Joel Barnett

1.5k total citations
62 papers, 1.1k citations indexed

About

Joel Barnett is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Joel Barnett has authored 62 papers receiving a total of 1.1k indexed citations (citations by other indexed papers that have themselves been cited), including 56 papers in Electrical and Electronic Engineering, 8 papers in Materials Chemistry and 6 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Joel Barnett's work include Semiconductor materials and devices (55 papers), Advancements in Semiconductor Devices and Circuit Design (41 papers) and Integrated Circuits and Semiconductor Failure Analysis (23 papers). Joel Barnett is often cited by papers focused on Semiconductor materials and devices (55 papers), Advancements in Semiconductor Devices and Circuit Design (41 papers) and Integrated Circuits and Semiconductor Failure Analysis (23 papers). Joel Barnett collaborates with scholars based in United States, South Korea and Austria. Joel Barnett's co-authors include G. Bersuker, Patrick Lysaght, Brendan Foran, Chadwin D. Young, Jeff J. Peterson, P. D. Kirsch, Rino Choi, N. Moumen, P. Zeitzoff and Daniel A. Fischer and has published in prestigious journals such as Nature Communications, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Joel Barnett

59 papers receiving 1.0k citations

Peers

Countries citing papers authored by Joel Barnett

Since Specialization

Citations

This map shows the geographic impact of Joel Barnett's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Joel Barnett with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Joel Barnett more than expected).

Fields of papers citing papers by Joel Barnett

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Joel Barnett. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Joel Barnett. The network helps show where Joel Barnett may publish in the future.

