P. Besson

1.8k citations

74 papers · 793 indexed · h-index 14

Electrical and Electronic Engineering top 5%
- Semiconductor materials and devices 53
- Integrated Circuits and Semiconductor Failure Analysis 20
- Advancements in Semiconductor Devices and Circuit Design 17
- Silicon and Solar Cell Technologies 9
Surfaces, Coatings and Films top 10%
Materials Chemistry
- Silicon Nanostructures and Photoluminescence 8
Atomic and Molecular Physics, and Optics
- Semiconductor materials and interfaces 9
Electronic, Optical and Magnetic Materials
- Copper Interconnects and Reliability 9
Biomedical Engineering
- Advanced Surface Polishing Techniques 8

Co-authors: O. Renault F. Martín N. Barrett S. Marthon D. Blin J.-F. Damlencourt Jean‐Michel Hartmann V. Loup
Cited by: Electrical and Electronic Engineering Surfaces, Coatings and Films Materials Chemistry
Journals: Microelectronic Engineering (10 papers)Applied Surface Science (4 papers)IEEE Electron Device Letters (2 papers)
Partner nations: France Czechia India

In The Last Decade

P. Besson

69 papers receiving 765 citations

Peers

Countries citing papers authored by P. Besson

Since Specialization

Citations

This map shows the geographic impact of P. Besson's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by P. Besson with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites P. Besson more than expected).

Fields of papers citing papers by P. Besson

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by P. Besson. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by P. Besson. The network helps show where P. Besson may publish in the future.

