Chris Bencher
- Surfaces, Coatings and Films top 10%
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- Advancements in Photolithography Techniques 15
- 3D IC and TSV technologies 6
- Integrated Circuits and Semiconductor Failure Analysis 3
- Hardware and Architecture top 10%
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- Advanced Surface Polishing Techniques 5
- Nanofabrication and Lithography Techniques 4
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- Block Copolymer Self-Assembly 4
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- Copper Interconnects and Reliability 6
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- Industrial Vision Systems and Defect Detection 3
- Co-authors
- Huixiong DaiYong Mei ChenWarren MontgomeryLi‐Wen ChangH.‐S. Philip WongXinyu BaoHe YiJoy Cheng
- Journals
- IEEE Transactions on Semiconductor Manufacturing (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (17 papers)
- Partner nations
- United StatesBelgiumIsrael
In The Last Decade
Chris Bencher
20 papers receiving 423 citations
Peers
Comparison fields: 5 of 29
- Surfaces, Coatings and Films 65
- Electrical and Electronic Engineering 361
- Hardware and Architecture 42
- Biomedical Engineering 173
- Materials Chemistry 168
Countries citing papers authored by Chris Bencher
This map shows the geographic impact of Chris Bencher's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Chris Bencher with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Chris Bencher more than expected).
Fields of papers citing papers by Chris Bencher
This network shows the impact of papers produced by Chris Bencher. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Chris Bencher. The network helps show where Chris Bencher may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Chris Bencher, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2024 | 1 | |
| 2 | 2013 | 5 | |
| 3 | 2012 | 0 | |
| 4 | 2012 | 34 | |
| 5 | 2012 | 54 | |
| 6 | 2011 | 19 | |
| 7 | 2011 | 16 | |
| 8 | 2011 | 8 | |
| 9 | 2011 | 89 | |
| 10 | 2011 | 8 | |
| 11 | 2011 | 17 | |
| 12 | 2010 | 2 | |
| 13 | 2010 | 35 | |
| 14 | 2010 | 19 | |
| 15 | 2009 | 8 | |
| 16 | 2009 | 9 | |
| 17 | 2009 | 4 | |
| 18 | 2008 | 4 | |
| 19 | 2008 | 101 | |
| 20 | 2007 | 2 |
About Chris Bencher
Chris Bencher is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Industrial and Manufacturing Engineering and Biomedical Engineering, having authored 22 papers that have together received 442 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (15 papers), Copper Interconnects and Reliability (6 papers), 3D IC and TSV technologies (6 papers), Advanced Surface Polishing Techniques (5 papers), Nanofabrication and Lithography Techniques (4 papers), Block Copolymer Self-Assembly (4 papers), Integrated Circuits and Semiconductor Failure Analysis (3 papers) and Industrial Vision Systems and Defect Detection (3 papers). The work is most often cited by research in Surfaces, Coatings and Films (65 citations), Electrical and Electronic Engineering (361 citations), Hardware and Architecture (42 citations), Biomedical Engineering (173 citations) and Materials Chemistry (168 citations). Chris Bencher has collaborated with scholars based in United States, Belgium and Israel. Frequent co-authors include Huixiong Dai, Yong Mei Chen, Warren Montgomery, Li‐Wen Chang, H.‐S. Philip Wong, Xinyu Bao, He Yi, Joy Cheng, Jeffrey Smith and Daniel P. Sanders. Their work appears in journals such as IEEE Transactions on Semiconductor Manufacturing and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.