Peter De Schepper

489 total citations
43 papers, 347 citations indexed

About

Peter De Schepper is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Peter De Schepper has authored 43 papers receiving a total of 347 indexed citations (citations by other indexed papers that have themselves been cited), including 40 papers in Electrical and Electronic Engineering, 14 papers in Surfaces, Coatings and Films and 9 papers in Biomedical Engineering. Recurrent topics in Peter De Schepper's work include Advancements in Photolithography Techniques (26 papers), Integrated Circuits and Semiconductor Failure Analysis (18 papers) and Electron and X-Ray Spectroscopy Techniques (14 papers). Peter De Schepper is often cited by papers focused on Advancements in Photolithography Techniques (26 papers), Integrated Circuits and Semiconductor Failure Analysis (18 papers) and Electron and X-Ray Spectroscopy Techniques (14 papers). Peter De Schepper collaborates with scholars based in Belgium, United States and Netherlands. Peter De Schepper's co-authors include Danilo De Simone, Joeri Denayer, Jason K. Stowers, Geert Vandenberghe, Stephen T. Meyers, Andrew Grenville, Benjamin L. Clark, Stefan Tinck, Jeremy T. Anderson and Kai Jiang and has published in prestigious journals such as International Journal of Hydrogen Energy, Renewable Energy and Industrial & Engineering Chemistry Research.

In The Last Decade

Peter De Schepper

39 papers receiving 329 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Peter De Schepper Belgium 12 297 106 72 66 37 43 347
Gary E. Carver United States 12 288 1.0× 18 0.2× 148 2.1× 180 2.7× 43 1.2× 47 413
T. Brammer Germany 11 294 1.0× 52 0.5× 43 0.6× 191 2.9× 28 0.8× 23 357
Д. В. Смовж Russia 9 74 0.2× 30 0.3× 70 1.0× 210 3.2× 61 1.6× 39 307
S.K. Garg India 12 201 0.7× 21 0.2× 79 1.1× 277 4.2× 18 0.5× 23 402
D. Borchert Germany 13 386 1.3× 60 0.6× 128 1.8× 233 3.5× 54 1.5× 46 464
S.Z. Szilasi Hungary 12 146 0.5× 58 0.5× 143 2.0× 106 1.6× 5 0.1× 31 372
Tamilselvan Velusamy United Kingdom 11 209 0.7× 18 0.2× 119 1.7× 236 3.6× 36 1.0× 15 361
Pinjun Lan China 9 181 0.6× 214 2.0× 47 0.7× 148 2.2× 73 2.0× 14 373
M. Kuchowicz Poland 11 100 0.3× 35 0.3× 25 0.3× 193 2.9× 16 0.4× 20 257
Mika Pflüger Germany 10 83 0.3× 55 0.5× 62 0.9× 121 1.8× 25 0.7× 19 236

Countries citing papers authored by Peter De Schepper

Since Specialization
Citations

This map shows the geographic impact of Peter De Schepper's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Peter De Schepper with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Peter De Schepper more than expected).

Fields of papers citing papers by Peter De Schepper

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Peter De Schepper. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Peter De Schepper. The network helps show where Peter De Schepper may publish in the future.

Co-authorship network of co-authors of Peter De Schepper

This figure shows the co-authorship network connecting the top 25 collaborators of Peter De Schepper. A scholar is included among the top collaborators of Peter De Schepper based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Peter De Schepper. Peter De Schepper is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Román, P., et al.. (2025). Stable stitching: impact and mitigation of environment on metal-oxide resist imaging. Journal of Micro/Nanopatterning Materials and Metrology. 24(1).
2.
Castellanos, Sonia, Peter De Schepper, M. Bhattacharya, et al.. (2024). EUV metal oxide resists: impact of the environment composition on CD during post-exposure delay. 6–6. 1 indexed citations
3.
Schepper, Peter De, et al.. (2024). Advanced simulations using an improved metal oxide photoresist model. 45–45. 1 indexed citations
4.
5.
Melvin, Lawrence S., et al.. (2020). Calibration of a MOx-specific EUV photoresist lithography model. 12–12. 6 indexed citations
6.
Stowers, Jason K., et al.. (2019). Advances in metal oxide resist performance and production (Conference Presentation). 41–41. 1 indexed citations
7.
Mao, Ming, et al.. (2017). Patterning with metal-oxide EUV photoresist: patterning capability, resist smoothing, trimming, and selective stripping. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10146. 101460I–101460I. 7 indexed citations
8.
Rio, David del, Sook Lee, Thomas I. Wallow, et al.. (2017). Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431E–101431E. 1 indexed citations
9.
Stowers, Jason K., Jeremy T. Anderson, Brian Cardineau, et al.. (2016). Metal oxide EUV photoresist performance for N7 relevant patterns and processes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9779. 977904–977904. 34 indexed citations
10.
Grenville, Andrew, Jeremy T. Anderson, Benjamin L. Clark, et al.. (2015). Integrated fab process for metal oxide EUV photoresist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9425. 94250S–94250S. 67 indexed citations
11.
Schepper, Peter De, et al.. (2015). A TSR model for direct propane fuel cell with equilibrium adsorption and desorption processes. Renewable Energy. 83. 1084–1096. 5 indexed citations
12.
Schepper, Peter De, Daniil Marinov, Efrain Altamirano Sánchez, et al.. (2015). H2plasma and neutral beam treatment of EUV photoresist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9428. 94280C–94280C. 1 indexed citations
13.
Schalm, Olivier, et al.. (2014). Radiography of paintings: Limitations of transmission radiography and exploration of emission radiography using phosphor imaging plates. Studies in Conservation. 59(1). 10–23. 14 indexed citations
14.
Schepper, Peter De, et al.. (2014). Hydrogen plasma treatment: the evolution of roughness in frequency domain. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9054. 90540C–90540C. 3 indexed citations
15.
Gul, Banat, Stefan Tinck, Peter De Schepper, Aman‐ur Rehman, & Annemie Bogaerts. (2014). Numerical investigation of HBr/He transformer coupled plasmas used for silicon etching. Journal of Physics D Applied Physics. 48(2). 25202–25202. 11 indexed citations
16.
Schepper, Peter De, et al.. (2014). Line edge and width roughness smoothing by plasma treatment. Journal of Micro/Nanolithography MEMS and MOEMS. 13(2). 23006–23006. 5 indexed citations
17.
Schepper, Peter De, et al.. (2012). A tank in series model for alkaline fuel cell in cogeneration of hydrogen peroxide and electricity. International Journal of Hydrogen Energy. 37(22). 17258–17267. 15 indexed citations
18.
Sivoththaman, S., Wim Laureys, Peter De Schepper, Johan Nijs, & R. Mertens. (2000). Selective emitters in Si by single step rapid thermal diffusion for photovoltaic devices. IEEE Electron Device Letters. 21(6). 274–276. 13 indexed citations
19.
Sivoththaman, S., Peter De Schepper, Wim Laureys, J.F. Nijs, & R. Mertens. (1998). Improving low-temperature APCVD SiO2 passivation by rapid thermal annealing for Si devices. IEEE Electron Device Letters. 19(12). 505–507. 9 indexed citations
20.
Ghannam, M, Peter De Schepper, Johan Nijs, et al.. (1992). SOLAR CELLS WITH 15.6% EFFICIENCY ON MULTICRYSTALLINE SILICON, USING IMPURITY GETTERING, BACK SURFACE FIELD AND EMITTER PASSIVATION. International Journal of Solar Energy. 11(3-4). 273–279. 19 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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