Sara Paolillo

1.0k total citations
17 papers, 689 citations indexed

About

Sara Paolillo is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Sara Paolillo has authored 17 papers receiving a total of 689 indexed citations (citations by other indexed papers that have themselves been cited), including 15 papers in Electrical and Electronic Engineering, 4 papers in Surfaces, Coatings and Films and 4 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Sara Paolillo's work include Advancements in Photolithography Techniques (11 papers), Integrated Circuits and Semiconductor Failure Analysis (9 papers) and Copper Interconnects and Reliability (4 papers). Sara Paolillo is often cited by papers focused on Advancements in Photolithography Techniques (11 papers), Integrated Circuits and Semiconductor Failure Analysis (9 papers) and Copper Interconnects and Reliability (4 papers). Sara Paolillo collaborates with scholars based in Belgium, Sweden and Italy. Sara Paolillo's co-authors include Alexei Kalaboukhov, Rositza Yakimova, Vladimir I. Fal’ko, Mikael Syväjärvi, Alexander Tzalenchuk, Samuel Lara‐Avila, Sergey Kubatkin, T. J. B. M. Janssen, Olga Kazakova and Zsolt Tökei and has published in prestigious journals such as Nature Nanotechnology, IEEE Transactions on Semiconductor Manufacturing and Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.

In The Last Decade

Sara Paolillo

12 papers receiving 676 citations

Peers

Countries citing papers authored by Sara Paolillo

Since Specialization

Citations

This map shows the geographic impact of Sara Paolillo's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Sara Paolillo with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Sara Paolillo more than expected).

Fields of papers citing papers by Sara Paolillo

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Sara Paolillo. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Sara Paolillo. The network helps show where Sara Paolillo may publish in the future.

Co-authorship network of co-authors of Sara Paolillo

This figure shows the co-authorship network connecting the top 25 collaborators of Sara Paolillo. A scholar is included among the top collaborators of Sara Paolillo based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Sara Paolillo. Sara Paolillo is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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17 of 17 papers shown

