Andrew Metz

1.2k total citations
40 papers, 1.0k citations indexed

About

Andrew Metz is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Andrew Metz has authored 40 papers receiving a total of 1.0k indexed citations (citations by other indexed papers that have themselves been cited), including 35 papers in Electrical and Electronic Engineering, 17 papers in Materials Chemistry and 7 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Andrew Metz's work include Advancements in Photolithography Techniques (17 papers), ZnO doping and properties (15 papers) and Semiconductor materials and devices (10 papers). Andrew Metz is often cited by papers focused on Advancements in Photolithography Techniques (17 papers), ZnO doping and properties (15 papers) and Semiconductor materials and devices (10 papers). Andrew Metz collaborates with scholars based in United States, Japan and Philippines. Andrew Metz's co-authors include Tobin J. Marks, Jun Ni, Shu Jin, John R. Ireland, A. J. Freeman, Carl R. Kannewurf, Yu Yang, Julia E. Medvedeva, Yu Yang and N.L. Edleman and has published in prestigious journals such as Proceedings of the National Academy of Sciences, Journal of the American Chemical Society and Advanced Materials.

In The Last Decade

Andrew Metz

39 papers receiving 998 citations

Peers

Countries citing papers authored by Andrew Metz

Since Specialization

Citations

This map shows the geographic impact of Andrew Metz's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Andrew Metz with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Andrew Metz more than expected).

Fields of papers citing papers by Andrew Metz

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Andrew Metz. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Andrew Metz. The network helps show where Andrew Metz may publish in the future.