Co-authorship network

The 25 scholars most cited alongside P. Besson, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with P. Besson Line = papers co-authored together P. Besson links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	H3PO4-based wet chemical etching for recovery of dry-etched GaN surfaces Applied Surface Science ·Brenten R. Hurt,Maxime Legallais,P. Besson,Janine A Santos,Laura Vauche,P. Puternicki,Chloé Thieuleux,B. Salem,Matthew Charles	2021	20
2	Wet and Siconi® Surface Preparation Sequences for SiGe Epitaxial Regrowth ECS Meeting Abstracts ·平八郎高野,V. Loup,Jean‐Michel Hartmann,Nicolas Bernier,L. Vallier,P. Besson	2020	0
3	Nearly Anhydrous Undissociated HF for the Removal of Hf / Ta / Zr Based Polymers after Plasma Etch, Selectively to Aluminum ECS Transactions ·CHAD A GUNSOLLY,Lucile Broussous,Philippe Garnier,Rohan Kumbhar,Orbelina Eguizábal,P. Besson	2017	0
4	Wet and Siconi® cleaning sequences for SiGe p-type metal oxide semiconductor channels Microelectronic Engineering ·Overassistent A. Hilsøe,V. Loup,L. Vallier,M. Martin,J. Moeyaert,B. Pelissier,Philippe Rodriguez,Jean‐Michel Hartmann,P. Besson	2017	10
5	Dopant activation and crystal recovery in arsenic-implanted ultra-thin silicon-on-insulator structures using 308nm nanosecond laser annealing S. Kerdilès,Pablo Acosta-Alba,B. Mathieu,M. Veillerot,Yingzhi Yang,P. Besson,Hervé Denis,Fulvio Mazzamuto,Ayu Aprilischa,Karim Huet,C. Fenouillet-Béranger	2016	8
6	Backside and Bevel Contamination Removal Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·P. Besson,Mouayed A. Hussein,Yingzhi Yang,張成毅,Orbelina Eguizábal,椎名武夫,V. Loup	2014	0
7	Si and Sige Alloys Wet Etching Using Tmah Chemistry ECS Meeting Abstracts ·V. Loup,Orbelina Eguizábal,陈溪然,Yingzhi Yang,張成毅,P. Besson,S. Petitdidier	2013	2
8	Self-Aligned Planar Double-Gate MOSFETs by Bonding for 22-nm Node, With Metal Gates, High- $\kappa$ Dielectrics, and Metallic Source/Drain IEEE Electron Device Letters ·M. Vinet,T. Poiroux,Christophe Licitra,J. Widiez,Mohammad Anwar‐Us‐Saadat,B. Prévitali,C. Vizioz,D. Lafond,C. Arvet,P. Besson,L. Baud,Y. Morand,M. Rivoire,F. Nemouchi,V. Carron,S. Deleonibus	2009	10
9	Wet cleaning and surface characterization of Si1−xGex virtual substrates after a CMP step Applied Surface Science ·Alexandra Abbadie,J.‐M. Hartmann,P. Besson,D. Rouchon,E. Martínez,Félix Gómez Lablanca,竹光義治,Y. Campidelli,T. Billon	2008	5
10	Germanium Surface Passivation Using Ozone Gaseous Phase Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·V. Loup,P. Besson,嘉明高木,E. Martínez,Roth Sh,S. Lhostis	2007	4
11	Insights on fundamental mechanisms impacting Ge metal oxide semiconductor capacitors with high-k/metal gate stacks Journal of Applied Physics ·P. Batude,X. Garros,L. Clavelier,C. Le Royer,Jean‐Michel Hartmann,V. Loup,P. Besson,L. Vandroux,Y. Campidelli,S. Deleonibus,F. Boulanger	2007	38
12	Band offsets of nitrided ultrathin hafnium silicate films Applied Physics Letters ·N. Barrett,O. Renault,P. Besson,Y. Le Tiec,F. Martín	2006	10
13	Management of Metallic Contamination in Advanced IC Manufacturing ECS Meeting Abstracts ·A. N. Araviysky,Natani Aparecida do [UNESP] Bem,P. Besson,Robbie Dedi,Wei Sisi,Martine Claes,Twan Bearda,Rongqiang Liu	2006	2
14	Single Backside Cleaning on Silicon, Silicon Nitride and Silicon Oxide Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·Lucile Broussous,P. Besson,Martin M. Frank,Eleni Chasapopoulou	2005	1
15	Barrier and Copper Seedlayer Wet Etching Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·C. Richard,Martin M. Frank,P. Besson,Thomas Kazen,Iratna Pangalih,Vicki Fraaza,سیدعبدالحسین محمدی,Lucile Broussous,Alain Yamba-Mukendi,T. Billon	2005	5
16	Electrical properties of Si1−yCy/Si/SiO2 interface for sub 50 nm strained-channel nMOSFETs Applied Surface Science ·F. Ducroquet,T. Ernst,O. Weber,Jean‐Michel Hartmann,V. Loup,P. Besson,L. Brévard,Rob Karreman,S. Deleonibus	2003	2
17	Post-Etch Cleaning Chemistries Evaluation for Low k-Copper Integration Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·Lucile Broussous,和子高倉,Deshmukh Yogesh,P. Besson	2003	7
18	Infrared spectroscopy of high k thin layer by multiple internal reflection and attenuated total reflection Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics ·N. Rochat,井上雄一,Martin Grolms,S. Zoll,P. Besson,周觅	2003	14
19	Study of ultrathin silicon oxide films by FTIR‐ATR and ARXPS after wet chemical cleaning processes Surface and Interface Analysis ·D. Rouchon,N. Rochat,Andreas Maier,Amal Chabli,O. Renault,P. Besson	2002	28
20	Resonant optical microcavity based on crystalline silicon active layer Journal of Applied Physics ·D. Sotta,E. Hadji,N. Magnéa,史隆所,P. Besson,P Renard,H. Moriceau	2002	11

About P. Besson

P. Besson is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Electronic, Optical and Magnetic Materials, having authored 74 papers that have together received 793 indexed citations. Recurring topics across this work include Semiconductor materials and devices (53 papers), Integrated Circuits and Semiconductor Failure Analysis (20 papers), Advancements in Semiconductor Devices and Circuit Design (17 papers), Semiconductor materials and interfaces (9 papers), Silicon and Solar Cell Technologies (9 papers), Copper Interconnects and Reliability (9 papers), Advanced Surface Polishing Techniques (8 papers) and Silicon Nanostructures and Photoluminescence (8 papers). The work is most often cited by research in Electrical and Electronic Engineering (722 citations), Surfaces, Coatings and Films (57 citations) and Materials Chemistry (228 citations). P. Besson has collaborated with scholars based in France, Czechia and India. Frequent co-authors include O. Renault, F. Martín, N. Barrett, S. Marthon, D. Blin, J.-F. Damlencourt, Jean‐Michel Hartmann, V. Loup, N. Rochat and S. Deleonibus. Their work appears in journals such as Microelectronic Engineering, Applied Surface Science, IEEE Electron Device Letters, Materials Science and Engineering B and Applied Physics Letters.

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