#	Work	Indexed citations
1	Hexagonal contact holes patterning at 32 nm pitch: influence of the stack and of the etching process on AEI performances 2025 ·Sara Paolillo, Dieter Van den Heuvel, (unknown), (unknown), (unknown), (unknown), (unknown), Laurent Souriau, (unknown), (unknown), (unknown)	1
2	A comprehensive analysis to quantify the performance evolution of EUV photoresists 2025 ·Mihir Gupta, Sara Paolillo, (unknown), Joern-Holger Franke, Stefan Decoster, Achintya Kundu, (unknown), Hyo Seon Suh, Danilo De Simone	0
3	Patterning optimization for single mask bit-line-periphery and storage-node-landing-pad DRAM layers using 0.33NA EUV lithography at the resolution limit 2024 ·Van Tuong Pham, Jeonghoon Lee, (unknown), Ying-Lin Chen, (unknown), (unknown), Kenichi Miyaguchi, Bappaditya Dey, (unknown), Peter De Schepper, (unknown), Sara Paolillo, Danilo De Simone, Hyo Seon Suh, (unknown)	1
4	Extreme UV self-aligned double patterning process optimization for BEOL interconnections on 3nm nodes and beyond 2024 ·(unknown), (unknown), (unknown), (unknown), Sara Paolillo, Chen Wu, Yannick Hermans, Stefan Decoster, (unknown), (unknown), Frédéric Lazzarino, Seongho Park, Zsolt Tökei	0
5	Evolution of lithography-to-etch bias in multi-patterning processes 2022 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·(unknown), Ankur Agarwal, Chad M. Huard, Alessandro Vaglio Pret, (unknown), Roel Gronheid, (unknown), (unknown), Sara Paolillo, Frédéric Lazzarino	2
6	E-Test Validation of Space Error Budget and Metrology 2022 ·IEEE Transactions on Semiconductor Manufacturing ·(unknown), E. P. De Poortere, (unknown), Sara Paolillo, (unknown), (unknown), (unknown), Jan Mulkens, (unknown), Philippe Leray, Sandip Halder	0
7	Semidamascene Interconnects for 2nm node and Beyond 2020 ·Gayle Murdoch, Zsolt Tökei, Sara Paolillo, Olalla Varela Pedreira, Kris Vanstreels, Christopher J. Wilson	19
8	Ruthenium direct etch scatterometry solution for self-aligning semi-damascene 2020 ·Sara Paolillo, Alain Moussa, Gayle Murdoch, Frédéric Lazzarino, (unknown), Philippe Leray, (unknown), (unknown), (unknown), (unknown)	2
9	Large area EUV via yield analysis for single damascene process: voltage contrast, CD and defect metrology (Conference Presentation) 2019 ·(unknown), Sara Paolillo, (unknown), (unknown), Gian F. Lorusso, (unknown), Cyrus Tabery, Fu Qiao, (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), Jonathan Huang	0
10	Localized power spectral density analysis on atomic force microscopy images for advanced patterning applications 2019 ·Alain Moussa, (unknown), Sara Paolillo, Frédéric Lazzarino, A. Illiberi, Shaoren Deng, Jan Willem Maes, (unknown), Philippe Leray	4
11	CMOS Area Scaling And the Need for High Aspect Ratio Vias 2018 ·B. Briggs, (unknown), Christopher J. Wilson, Julien Ryckaert, Sara Paolillo, K. Vandersmissen, Janko Versluijs, (unknown), N. Heylen, Juergen Boemmels, Zs. Tôkei, Yasser Sherazi, Pieter Weckx, (unknown), (unknown), G. Boccardi, (unknown), Anshul Gupta, (unknown), M. Kamon	1
12	Direct metal etch of ruthenium for advanced interconnect 2018 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Sara Paolillo, Danny Wan, Frédéric Lazzarino, Nouredine Rassoul, (unknown), Zsolt Tökei	41
13	Subtractive Etch of Ruthenium for Sub-5nm Interconnect 2018 ·Danny Wan, Sara Paolillo, Nouredine Rassoul, (unknown), Víctor Blanco, Christoph Adelmann, Frédéric Lazzarino, Monique Ercken, Gayle Murdoch, J. Bömmels, Christopher J. Wilson, Zsolt Tökei	22
14	Exploration of post-lithography smoothening methods applied to 16nm half-pitch EUV lines and spaces (Conference Presentation) 2018 ·Frédéric Lazzarino, Ming Mao, Sara Paolillo, (unknown), Danilo De Simone, Alain Moussa, (unknown), (unknown), Kathy Barla	1
15	Sequential Infiltration Synthesis for Line Edge Roughness Mitigation of EUV Resist 2017 ·Journal of Photopolymer Science and Technology ·(unknown), Danilo De Simone, W. Knaepen, (unknown), B. T. Chan, Sara Paolillo, Jan Willem Maes, David De Roest, Paulina Rincon Delgadillo, Geert Vandenberghe	8
16	Towards a quantum resistance standard based on epitaxial graphene 2010 ·Nature Nanotechnology ·Alexander Tzalenchuk, Samuel Lara‐Avila, Alexei Kalaboukhov, Sara Paolillo, Mikael Syväjärvi, Rositza Yakimova, Olga Kazakova, T. J. B. M. Janssen, Vladimir I. Fal’ko, Sergey Kubatkin	349
17	SiC Graphene Suitable For Quantum Hall Resistance Metrology 2009 ·arXiv (Cornell University) ·Samuel Lara‐Avila, Alexei Kalaboukhov, Sara Paolillo, Mikael Syväjärvi, Rositza Yakimova, Vladimir I. Fal’ko, Alexander Tzalenchuk, Sergey Kubatkin	238

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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