S. Barnola

1.8k total citations
49 papers, 530 citations indexed

About

S. Barnola is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Materials Chemistry. According to data from OpenAlex, S. Barnola has authored 49 papers receiving a total of 530 indexed citations (citations by other indexed papers that have themselves been cited), including 48 papers in Electrical and Electronic Engineering, 24 papers in Biomedical Engineering and 14 papers in Materials Chemistry. Recurrent topics in S. Barnola's work include Semiconductor materials and devices (26 papers), Advancements in Photolithography Techniques (21 papers) and Advancements in Semiconductor Devices and Circuit Design (17 papers). S. Barnola is often cited by papers focused on Semiconductor materials and devices (26 papers), Advancements in Photolithography Techniques (21 papers) and Advancements in Semiconductor Devices and Circuit Design (17 papers). S. Barnola collaborates with scholars based in France, Switzerland and United States. S. Barnola's co-authors include N. Possémé, Raluca Tiron, Maxime Argoud, Patricia Pimenta‐Barros, Christophe Navarro, Xavier Chevalier, A. Gharbi, C. Vizioz, P. Perreau and E. Martínez and has published in prestigious journals such as Applied Physics Letters, Japanese Journal of Applied Physics and IEEE Electron Device Letters.

In The Last Decade

S. Barnola

47 papers receiving 515 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
S. Barnola France 15 467 238 149 38 34 49 530
Jeffrey Smith United States 7 296 0.6× 210 0.9× 91 0.6× 35 0.9× 52 1.5× 15 369
Martin Steglich Germany 11 235 0.5× 197 0.8× 174 1.2× 43 1.1× 36 1.1× 16 354
Patricia Pimenta‐Barros France 11 240 0.5× 213 0.9× 98 0.7× 31 0.8× 32 0.9× 47 307
Kathleen Nafus Belgium 12 309 0.7× 176 0.7× 155 1.0× 107 2.8× 22 0.6× 69 409
Maxime Argoud France 12 271 0.6× 251 1.1× 143 1.0× 44 1.2× 27 0.8× 48 368
Vimal Kamineni United States 12 252 0.5× 229 1.0× 188 1.3× 108 2.8× 89 2.6× 28 495
Patrick J. Paniez France 10 240 0.5× 53 0.2× 133 0.9× 67 1.8× 53 1.6× 54 333
W. Reetz Germany 13 583 1.2× 445 1.9× 99 0.7× 39 1.0× 57 1.7× 33 674
Kanaiyalal C. Patel United States 10 131 0.3× 295 1.2× 114 0.8× 74 1.9× 26 0.8× 13 367
I. Kawanabe Japan 7 371 0.8× 138 0.6× 124 0.8× 35 0.9× 31 0.9× 7 444

Countries citing papers authored by S. Barnola

Since Specialization
Citations

This map shows the geographic impact of S. Barnola's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. Barnola with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. Barnola more than expected).

Fields of papers citing papers by S. Barnola

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by S. Barnola. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. Barnola. The network helps show where S. Barnola may publish in the future.

Co-authorship network of co-authors of S. Barnola

This figure shows the co-authorship network connecting the top 25 collaborators of S. Barnola. A scholar is included among the top collaborators of S. Barnola based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with S. Barnola. S. Barnola is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Grégoire, Mathieu, et al.. (2024). Neogly QCL-based NI-CGM medical device. SPIRE - Sciences Po Institutional REpository. 1–1.
2.
Possémé, N., et al.. (2020). Silicon nitride spacer etching selectively to silicon using CH3F/O2/He/SiCl4 plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 38(3). 9 indexed citations
3.
Possémé, N., F. Leverd, Daniel L. Benoit, et al.. (2018). Thin layer etching of low-k SiCO spacer using hydrogen ion implantation followed by hydrofluoric acid. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 36(5). 2 indexed citations
4.
Possémé, N., Patricia Pimenta‐Barros, S. Barnola, et al.. (2018). Block copolymer selectivity: A new dry etch approach for cylindrical applications. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 36(4). 3 indexed citations
5.
Pargon, E., et al.. (2016). Gate patterning strategies to reduce the gate shifting phenomenon for 14 nm fully depleted silicon-on-insulator technology. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 35(2). 4 indexed citations
6.
Pimenta‐Barros, Patricia, A. Gharbi, Raluca Tiron, et al.. (2015). DSA planarization approach to solve pattern density issue. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9428. 94280D–94280D. 14 indexed citations
7.
Pimenta‐Barros, Patricia, N. Possémé, S. Barnola, et al.. (2015). PMMA removal selectivity to PS using dry etch approach for sub-10nm node applications. 9054. 1–3. 1 indexed citations
8.
Dupuy, Emmanuel, E. Pargon, Marc Fouchier, et al.. (2015). Spectral analysis of the line-width and line-edge roughness transfer during self-aligned double patterning approach. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9428. 94280B–94280B. 2 indexed citations
9.
Tiron, Raluca, A. Gharbi, Patricia Pimenta‐Barros, et al.. (2015). Template affinity role in CH shrink by DSA planarization. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9423. 942317–942317. 15 indexed citations
10.
Gharbi, A., Raluca Tiron, Maxime Argoud, et al.. (2014). Contact holes patterning by directed self-assembly of block copolymers: What would be the Bossung plot?. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9049. 90491N–90491N. 13 indexed citations
11.
Argoud, Maxime, A. Gharbi, Patricia Pimenta‐Barros, et al.. (2014). 300mm pilot line DSA contact hole process stability. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9049. 904929–904929. 25 indexed citations
12.
Pimenta‐Barros, Patricia, S. Barnola, A. Gharbi, et al.. (2014). Etch challenges for DSA implementation in CMOS via patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9054. 90540G–90540G. 18 indexed citations
13.
Tiron, Raluca, Maxime Argoud, Patricia Pimenta‐Barros, et al.. (2014). Contact hole shrink by directed self-assembly: Process integration and stability monitored on 300 mm pilot line. Japanese Journal of Applied Physics. 53(6S). 06JC05–06JC05. 22 indexed citations
14.
Cassé, M., Sylvain Barraud, R. Coquand, et al.. (2013). (Invited) Strain-Enhanced Performance of Si-Nanowire FETs. ECS Transactions. 53(3). 125–136. 4 indexed citations
15.
Andrieu, F., O. Weber, P. Perreau, et al.. (2010). Fully Depleted Strained Silicon-on-Insulator p-MOSFETs With Recessed and Embedded Silicon–Germanium Source/Drain. IEEE Electron Device Letters. 31(10). 1074–1076. 10 indexed citations
16.
Denorme, S., Dominique Fleury, N. Loubet, et al.. (2010). Gate-all-around technology: Taking advantage of ballistic transport?. Solid-State Electronics. 54(9). 883–889. 18 indexed citations
17.
Denorme, S., Dominique Fleury, N. Loubet, et al.. (2009). Gate-All-Around technology: taking advantage of ballistic transport ?. 7. 315–318. 2 indexed citations
18.
Barnola, S., et al.. (2009). Achieving overlay budgets for double patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7274. 72740X–72740X. 4 indexed citations
19.
Comboroure, C., C. Vizioz, S. Barnola, et al.. (2008). Hybrid high resolution lithography (e-beam/deep ultraviolet) and etch process for the fabrication of stacked nanowire metal oxide semiconductor field effect transistors. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 26(6). 2583–2586. 6 indexed citations
20.
Berthelot, A., et al.. (2006). Highly Reliable TiN/ZrO2/TiN 3D Stacked Capacitors for 45 nm Embedded DRAM Technologies. 343–346. 20 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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