Ankur Agarwal
Impact in
- Inorganic Chemistry top 5%
- Zeolite Catalysis and Synthesis
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- Plasma Diagnostics and Applications
- Semiconductor materials and devices
Papers in
-
- Plasma Diagnostics and Applications 22
- Semiconductor materials and devices 21
- Advancements in Semiconductor Devices and Circuit Design 3
- Advancements in Photolithography Techniques 3
-
- Metal and Thin Film Mechanics 13
- Co-authors
- Mark J. Kushner (7 shared papers)Shahid Rauf (16 shared papers)Ken Collins (10 shared papers)Jeremy C. Palmer (6 shared papers)Jeffrey D. Rimer (6 shared papers)S. Banna (4 shared papers)R. Tsu (1 shared paper)Bert M. Weckhuysen (2 shared papers)
- Journals
- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (6 papers)IEEE Transactions on Plasma Science (4 papers)Journal of Applied Physics (3 papers)Applied Physics Letters (2 papers)Plasma Sources Science and Technology (2 papers)
- Partner nations
- United StatesIndiaSouth Korea
In The Last Decade
Ankur Agarwal
45 papers receiving 1.1k citations
Peers
Comparison fields: 5 of 77
- Inorganic Chemistry 236
- Electrical and Electronic Engineering 744
- Mechanics of Materials 292
- Catalysis 68
- Materials Chemistry 424
Countries citing papers authored by Ankur Agarwal
This map shows the geographic impact of Ankur Agarwal's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ankur Agarwal with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ankur Agarwal more than expected).
Fields of papers citing papers by Ankur Agarwal
This network shows the impact of papers produced by Ankur Agarwal. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ankur Agarwal. The network helps show where Ankur Agarwal may publish in the future.
Co-authors
The 25 scholars most cited alongside Ankur Agarwal, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 48 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2020 | 170 | |
| 2 | 2008 | 154 | |
| 3 | 1993 | 122 | |
| 4 | 2009 | 82 | |
| 5 | 2009 | 52 | |
| 6 | 2005 | 49 | |
| 7 | 2019 | 43 | |
| 8 | 2008 | 42 | |
| 9 | 2007 | 40 | |
| 10 | 2023 | 38 | |
| 11 | 2012 | 36 | |
| 12 | 2022 | 35 | |
| 13 | 2017 | 32 | |
| 14 | 2012 | 31 | |
| 15 | 2017 | 29 | |
| 16 | 2011 | 23 | |
| 17 | 2017 | 19 | |
| 18 | 2012 | 17 | |
| 19 | 2020 | 16 | |
| 20 | 2011 | 16 |
About Ankur Agarwal
Ankur Agarwal is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials, Materials Chemistry, Electronic, Optical and Magnetic Materials and Inorganic Chemistry, having authored 48 papers that have together received 1.2k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (22 papers), Semiconductor materials and devices (21 papers), Metal and Thin Film Mechanics (13 papers), Copper Interconnects and Reliability (5 papers), Zeolite Catalysis and Synthesis (5 papers), Mesoporous Materials and Catalysis (4 papers), Advancements in Semiconductor Devices and Circuit Design (3 papers) and Advancements in Photolithography Techniques (3 papers). The work is most often cited by research in Inorganic Chemistry (236 citations), Electrical and Electronic Engineering (744 citations), Mechanics of Materials (292 citations), Catalysis (68 citations) and Materials Chemistry (424 citations). Ankur Agarwal has collaborated with scholars based in United States, India and South Korea. Frequent co-authors include Mark J. Kushner, Shahid Rauf, Ken Collins, Jeremy C. Palmer, Jeffrey D. Rimer, S. Banna, R. Tsu, Bert M. Weckhuysen, M. Arif Hasan and Thuy T. Le. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, IEEE Transactions on Plasma Science, Journal of Applied Physics, Applied Physics Letters and Plasma Sources Science and Technology.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.