Co-authorship network of co-authors of Andrew Metz

This figure shows the co-authorship network connecting the top 25 collaborators of Andrew Metz. A scholar is included among the top collaborators of Andrew Metz based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Andrew Metz. Andrew Metz is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Autonomous hybrid optimization of a SiO2 plasma etching mechanism 2024 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown), (unknown), Pingshan Luan, (unknown), Andrew Metz, Mark J. Kushner	2
2	Exploring oxide-nitride-oxide scalloping behavior with small gap structure and chemical analysis after fluorocarbon or hydrofluorocarbon plasma processing 2023 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·S.H. Chung, Pingshan Luan, (unknown), Andrew Metz, G. S. Oehrlein	6
3	High-aspect-ratio amorphous carbon mask etch profile control through plasma and surface chemistry optimization 2023 ·Du Zhang, (unknown), (unknown), Amrit Kaphle, (unknown), (unknown), (unknown), Andrew Metz, (unknown), (unknown)	1
4	Characterization of TSV etch from a sustainability standpoint 2023 ·(unknown), Nathan Marchack, (unknown), (unknown), (unknown), (unknown), (unknown), Marinus Hopstaken, Andrew Metz, (unknown), Robert L. Bruce	1
5	Advanced multiple patterning technologies for high density hexagonal hole arrays 2021 ·(unknown), (unknown), (unknown), Andrew Metz, (unknown), (unknown)	4
6	Plasma etch selectivity study and material screening for self-aligned gate contact (SAGC) 2019 ·D. Radisic, M. Demand, (unknown), S. Demuynck, (unknown), Andrew Metz, Lieve Teugels, (unknown), Jeffrey Smith, Farid Sebaai, T. Hopf, Efrain Altamirano Sánchez	2
7	Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle 2017 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Cheng Chi, Chi‐Chun Liu, Luciana Meli, Jing Guo, (unknown), Yann Mignot, Kristin Schmidt, Martha I. Sanchez, Richard A. Farrell, (unknown), Tsuyoshi Furukawa, Kafai Lai, Yongan Xu, Daniel P. Sanders, (unknown), Andrew Metz, Sean Burns, Nelson Felix, John Arnold, Daniel Corliss	2
8	Self-aligned blocking integration demonstration for critical sub-40nm pitch Mx level patterning 2017 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Nihar Mohanty, Xinghua Sun, Richard A. Farrell, Jeffrey Smith, (unknown), Andrew Metz, (unknown), (unknown)	6
9	DSA via hole shrink for advanced node applications 2016 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Cheng Chi, Chi‐Chun Liu, Luciana Meli, Kristin Schmidt, Yongan Xu, (unknown), Martha I. Sanchez, Richard A. Farrell, (unknown), (unknown), (unknown), Tsuyoshi Furukawa, Kafai Lai, Jed W. Pitera, Daniel P. Sanders, (unknown), Andrew Metz, Nelson Felix, John Arnold, Matthew Colburn	6
10	Reduction of Critical Dimension Difference in Litho-Etch-Litho- Etch Double Patterning Process 2015 ·Journal of Photopolymer Science and Technology ·Hao Tang, Jeffrey C. Shearer, (unknown), Nicole Saulnier, Stuart Sieg, Karen Petrillo, Andrew Metz, John Arnold	3
11	Utilization of spin-on and reactive ion etch critical dimension shrink with double patterning for 32 nm and beyond contact level interconnects 2009 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Karen Petrillo, (unknown), (unknown), Erin Mclellan, (unknown), Andrew Metz, (unknown), (unknown), (unknown), Kenichi Ueda, (unknown), (unknown), (unknown), (unknown)	7
12	Tuning the Properties of Transparent Oxide Conductors. Dopant Ion Size and Electronic Structure Effects on CdO-Based Transparent Conducting Oxides. Ga- and In-Doped CdO Thin Films Grown by MOCVD 2007 ·Chemistry of Materials ·Shu Jin, Yu Yang, Julia E. Medvedeva, Lian Wang, Shuyou Li, (unknown), John R. Ireland, Andrew Metz, Jun Ni, Mark C. Hersam, A. J. Freeman, Tobin J. Marks	64
13	CdO as the Archetypical Transparent Conducting Oxide. Systematics of Dopant Ionic Radius and Electronic Structure Effects on Charge Transport and Band Structure 2005 ·Journal of the American Chemical Society ·Yu Yang, Shu Jin, Julia E. Medvedeva, John R. Ireland, Andrew Metz, Jun Ni, Mark C. Hersam, A. J. Freeman, Tobin J. Marks	148
14	Highly Transparent and Conductive CdO Thin Films as Anodes for Organic Light-Emitting Diodes 2005 ·MRS Proceedings ·Yu Yang, Qinglan Huang, Andrew Metz, Shu Jin, Jun Ni, Lian Wang, Tobin J. Marks	1
15	MOCVD Growth of Transparent Conducting Cd₂SnO₄ Thin Films 2004 ·Chemical Vapor Deposition ·Andrew Metz, M. A. Lane, (unknown), K.R. Poeppelmeier, Tobin J. Marks	18
16	High‐Performance Organic Light‐Emitting Diodes Using ITO Anodes Grown on Plastic by Room‐ Temperature Ion‐Assisted Deposition 2004 ·Advanced Materials ·Yu Yang, Qinglan Huang, Andrew Metz, Jun Ni, Shu Jin, Tobin J. Marks, (unknown), A. DiVenere, Seng Tiong Ho	107
17	First-principles calculations for understanding high conductivity and optical transparency in InxCd1−xO films 2002 ·Thin Solid Films ·Ryoji Asahi, A. Wang, Jason R. Babcock, N.L. Edleman, Andrew Metz, M. A. Lane, Vinayak P. Dravid, Carl R. Kannewurf, A. J. Freeman, Tobin J. Marks	44
18	Indium-cadmium-oxide films having exceptional electrical conductivity and optical transparency: Clues for optimizing transparent conductors 2001 ·Proceedings of the National Academy of Sciences ·A. Wang, Jason R. Babcock, N.L. Edleman, Andrew Metz, M. A. Lane, Ryoji Asahi, V. P. Dravid, Carl R. Kannewurf, A. J. Freeman, T.J. Marks	121
19	Transparent Conducting CdO Thin Film Growth Using a Highly Volatile, Thermally and Air-Stable Cadmium Precursor 2001 ·Chemical Vapor Deposition ·Jason R. Babcock, A. Wang, Andrew Metz, N.L. Edleman, M. Metz, M. A. Lane, (unknown), Tobin J. Marks	24
20	Development and Implementation of New Volatile Cd and Zn Precursors for the Growth of Transparent Conducting Oxide Thin Films Via Mocvd 2000 ·MRS Proceedings ·Jason R. Babcock, A. Wang, N.L. Edleman, (unknown), Andrew Metz, M. Metz, T.J. Marks	4

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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