William D. Hinsberg

6.2k total citations · 1 hit paper
135 papers, 5.2k citations indexed

About

William D. Hinsberg is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, William D. Hinsberg has authored 135 papers receiving a total of 5.2k indexed citations (citations by other indexed papers that have themselves been cited), including 97 papers in Electrical and Electronic Engineering, 53 papers in Biomedical Engineering and 29 papers in Surfaces, Coatings and Films. Recurrent topics in William D. Hinsberg's work include Advancements in Photolithography Techniques (79 papers), Nanofabrication and Lithography Techniques (31 papers) and Integrated Circuits and Semiconductor Failure Analysis (28 papers). William D. Hinsberg is often cited by papers focused on Advancements in Photolithography Techniques (79 papers), Nanofabrication and Lithography Techniques (31 papers) and Integrated Circuits and Semiconductor Failure Analysis (28 papers). William D. Hinsberg collaborates with scholars based in United States, Japan and Switzerland. William D. Hinsberg's co-authors include Ho‐Cheol Kim, Gregory M. Wallraff, Sang-Min Park, Frances A. Houle, M. Sanchez, John A. Hoffnagle, Joy Cheng, Daniel P. Sanders, Veena Rao and R. Miller and has published in prestigious journals such as Science, Chemical Reviews and Proceedings of the National Academy of Sciences.

In The Last Decade

William D. Hinsberg

133 papers receiving 4.9k citations

Hit Papers

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What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics

2009 864 citations Ho‐Cheol Kim, William D. Hinsberg et al. profile →

Peers

Countries citing papers authored by William D. Hinsberg

Since Specialization

Citations

This map shows the geographic impact of William D. Hinsberg's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by William D. Hinsberg with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites William D. Hinsberg more than expected).

Fields of papers citing papers by William D. Hinsberg

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by William D. Hinsberg. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by William D. Hinsberg. The network helps show where William D. Hinsberg may publish in the future.

Co-authorship network of co-authors of William D. Hinsberg

This figure shows the co-authorship network connecting the top 25 collaborators of William D. Hinsberg. A scholar is included among the top collaborators of William D. Hinsberg based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with William D. Hinsberg. William D. Hinsberg is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Comparison of the spatial statistics of random and defined-sequence photoresist films 2024 ·Journal of Micro/Nanopatterning Materials and Metrology ·William D. Hinsberg, Frances A. Houle	0
2	Fundamental understanding of chemical processes in extreme ultraviolet resist materials 2018 ·The Journal of Chemical Physics ·Oleg Kostko, Bo Xu, Musahid Ahmed, Daniel Slaughter, D. Frank Ogletree, Kristina D. Closser, David Prendergast, Patrick Naulleau, Deirdre L. Olynick, Paul D. Ashby, Yi Liu, William D. Hinsberg, Gregory M. Wallraff	28
3	Oxidation of a model alkane aerosol by OH radical: the emergent nature of reactive uptake 2015 ·Physical Chemistry Chemical Physics ·Frances A. Houle, William D. Hinsberg, Kevin R. Wilson	69
4	Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling 2012 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Ramakrishnan Ayothi, (unknown), (unknown), Jed W. Pitera, Linda K. Sundberg, Martha I. Sanchez, Luisa Bozano, Kumar Virwani, Hoa D. Truong, Noel Arellano, Karen Petrillo, Gregory M. Wallraff, William D. Hinsberg, (unknown)	2
5	Hexafluoroalcohol (HFA) containing molecular resist materials for high-resolution lithographic applications 2011 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Anuja De Silva, Linda K. Sundberg, Ratnam Sooriyakumaran, Luisa Bozano, Greg Breyta, William D. Hinsberg, Masaki Fujiwara	1
6	Integration of Directed Self-Assembly with 193 nm Lithography 2010 ·Journal of Photopolymer Science and Technology ·Daniel P. Sanders, Joy Cheng, Charles Rettner, William D. Hinsberg, Ho‐Cheol Kim, (unknown), (unknown), Stefan Harrer, Steven J. Holmes, Matthew Colburn	22
7	Lasing in interferometrically structured organic materials 2005 ·Applied Physics Letters ·(unknown), John A. Hoffnagle, William D. Hinsberg, Rainer F. Mahrt, Nikolaj Moll, Daniel Erni, (unknown)	2
8	Characterization of photoresist spatial resolution by interferometric lithography 2003 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·John A. Hoffnagle, William D. Hinsberg, Frances A. Houle, Martha I. Sanchez	11
9	Using the critical ionization model for resist development to estimate contrast curves and roughening 2003 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Frances A. Houle, William D. Hinsberg, Martha I. Sanchez	2
10	High-NA lithographic imagery at Brewster's angle 2002 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Timothy A. Brunner, (unknown), William D. Hinsberg, John A. Hoffnagle, Frances A. Houle, Martha I. Sanchez	11
11	Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns 2002 ·Applied Physics Letters ·Cattien V. Nguyen, Ramsey Stevens, Jabulani R. Barber, Jie Han, M. Meyyappan, Martha I. Sanchez, Carl E. Larson, William D. Hinsberg	56
12	Effect of resist components on image spreading during postexposure bake of chemically amplified resists 2000 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·William D. Hinsberg, Frances A. Houle, Martha I. Sanchez, (unknown), Gregory M. Wallraff, Carl E. Larson, John A. Hoffnagle, Phillip J. Brock, Gregory Breyta	46
13	Silyl-protected hydroxystyrenes: Living anionic polymerization at room temperature and selective desilylation 2000 ·Journal of Polymer Science Part A Polymer Chemistry ·Hiroshi Itô, (unknown), Stefan Lundmark, Cattien V. Nguyen, William D. Hinsberg	11
14	Aerial image contrast using interferometric lithography: effect on line-edge roughness 1999 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Martha I. Sanchez, William D. Hinsberg, Frances A. Houle, John A. Hoffnagle, Hiroshi Itô, Cattien V. Nguyen	43
15	<title>Kinetics of chemically amplified resists</title> 1995 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Gregory M. Wallraff, William D. Hinsberg, Frances A. Houle, (unknown), (unknown), John M. Hutchinson	8
16	<title>Molecular design for stabilization of chemical amplification resist toward airborne contamination</title> 1993 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Hiroshi Ito, (unknown), Nicholas J. Clecak, Gregory Breyta, (unknown), Do Y. Yoon, Ratnam Sooriyakumaran, William D. Hinsberg	9
17	<title>Acid-catalyzed single-layer resists for ArF lithography</title> 1993 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Roderick R. Kunz, Robert D. Allen, William D. Hinsberg, Gregory M. Wallraff	28
18	A chemically amplified photoresist for visible laser direct imaging 1992 ·Journal of Imaging Science and Technology ·Gregory M. Wallraff, Robert D. Allen, William D. Hinsberg, C. Grant Willson, Logan Simpson, S. E. Webber	8
19	Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis 1992 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·William D. Hinsberg, Scott Macdonald, Nicholas J. Clecak, Clinton D. Snyder	10
20	Synthesis and direct spectroscopic observation of a 1,1-dialkyldiazene. Infrared and electronic spectrum of N-(2,2,6,6-tetramethylpiperidyl)nitrene 1978 ·Journal of the American Chemical Society ·William D. Hinsberg, Peter B. Dervan	41

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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