Lars W. Liebmann

2.0k citations

90 papers · 1.3k indexed · h-index 21

Impact in

Hardware and Architecture top 2%
- VLSI and Analog Circuit Testing
Electrical and Electronic Engineering top 5%
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Advancements in Semiconductor Devices and Circuit Design
- VLSI and FPGA Design Techniques
- Semiconductor materials and devices
- 3D IC and TSV technologies

Papers in

Surfaces, Coatings and Films 15
- Electron and X-Ray Spectroscopy Techniques 11
Hardware and Architecture 11
- VLSI and Analog Circuit Testing 11

Co-authors: Scott Mansfield Alfred K. K. Wong Larry Pileggi Andrzej J. Strojwas Vyacheslav Rovner Richard A. Ferguson Ruilong Xie Ajey P. Jacob
Journals: Journal of Micro/Nanolithography MEMS and MOEMS (3 papers)IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (2 papers)IBM Journal of Research and Development (1 paper)Review of Scientific Instruments (1 paper)IEEE Design and Test (1 paper)
Partner nations: United States South Korea Germany

In The Last Decade

Lars W. Liebmann

88 papers receiving 1.2k citations

Peers

Countries citing papers authored by Lars W. Liebmann

Since Specialization

Citations

This map shows the geographic impact of Lars W. Liebmann's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Lars W. Liebmann with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Lars W. Liebmann more than expected).

Fields of papers citing papers by Lars W. Liebmann

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Lars W. Liebmann. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Lars W. Liebmann. The network helps show where Lars W. Liebmann may publish in the future.