Co-authorship network of co-authors of Joel Barnett

This figure shows the co-authorship network connecting the top 25 collaborators of Joel Barnett. A scholar is included among the top collaborators of Joel Barnett based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Joel Barnett. Joel Barnett is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Imaging local electronic corrugations and doped regions in graphene 2011 ·Nature Communications ·Brian J. Schultz, Christopher J. Patridge, Vincent Lee, Cherno Jaye, Patrick Lysaght, (unknown), Joel Barnett, Daniel A. Fischer, David Prendergast, Sarbajit Banerjee	96
2	Sub-60nm Si tunnel field effect transistors with I<inf>on</inf> >100 µA/µm 2010 ·Wei-Yip Loh, Kanghoon Jeon, Chang Yong Kang, Jungwoo Oh, Pratik Patel, Casey Smith, Joel Barnett, (unknown), Tsu‐Jae King Liu, Hsing‐Huang Tseng, Prashant Majhi, Raj Jammy, Chenming Hu	10
3	Self-aligned III-V MOSFETs heterointegrated on a 200 mm Si substrate using an industry standard process flow 2010 ·Richard J. Hill, (unknown), Joel Barnett, (unknown), Jifu Huang, Nilesh Goel, W.Y. Loh, Jungwoo Oh, Casey Smith, P. D. Kirsch, P. Majhi, R. Jammy	31
4	SiGe CMOS on (110) channel orientation with mobility boosters : Surface orientation, channel directions, and uniaxial strain 2010 ·Jungwoo Oh, (unknown), Kyeong‐Sik Min, (unknown), Byoung‐Gue Min, (unknown), (unknown), Wei Yip Loh, Joel Barnett, Kang Min Ok, (unknown), Casey Smith, (unknown), P. D. Kirsch, R. Jammy	9
5	A study of the interaction of gallium arsenide with wet chemical formulations using thermodynamic calculations and spectroscopic ellipsometry 2009 ·Microelectronic Engineering ·J. Price, Joel Barnett, S. Raghavan, Manish Keswani, (unknown)	8
6	Impact of Bottom Interfacial Layer on the Threshold Voltage and Device Reliability of Fluorine Incorporated PMOSFETS with High-K/Metal Gate 2007 ·(unknown), Tae‐Ho Lee, Joel Barnett, H. R. Harris, (unknown), Chadwin D. Young, G. Bersuker, Rino Choi, (unknown), Byoung Hun Lee, (unknown)	5
7	Integration Challenges and Opportunities for Nanometer Scale CMOSFET with Metal/High-k Gate Stack 2007 ·ECS Meeting Abstracts ·(unknown), Muhammad M. Hussain, Joel Barnett, (unknown), (unknown), P. D. Kirsch, Byoung Hun Lee	1
8	Integrating dual workfunction metal gates in CMOS 2006 ·Solid State Technology ·S. C. Song, Muhammad M. Hussain, Joel Barnett, Bin Ju, (unknown)	8
9	Systematic Gate Stack Optimization to Maximize Mobility with HfSiON EOT Scaling 2006 ·Manuel Quevedo-López, P. D. Kirsch, Sitaraman Krishnan, Husam N. Alshareef, Joel Barnett, H. R. Harris, A. Neugroschel, F. S. Aguirre‐Tostado, Bruce E. Gnade, (unknown), Robert M. Wallace, Byoung Hun Lee	3
10	The Influence of NH3 Anneal on the Crystallization Kinetics of HfO2 Gate Dielectric Films 2006 ·ECS Transactions ·Patrick Lysaght, Joel Barnett, J. C. Woicik, Brendan Foran, G. Bersuker, Byoung Hun Lee	4
11	The effect of interfacial layer properties on the performance of Hf-based gate stack devices 2006 ·Journal of Applied Physics ·G. Bersuker, (unknown), Joel Barnett, Patrick Lysaght, P. D. Kirsch, Chadwin D. Young, Rino Choi, (unknown), Brendan Foran, Klaus van Benthem, S. J. Pennycook, Patrick M. Lenahan, Jason T. Ryan	121
12	Reliability of thick oxides integrated with HfSiOx gate dielectric 2006 ·(unknown), (unknown), (unknown), Joel Barnett, Rino Choi, (unknown), R. Jammy	1
13	Plasma-Induced Damage in High-$k$/Metal Gate Stack Dry Etch 2006 ·IEEE Electron Device Letters ·Muhammad M. Hussain, (unknown), Joel Barnett, Chang Yong Kang, (unknown), (unknown), N. Moumen	19
14	Integration of Dual Metal Gate CMOS on High-k Dielectrics Utilizing a Metal Wet Etch Process 2005 ·Electrochemical and Solid-State Letters ·Zhibo Zhang, S. C. Song, C. Huffman, Muhammad M. Hussain, Joel Barnett, N. Moumen, Husam N. Alshareef, Prashant Majhi, (unknown), (unknown), Byoung Hun Lee	32
15	Interfacial Layer-Induced Mobility Degradation in High-kTransistors 2004 ·Japanese Journal of Applied Physics ·G. Bersuker, Joel Barnett, (unknown), Brendan Foran, Chadwin D. Young, Patrick Lysaght, Jeff J. Peterson, (unknown), P. Zeitzoff, Howard R. Huff	60
16	Characterization of advanced gate stacks for Si CMOS by electron energy-loss spectroscopy in scanning transmission electron microscopy 2004 ·Journal of Electron Spectroscopy and Related Phenomena ·Brendan Foran, Joel Barnett, Patrick Lysaght, (unknown), Susanne Stemmer	25
17	Conventional poly-Si gate MOS-transistors with a novel, ultra-thin Hf-oxide layer 2004 ·(unknown), (unknown), Chadwin D. Young, K. Matthews, Joel Barnett, Brendan Foran, Aditi Agarwal, George Brown, G. Bersuker, P. Zeitzoff, Mark Gardner, R.W. Murto, (unknown), (unknown), Shreyas S. Kher, Howard R. Huff	18
18	Quantifying residual and surface carbon using polyencapsulation SIMS 2004 ·Applied Surface Science ·(unknown), J. Bennett, Joel Barnett, Alex Berlin, (unknown)	2
19	Wet Etch Enhancement of HfO<sub>2</sub> Films by Implant Processing 2003 ·Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·Joel Barnett, (unknown), (unknown), P. Lysaght, (unknown)	7
20	Selective Wet Etching of High-k Gate Dielectrics 2003 ·Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·Kurt K. Christenson, (unknown), T. J. Wagener, (unknown), (unknown), Joel Barnett	6

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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