He Yi
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- Advancements in Photolithography Techniques 17
- VLSI and FPGA Design Techniques 4
- Ferroelectric and Negative Capacitance Devices 2
- Integrated Circuits and Semiconductor Failure Analysis 2
- 3D IC and TSV technologies 2
- Materials Chemistry top 10%
- Block Copolymer Self-Assembly 20
- Anodic Oxide Films and Nanostructures 3
- Surfaces, Coatings and Films top 10%
- Hardware and Architecture top 10%
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- Nanofabrication and Lithography Techniques 7
- Co-authors
- H.‐S. Philip WongXinyu BaoR. C. TiberioLi‐Wen ChangMartin D. F. WongYuelin DuHuixiong DaiZigang Xiao
- Journals
- Advanced Materials (2 papers)Nano Letters (1 paper)IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (1 paper)
- Partner nations
- United StatesChinaBelgium
In The Last Decade
He Yi
31 papers receiving 619 citations
Peers
Comparison fields: 5 of 37
- Electrical and Electronic Engineering 456
- Materials Chemistry 360
- Surfaces, Coatings and Films 47
- Hardware and Architecture 34
- Biomedical Engineering 196
Countries citing papers authored by He Yi
This map shows the geographic impact of He Yi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by He Yi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites He Yi more than expected).
Fields of papers citing papers by He Yi
This network shows the impact of papers produced by He Yi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by He Yi. The network helps show where He Yi may publish in the future.
Co-authorship network
The 25 scholars most cited alongside He Yi, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2021 | 1 | |
| 2 | 2015 | 5 | |
| 3 | 2015 | 9 | |
| 4 | 2015 | 2 | |
| 5 | 2014 | 37 | |
| 6 | 2014 | 26 | |
| 7 | 2014 | 16 | |
| 8 | 2013 | 38 | |
| 9 | 2013 | 23 | |
| 10 | 2013 | 18 | |
| 11 | 2013 | 10 | |
| 12 | 2012 | 105 | |
| 13 | 2012 | 3 | |
| 14 | 2012 | 37 | |
| 15 | 2012 | 34 | |
| 16 | 2012 | 54 | |
| 17 | 2011 | 39 | |
| 18 | 2010 | 26 | |
| 19 | 2008 | 2 | |
| 20 | 2006 | 5 |
About He Yi
He Yi is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Industrial and Manufacturing Engineering, Biomedical Engineering and Hardware and Architecture, having authored 32 papers that have together received 627 indexed citations. Recurring topics across this work include Block Copolymer Self-Assembly (20 papers), Advancements in Photolithography Techniques (17 papers), Nanofabrication and Lithography Techniques (7 papers), VLSI and FPGA Design Techniques (4 papers), Anodic Oxide Films and Nanostructures (3 papers), Ferroelectric and Negative Capacitance Devices (2 papers), Integrated Circuits and Semiconductor Failure Analysis (2 papers) and 3D IC and TSV technologies (2 papers). The work is most often cited by research in Electrical and Electronic Engineering (456 citations), Materials Chemistry (360 citations), Surfaces, Coatings and Films (47 citations), Hardware and Architecture (34 citations) and Biomedical Engineering (196 citations). He Yi has collaborated with scholars based in United States, China and Belgium. Frequent co-authors include H.‐S. Philip Wong, Xinyu Bao, R. C. Tiberio, Li‐Wen Chang, Martin D. F. Wong, Yuelin Du, Huixiong Dai, Zigang Xiao, Jie Zhang and Subhasish Mitra. Their work appears in journals such as Advanced Materials, Nano Letters, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, Acta Optica Sinica and Guangdian gongcheng.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.