Maxime Argoud

516 total citations
48 papers, 368 citations indexed

About

Maxime Argoud is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Biomedical Engineering. According to data from OpenAlex, Maxime Argoud has authored 48 papers receiving a total of 368 indexed citations (citations by other indexed papers that have themselves been cited), including 44 papers in Electrical and Electronic Engineering, 25 papers in Materials Chemistry and 22 papers in Biomedical Engineering. Recurrent topics in Maxime Argoud's work include Advancements in Photolithography Techniques (31 papers), Block Copolymer Self-Assembly (25 papers) and Nanofabrication and Lithography Techniques (14 papers). Maxime Argoud is often cited by papers focused on Advancements in Photolithography Techniques (31 papers), Block Copolymer Self-Assembly (25 papers) and Nanofabrication and Lithography Techniques (14 papers). Maxime Argoud collaborates with scholars based in France, United States and Switzerland. Maxime Argoud's co-authors include Raluca Tiron, Christophe Navarro, Xavier Chevalier, Patricia Pimenta‐Barros, S. Barnola, A. Gharbi, Georges Hadziioannou, Guillaume Fleury, N. Possémé and Gilles Cunge and has published in prestigious journals such as Nanotechnology, Japanese Journal of Applied Physics and Journal of Crystal Growth.

In The Last Decade

Maxime Argoud

48 papers receiving 357 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Maxime Argoud France 12 271 251 143 44 42 48 368
E. Sikorski United States 8 264 1.0× 266 1.1× 128 0.9× 52 1.2× 69 1.6× 12 445
S. Barnola France 15 467 1.7× 238 0.9× 149 1.0× 38 0.9× 27 0.6× 49 530
Patricia Pimenta‐Barros France 11 240 0.9× 213 0.8× 98 0.7× 31 0.7× 17 0.4× 47 307
Jeffrey Smith United States 7 296 1.1× 210 0.8× 91 0.6× 35 0.8× 22 0.5× 15 369
Naoko Kihara Japan 11 147 0.5× 224 0.9× 138 1.0× 70 1.6× 46 1.1× 50 333
Guanyang Lin United States 11 265 1.0× 374 1.5× 151 1.1× 81 1.8× 33 0.8× 38 457
Kanaiyalal C. Patel United States 10 131 0.5× 295 1.2× 114 0.8× 74 1.7× 60 1.4× 13 367
Shih‐wei Chang United States 6 215 0.8× 233 0.9× 268 1.9× 24 0.5× 43 1.0× 9 344
Seiji Nagahara Japan 11 429 1.6× 122 0.5× 202 1.4× 184 4.2× 24 0.6× 44 502
Sung Chan Park South Korea 13 219 0.8× 290 1.2× 106 0.7× 38 0.9× 46 1.1× 26 404

Countries citing papers authored by Maxime Argoud

Since Specialization
Citations

This map shows the geographic impact of Maxime Argoud's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Maxime Argoud with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Maxime Argoud more than expected).

Fields of papers citing papers by Maxime Argoud

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Maxime Argoud. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Maxime Argoud. The network helps show where Maxime Argoud may publish in the future.

Co-authorship network of co-authors of Maxime Argoud

This figure shows the co-authorship network connecting the top 25 collaborators of Maxime Argoud. A scholar is included among the top collaborators of Maxime Argoud based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Maxime Argoud. Maxime Argoud is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Pimenta‐Barros, Patricia, et al.. (2021). Selective plasma etching of silicon-containing high chi block copolymer for directed self-assembly (DSA) application. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 39(4). 4 indexed citations
2.
Argoud, Maxime, et al.. (2021). Lamination of dry film epoxy molding compounds for 3D packaging: advances and challenges. SPIRE - Sciences Po Institutional REpository. 2043–2048. 3 indexed citations
3.
Charles, Matthew, Patricia Pimenta‐Barros, Maxime Argoud, et al.. (2019). SiGe nano-heteroepitaxy: An investigation of the nano-template. Journal of Crystal Growth. 527. 125232–125232. 1 indexed citations
4.
Charles, Matthew, Y. Bogumilowicz, Quang Minh Thai, et al.. (2018). SiGe nano-heteroepitaxy on Si and SiGe nano-pillars. Nanotechnology. 29(27). 275702–275702. 5 indexed citations
5.
Possémé, N., Patricia Pimenta‐Barros, S. Barnola, et al.. (2018). Block copolymer selectivity: A new dry etch approach for cylindrical applications. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 36(4). 3 indexed citations
6.
Stokes, H. W., et al.. (2017). DSA process window expansion with novel DSA track hardware. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10146. 101461X–101461X. 2 indexed citations
7.
Pimenta‐Barros, Patricia, Maxime Argoud, J. Hazart, et al.. (2017). Advanced surface affinity control for DSA contact hole shrink applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10144. 101440O–101440O. 4 indexed citations
8.
Tiron, Raluca, Maxime Argoud, Patricia Pimenta‐Barros, et al.. (2016). Process highlights to enhance directed self-assembly contact patterning performances. Journal of Micro/Nanolithography MEMS and MOEMS. 15(4). 43503–43503. 8 indexed citations
9.
Stokes, H. W., et al.. (2016). Investigation of coat-develop track system for placement error of contact hole shrink process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9777. 97770O–97770O. 2 indexed citations
10.
Argoud, Maxime, J. Hazart, Patricia Pimenta‐Barros, et al.. (2016). Surface affinity role in graphoepitaxy of lamellar block copolymers. Journal of Micro/Nanolithography MEMS and MOEMS. 15(3). 31604–31604. 6 indexed citations
11.
Pimenta‐Barros, Patricia, A. Gharbi, Raluca Tiron, et al.. (2015). DSA planarization approach to solve pattern density issue. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9428. 94280D–94280D. 14 indexed citations
12.
Tiron, Raluca, et al.. (2015). PMMA removal options by wet development in PS-b-PMMA block copolymer for nanolithographic mask fabrication. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 33(5). 19 indexed citations
13.
Pimenta‐Barros, Patricia, N. Possémé, S. Barnola, et al.. (2015). PMMA removal selectivity to PS using dry etch approach for sub-10nm node applications. 9054. 1–3. 1 indexed citations
14.
Tiron, Raluca, Xavier Chevalier, Maxime Argoud, et al.. (2015). Contact hole shrink and multiplication by directed self-assembly of block copolymers: from material to integration. MRS Proceedings. 1750. 1 indexed citations
15.
Gharbi, A., Raluca Tiron, Maxime Argoud, et al.. (2014). Contact holes patterning by directed self-assembly of block copolymers: What would be the Bossung plot?. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9049. 90491N–90491N. 13 indexed citations
16.
Argoud, Maxime, A. Gharbi, Patricia Pimenta‐Barros, et al.. (2014). 300mm pilot line DSA contact hole process stability. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9049. 904929–904929. 25 indexed citations
17.
Rochat, N., et al.. (2013). Photo-dielectric polymers material characterizations for 3D packaging applications. 27–32. 4 indexed citations
18.
Landis, S., et al.. (2013). Metallic colour filtering arrays manufactured by NanoImprint lithography. Microelectronic Engineering. 111. 193–198. 17 indexed citations
19.
Landis, S., et al.. (2012). Metallic colour filtering arrays manufactured by nanoimprint lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8428. 842807–842807. 3 indexed citations
20.
Argoud, Maxime, et al.. (1981). Solar concentrator panel and gore testing in the JPL 25-foot space simulator. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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