Double Patterning Process 2015 ·Journal of Photopolymer Science and Technology ·Hao Tang,Jeffrey C. Shearer,(unknown),Nicole Saulnier,Stuart Sieg,Karen Petrillo,Andrew Metz,John Arnold	3
10	N₂/H₂o Plasma Assisted Functionalization of Poly(ε‐caprolactone) Porous Scaffolds: Acidic/Basic Character versus Cell Behavior 2015 ·Plasma Processes and Polymers ·Eloisa Sardella,Ellen R. Fisher,Jeffrey C. Shearer,(unknown),Roberto Gristina,Pietro Favia	15
11	Allylamine and Allyl Alcohol Plasma Copolymerization: Synthesis of Customizable Biologically‐Reactive Three‐Dimensional Scaffolds 2015 ·Plasma Processes and Polymers ·Morgan J. Hawker,Adoracion Pegalajar‐Jurado,(unknown),Jeffrey C. Shearer,Ellen R. Fisher	7
12	Design and operation of a rotating drum radio frequency plasma reactor for the modification of free nanoparticles 2013 ·Review of Scientific Instruments ·Jeffrey C. Shearer,Ellen R. Fisher	8
13	Enhancing Surface Functionality of Supported Fe<SUB>2</SUB>O<SUB>3</SUB> Nanoparticles Using Pulsed Plasma Deposition of Allyl Alcohol 2012 ·Nanoscience and Nanotechnology Letters ·Jeffrey C. Shearer,Ellen R. Fisher	3
14	Comparing Isoelectric Point and Surface Composition of Plasma Modified Native and Deposited SiO₂ Films Using Contact Angle Titrations and X‐ray Photoelectron Spectroscopy 2011 ·Plasma Processes and Polymers ·(unknown),Jeffrey C. Shearer,(unknown),Ellen R. Fisher	16
15	Isoelectric points of plasma‐modified and aged silicon oxynitride surfaces measured using contact angle titrations 2010 ·Surface and Interface Analysis ·(unknown),Jeffrey C. Shearer,Patrick R. McCurdy,(unknown),(unknown),Ellen R. Fisher	12
16	Composite SiO2/TiO2 and amine polymer/TiO2 nanoparticles produced using plasma-enhanced chemical vapor deposition 2009 ·Applied Surface Science ·Jeffrey C. Shearer,(unknown),(unknown),Ellen R. Fisher	26
17	Enhanced surface functionality via plasma modification and plasma deposition techniques to create more biologically relevant materials 2007 ·Digital Collections of Colorado (Colorado State University) ·Jeffrey C. Shearer,(unknown),(unknown),(unknown),(unknown),(unknown)	1

About Jeffrey C. Shearer

Jeffrey C. Shearer is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering and Electronic, Optical and Magnetic Materials, having authored 17 papers that have together received 111 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (6 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers) and Semiconductor materials and devices (5 papers). The work is most often cited by research in Surfaces, Coatings and Films (36 citations), Biomaterials (14 citations) and Materials Chemistry (40 citations). Jeffrey C. Shearer has collaborated with scholars based in United States, Netherlands and Italy. Frequent co-authors include Ellen R. Fisher, Roberto Gristina, Eloisa Sardella, Pietro Favia, Patrick R. McCurdy, John Arnold, Adoracion Pegalajar‐Jurado, Yongan Xu, Indira Seshadri and Karen Petrillo. Their work appears in journals such as Applied Surface Science, Review of Scientific Instruments and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact