Chris Bencher

554 total citations
22 papers, 442 citations indexed

About

Chris Bencher is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Chris Bencher has authored 22 papers receiving a total of 442 indexed citations (citations by other indexed papers that have themselves been cited), including 19 papers in Electrical and Electronic Engineering, 8 papers in Biomedical Engineering and 6 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Chris Bencher's work include Advancements in Photolithography Techniques (15 papers), Copper Interconnects and Reliability (6 papers) and 3D IC and TSV technologies (6 papers). Chris Bencher is often cited by papers focused on Advancements in Photolithography Techniques (15 papers), Copper Interconnects and Reliability (6 papers) and 3D IC and TSV technologies (6 papers). Chris Bencher collaborates with scholars based in United States, Belgium and Israel. Chris Bencher's co-authors include Huixiong Dai, Yong Mei Chen, Warren Montgomery, Li‐Wen Chang, H.‐S. Philip Wong, Xinyu Bao, He Yi, Joy Cheng, Jeffrey Smith and Daniel P. Sanders and has published in prestigious journals such as IEEE Transactions on Semiconductor Manufacturing and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

In The Last Decade

Chris Bencher

20 papers receiving 423 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Chris Bencher United States 10 361 173 168 65 42 22 442
Huixiong Dai United States 10 388 1.1× 206 1.2× 205 1.2× 76 1.2× 43 1.0× 33 498
Kathleen Nafus Belgium 12 309 0.9× 155 0.9× 176 1.0× 107 1.6× 12 0.3× 69 409
Neal Lafferty United States 11 293 0.8× 155 0.9× 68 0.4× 129 2.0× 12 0.3× 42 368
Yuansheng Ma United States 12 377 1.0× 158 0.9× 75 0.4× 49 0.8× 20 0.5× 41 436
Joo-Tae Moon South Korea 8 311 0.9× 127 0.7× 147 0.9× 42 0.6× 8 0.2× 68 382
Daniel Corliss United States 8 212 0.6× 72 0.4× 107 0.6× 73 1.1× 5 0.1× 23 311
Warren Montgomery United States 10 409 1.1× 186 1.1× 32 0.2× 187 2.9× 13 0.3× 34 463
Dieter Van den Heuvel Belgium 13 430 1.2× 112 0.6× 129 0.8× 237 3.6× 8 0.2× 57 501
Han-Ku Cho South Korea 9 381 1.1× 140 0.8× 45 0.3× 141 2.2× 8 0.2× 111 421
Ki‐Ho Baik United States 10 399 1.1× 177 1.0× 28 0.2× 96 1.5× 10 0.2× 90 435

Countries citing papers authored by Chris Bencher

Since Specialization
Citations

This map shows the geographic impact of Chris Bencher's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Chris Bencher with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Chris Bencher more than expected).

Fields of papers citing papers by Chris Bencher

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Chris Bencher. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Chris Bencher. The network helps show where Chris Bencher may publish in the future.

Co-authorship network of co-authors of Chris Bencher

This figure shows the co-authorship network connecting the top 25 collaborators of Chris Bencher. A scholar is included among the top collaborators of Chris Bencher based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Chris Bencher. Chris Bencher is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Xie, Peng, et al.. (2013). Understanding device impact of line edge/width roughness in frequency domain. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8684. 86840J–86840J. 5 indexed citations
3.
Singh, Gurminder, et al.. (2012). Small particle defect characterization on critical layers of 22nm Spacer Self-Aligned Double Patterning (SADP). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8324. 83241X–83241X.
4.
Wong, H.‐S. Philip, Chris Bencher, He Yi, Xinyu Bao, & Li‐Wen Chang. (2012). Block copolymer directed self-assembly enables sublithographic patterning for device fabrication. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8323. 832303–832303. 34 indexed citations
5.
Bencher, Chris, He Yi, Jeffrey Smith, et al.. (2012). Directed self-assembly defectivity assessment. Part II. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8323. 83230N–83230N. 54 indexed citations
6.
Chen, Yijian, et al.. (2011). Self-aligned triple patterning for continuous IC scaling to half-pitch 15nm. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7973. 79731P–79731P. 19 indexed citations
7.
Bencher, Chris, Yunfei Deng, Huixiong Dai, et al.. (2011). Double patterning compliant logic design. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7974. 79740D–79740D. 16 indexed citations
8.
Bencher, Chris, et al.. (2011). Defect Gallery and Bump Defect Reduction in the Self-Aligned Double Patterning Module. IEEE Transactions on Semiconductor Manufacturing. 24(2). 145–150. 8 indexed citations
9.
Bencher, Chris, Jeffrey Smith, Yongmei Chen, et al.. (2011). Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 89 indexed citations
10.
Chen, Yong Mei, et al.. (2011). Innovative self-aligned triple patterning for 1x half pitch using single "spacer deposition-spacer etch" step. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7973. 79730G–79730G. 8 indexed citations
11.
Bencher, Chris, Huixiong Dai, Yong Mei Chen, et al.. (2011). Mandrel-based patterning: density multiplication techniques for 15nm nodes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7973. 79730K–79730K. 17 indexed citations
12.
Cai, Cathy, et al.. (2010). Defect gallery and bump defect reduction in the self Aligned Double Patterning module. 6924. 129–132. 2 indexed citations
13.
Ma, Yuansheng, Chris Bencher, Huixiong Dai, et al.. (2010). Decomposition strategies for self-aligned double patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7641. 76410T–76410T. 35 indexed citations
14.
Chang, Li‐Wen, Xinyu Bao, Chris Bencher, & H.‐S. Philip Wong. (2010). Experimental demonstration of aperiodic patterns of directed self-assembly by block copolymer lithography for random logic circuit layout. 322. 33.2.1–33.2.4. 19 indexed citations
15.
Bencher, Chris, Yong Mei Chen, Huixiong Dai, et al.. (2009). Demonstration of 32nm half-pitch electrical testable NAND FLASH patterns using self-aligned double patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7274. 72740D–72740D. 8 indexed citations
16.
Dai, Huixiong, et al.. (2009). Implementing self-aligned double patterning on non-gridded design layouts. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7275. 72751E–72751E. 9 indexed citations
17.
Dai, Huixiong, et al.. (2009). Alignment and overlay improvements for 3x nm and beyond process with CVD sidewall spacer double patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7274. 72743G–72743G. 4 indexed citations
18.
Dai, Huixiong, et al.. (2008). 45nm and 32nm half-pitch patterning with 193nm dry lithography and double patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6924. 692421–692421. 4 indexed citations
19.
Bencher, Chris, et al.. (2008). 22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6924. 69244E–69244E. 101 indexed citations
20.
Chen, Yong Mei, et al.. (2007). RET application in 45-nm node and 32-nm node contact hole dry ArF lithography process development. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6520. 65201F–65201F. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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