Co-authors

The 25 scholars most cited alongside Lars W. Liebmann, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Lars W. Liebmann Line = papers co-authored together Lars W. Liebmann links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Overcoming scaling barriers through design technology CoOptimization Lars W. Liebmann, 啸鲁, Xuelian Zhu, Lei Yuan, G. Bouche, Jongwook Kye	2016	39
2	Pushing multiple patterning in sub-10nm David Z. Pan, Lars W. Liebmann, Bei Yu, Xiaoqing Xu, Yibo Lin	2015	27
3	Design and technology co-optimization near single-digit nodes International Conference on Computer Aided Design ·Lars W. Liebmann, Rasit Onur Topaloglu	2014	4
4	Sub-20 nm design technology co-optimization for standard cell logic International Conference on Computer Aided Design ·Kaushik Vaidyanathan, Lars W. Liebmann, Andrzej J. Strojwas, Larry Pileggi	2014	4
5	Exploiting sub-20-nm complementary metal-oxide semiconductor technology challenges to design affordable systems-on-chip Journal of Micro/Nanolithography MEMS and MOEMS ·Kaushik Vaidyanathan, Nadia Zahara, Lars W. Liebmann, Kafai Lai, 伸吉田, Renzhi Liu, Yandong Liu, Yves Alexandrinho Bandeira, Larry Pileggi	2014	7
6	Design and technology co-optimization near single-digit nodes Lars W. Liebmann, Rasit Onur Topaloglu	2014	9
7	<title>Local loops for robust inter-layer routing at sub-20 nm nodes</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Wenbin Huang, Daniel Morris, Neal Lafferty, Lars W. Liebmann, Kaushik Vaidyanathan, Kafai Lai, Larry Pileggi, Andrzej J. Strojwas	2012	4
8	A framework for double patterning-enabled design International Conference on Computer Aided Design ·П. А. Тихонов, Kanak Agarwal, Sani Nassif, Xin Yuan, Lars W. Liebmann, Puneet Gupta	2011	10
9	Design of embedded memory and logic based on pattern constructs Symposium on VLSI Technology ·Daniel Morris, Kaushik Vaidyanathan, Neal Lafferty, Kafai Lai, Lars W. Liebmann, Larry Pileggi	2011	12
10	Decomposition-aware standard cell design flows to enable double-patterning technology Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Lars W. Liebmann, Madeline Depman, E.C. Calvo	2011	30
11	Taming the final frontier of optical lithography: design for sub-resolution patterning Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Lars W. Liebmann, Jongwook Kye, Byung‐Sung Kim, Lei Yuan, Zhang Anfan	2010	10
12	Compensating non-optical effects using electrically driven optical proximity correction Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Shayak Banerjee, Kanak Agarwal, Önder Saatçi, S.G. Shapovalov, Lars W. Liebmann, Michael Orshansky	2009	2
13	Layout Methodology Impact of Resolution Enhancement Techniques Lars W. Liebmann	2009	1
14	Electrically driven optical proximity correction based on linear programming International Conference on Computer Aided Design ·Shayak Banerjee, S.G. Shapovalov, Lars W. Liebmann, Michael Orshansky	2008	12
15	Phase edge lithography for sub 0.1 μm electrical channel length in a 200 mm full CMOS process P. Agnello, Thomas H. Newman, E.F. Crabbé, S. Subbanna, E. Ganin, Lars W. Liebmann, J.H. Comfort, D.A. Sunderland	2002	2
16	Optimizing style options for subresolution assist features Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Lars W. Liebmann, James A. Bruce, Elizabeth Ledezma Sequeira, K N Bhoomika, María Angélica Cantero Hernández, S Aiswaryalakshmi, Vázquez André J, Scott Mansfield, Anne McGuire, Ronald E. Rocha	2001	23
17	Enabling alternating phase shifted mask designs for a full logic gate level Lars W. Liebmann	2001	14
18	<title>Impact of attenuated mask topography on lithographic performance</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard A. Ferguson, Jeswin Vincent Raj R, Anshu Bala Verma, Nursultan Mizamov, Shivam Vinayak, Bjorndal Am, Alfred K. K. Wong, Lars W. Liebmann, Alessandro Callegari, Najem El Mahjoub El Garhia, Dalal Emad AlSadoun, Pedro R.M. Maia	1994	4
19	A dual beam total internal reflection fluorescence spectrometer for dynamic depth resolved measurements of biochemical liquid-solid interface binding reactions in opaque solvents Review of Scientific Instruments ·Lars W. Liebmann, John A. Robinson, Kenneth G. Mann	1991	9
20	Summary Abstract: Liquid metal ion sources and applications in focused ion beam systems Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ·J. C. Corelli, Bastian Weltjen, S. Balakrishnan, Lars W. Liebmann	1988	2

About Lars W. Liebmann

Lars W. Liebmann is a scholar working on Surfaces, Coatings and Films, Hardware and Architecture, Electrical and Electronic Engineering, Industrial and Manufacturing Engineering and Computer Graphics and Computer-Aided Design, having authored 90 papers that have together received 1.3k indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (72 papers), Integrated Circuits and Semiconductor Failure Analysis (32 papers), 3D IC and TSV technologies (15 papers), Semiconductor materials and devices (15 papers), VLSI and FPGA Design Techniques (14 papers), Advancements in Semiconductor Devices and Circuit Design (12 papers), VLSI and Analog Circuit Testing (11 papers) and Electron and X-Ray Spectroscopy Techniques (11 papers). The work is most often cited by research in Hardware and Architecture (296 citations), Electrical and Electronic Engineering (1.2k citations), Industrial and Manufacturing Engineering (138 citations), Surfaces, Coatings and Films (64 citations) and Media Technology (66 citations). Lars W. Liebmann has collaborated with scholars based in United States, South Korea and Germany. Frequent co-authors include Scott Mansfield, Alfred K. K. Wong, Larry Pileggi, Andrzej J. Strojwas, Vyacheslav Rovner, Richard A. Ferguson, Ruilong Xie, Ajey P. Jacob, B. Taylor and Rinus T. P. Lee. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, IBM Journal of Research and Development, Review of Scientific Instruments and IEEE Design and Test.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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