Ankur Agarwal

1.4k total citations
48 papers, 1.2k citations indexed

About

Ankur Agarwal is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Materials Chemistry. According to data from OpenAlex, Ankur Agarwal has authored 48 papers receiving a total of 1.2k indexed citations (citations by other indexed papers that have themselves been cited), including 31 papers in Electrical and Electronic Engineering, 15 papers in Mechanics of Materials and 8 papers in Materials Chemistry. Recurrent topics in Ankur Agarwal's work include Plasma Diagnostics and Applications (22 papers), Semiconductor materials and devices (21 papers) and Metal and Thin Film Mechanics (13 papers). Ankur Agarwal is often cited by papers focused on Plasma Diagnostics and Applications (22 papers), Semiconductor materials and devices (21 papers) and Metal and Thin Film Mechanics (13 papers). Ankur Agarwal collaborates with scholars based in United States, India and South Korea. Ankur Agarwal's co-authors include Mark J. Kushner, Shahid Rauf, Ken Collins, Jeremy C. Palmer, Jeffrey D. Rimer, S. Banna, Thuy T. Le, J. E. Greene, M. Arif Hasan and Donglong Fu and has published in prestigious journals such as Journal of the American Chemical Society, Nature Materials and Applied Physics Letters.

In The Last Decade

Ankur Agarwal

45 papers receiving 1.1k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Ankur Agarwal United States 18 744 424 292 236 137 48 1.2k
Wenqi Lu China 19 728 1.0× 397 0.9× 253 0.9× 25 0.1× 155 1.1× 84 1.1k
Rongwei Fan China 16 437 0.6× 453 1.1× 124 0.4× 67 0.3× 299 2.2× 113 1.1k
Guanghui Yang China 16 394 0.5× 272 0.6× 117 0.4× 30 0.1× 125 0.9× 88 970
Pengyue Gao China 21 290 0.4× 837 2.0× 133 0.5× 130 0.6× 112 0.8× 68 1.3k
Zhen Xiong China 19 704 0.9× 692 1.6× 62 0.2× 66 0.3× 356 2.6× 57 1.6k
P. T. Murray United States 22 308 0.4× 432 1.0× 232 0.8× 28 0.1× 238 1.7× 61 1.1k
Ning Xu China 21 650 0.9× 1.1k 2.6× 107 0.4× 63 0.3× 263 1.9× 154 1.7k
Adelaide M. Nolan United States 21 3.5k 4.7× 1.4k 3.2× 42 0.1× 354 1.5× 117 0.9× 31 3.9k
Lei Han China 20 487 0.7× 637 1.5× 99 0.3× 30 0.1× 823 6.0× 70 1.8k
Mingjian Wu Germany 21 633 0.9× 552 1.3× 27 0.1× 105 0.4× 338 2.5× 96 1.4k

Countries citing papers authored by Ankur Agarwal

Since Specialization
Citations

This map shows the geographic impact of Ankur Agarwal's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ankur Agarwal with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ankur Agarwal more than expected).

Fields of papers citing papers by Ankur Agarwal

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ankur Agarwal. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ankur Agarwal. The network helps show where Ankur Agarwal may publish in the future.

Co-authorship network of co-authors of Ankur Agarwal

This figure shows the co-authorship network connecting the top 25 collaborators of Ankur Agarwal. A scholar is included among the top collaborators of Ankur Agarwal based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ankur Agarwal. Ankur Agarwal is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Agarwal, Ankur, Jeffrey D. Rimer, & Jeremy C. Palmer. (2023). Water Structure and Dynamics Near the Surfaces of Silicalite-1. The Journal of Physical Chemistry C. 127(49). 23887–23896. 1 indexed citations
2.
Huard, Chad M., et al.. (2023). On the origin and evolution of hotspots in multipatterning processes. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 41(4).
3.
Agarwal, Ankur, Chad M. Huard, Alessandro Vaglio Pret, et al.. (2022). Evolution of lithography-to-etch bias in multi-patterning processes. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 40(6). 2 indexed citations
4.
Huard, Chad M., et al.. (2022). Trilayer hard mark lithography and etch for BEOL manufacturing. 110–110. 4 indexed citations
5.
Dai, Heng, Yufeng Shen, Taimin Yang, et al.. (2020). Finned zeolite catalysts. Nature Materials. 19(10). 1074–1080. 170 indexed citations
6.
Agarwal, Ankur, et al.. (2020). Acidic Polysaccharides as Green Alternatives for Barite Scale Dissolution. ACS Applied Materials & Interfaces. 12(49). 55434–55443. 16 indexed citations
7.
Agarwal, Ankur, et al.. (2019). First results from the XMCD facility at the Energy-Dispersive EXAFS beamline of the Indus-2 synchrotron source. Journal of Synchrotron Radiation. 26(2). 445–449. 1 indexed citations
9.
Dahiya, Manjeet S., Ankur Agarwal, & Satish Khasa. (2016). Compositional Dependence of Optical Absorption in Barium Oxychloride Borate Glasses. Journal of Advanced Physics. 6(1). 116–120. 5 indexed citations
10.
Agarwal, Ankur, Shahid Rauf, & Ken Collins. (2012). Gas heating mechanisms in capacitively coupled plasmas. Plasma Sources Science and Technology. 21(5). 55012–55012. 36 indexed citations
11.
Agarwal, Ankur, et al.. (2012). Decreasing high ion energy during transition in pulsed inductively coupled plasmas. Applied Physics Letters. 100(4). 17 indexed citations
12.
Agarwal, Ankur, et al.. (2011). Recouping etch rates in pulsed inductively coupled plasmas. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 29(1). 23 indexed citations
13.
Agarwal, Ankur, et al.. (2008). Characteristics of Pulsed Capacitively Coupled Plasma Sources for Plasma Etching. Bulletin of the American Physical Society. 2 indexed citations
14.
Agarwal, Ankur, et al.. (2008). Performance Improvement of Gas Turbine Cycles. International Journal of Turbo and Jet Engines. 25(3). 11 indexed citations
15.
Izadi, Shahram, et al.. (2007). C-Slate: Exploring Remote Collaboration on Horizontal Multi-touch Surfaces. 9 indexed citations
16.
Agarwal, Ankur. (2007). Controlling Activation Energy to Wafers and Walls in Plasma Processing Reactors for Microelectronics Fabrication. 1 indexed citations
17.
Agarwal, Ankur & Mark J. Kushner. (2005). Effect of nonsinusoidal bias waveforms on ion energy distributions and fluorocarbon plasma etch selectivity. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 23(5). 1440–1449. 49 indexed citations
18.
Agarwal, Ankur, et al.. (2005). Characterization of SiCl[sub 4]/N[sub 2] Plasmas. Journal of The Electrochemical Society. 152(3). G210–G210. 4 indexed citations
19.
Agarwal, Ankur, et al.. (1993). Thermal desorption of ultraviolet–ozone oxidized Ge(001) for substrate cleaning. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 11(5). 2553–2561. 122 indexed citations
20.
Agarwal, Ankur, et al.. (1988). User interfaces to expert systems. OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information). 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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