Chad M. Huard

657 total citations
17 papers, 537 citations indexed

About

Chad M. Huard is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Materials Chemistry. According to data from OpenAlex, Chad M. Huard has authored 17 papers receiving a total of 537 indexed citations (citations by other indexed papers that have themselves been cited), including 14 papers in Electrical and Electronic Engineering, 4 papers in Biomedical Engineering and 4 papers in Materials Chemistry. Recurrent topics in Chad M. Huard's work include Plasma Diagnostics and Applications (9 papers), Semiconductor materials and devices (8 papers) and Advancements in Photolithography Techniques (4 papers). Chad M. Huard is often cited by papers focused on Plasma Diagnostics and Applications (9 papers), Semiconductor materials and devices (8 papers) and Advancements in Photolithography Techniques (4 papers). Chad M. Huard collaborates with scholars based in United States, Belgium and China. Chad M. Huard's co-authors include Mark J. Kushner, L. Jay Guo, Alex Paterson, Saravanapriyan Sriraman, Jong G. Ok, Moon Kyu Kwak, Jinbao Guo, Shuo Huang, Sang Ki Nam and Seung‐Bo Shim and has published in prestigious journals such as Advanced Materials, ACS Nano and Journal of Physics D Applied Physics.

In The Last Decade

Chad M. Huard

14 papers receiving 503 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Chad M. Huard United States 10 431 176 136 90 69 17 537
Alok Ranjan Singapore 16 611 1.4× 77 0.4× 363 2.7× 123 1.4× 43 0.6× 75 992
Won Mok Kim South Korea 15 415 1.0× 167 0.9× 295 2.2× 83 0.9× 89 1.3× 41 600
Aicha Elshabini United States 11 342 0.8× 93 0.5× 144 1.1× 55 0.6× 18 0.3× 39 476
Xiaoyun Sun China 11 271 0.6× 341 1.9× 93 0.7× 49 0.5× 63 0.9× 21 531
Abhijeet Bagal United States 9 119 0.3× 191 1.1× 79 0.6× 30 0.3× 36 0.5× 14 344
Ulrich Plachetka Germany 15 505 1.2× 694 3.9× 94 0.7× 46 0.5× 46 0.7× 35 827
Jeong Soo Lee South Korea 15 419 1.0× 220 1.3× 273 2.0× 39 0.4× 96 1.4× 29 736
Xu A. Zhang United States 13 138 0.3× 311 1.8× 80 0.6× 30 0.3× 44 0.6× 23 447
Jeff Tsung‐Hui Tsai Taiwan 14 249 0.6× 198 1.1× 352 2.6× 99 1.1× 59 0.9× 37 566
Youngjae Kim South Korea 14 430 1.0× 129 0.7× 159 1.2× 14 0.2× 42 0.6× 79 636

Countries citing papers authored by Chad M. Huard

Since Specialization
Citations

This map shows the geographic impact of Chad M. Huard's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Chad M. Huard with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Chad M. Huard more than expected).

Fields of papers citing papers by Chad M. Huard

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Chad M. Huard. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Chad M. Huard. The network helps show where Chad M. Huard may publish in the future.

Co-authorship network of co-authors of Chad M. Huard

This figure shows the co-authorship network connecting the top 25 collaborators of Chad M. Huard. A scholar is included among the top collaborators of Chad M. Huard based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Chad M. Huard. Chad M. Huard is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

17 of 17 papers shown
1.
Huang, Shuo, et al.. (2023). Process optimization for shallow trench isolation etch using computational models. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 41(5). 4 indexed citations
2.
Huard, Chad M., et al.. (2023). On the origin and evolution of hotspots in multipatterning processes. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 41(4).
3.
Huang, Shuo, et al.. (2023). Process optimization for shallow trench isolation etch using computational models. 47–47. 1 indexed citations
4.
Huard, Chad M., et al.. (2022). Trilayer hard mark lithography and etch for BEOL manufacturing. 110–110. 4 indexed citations
5.
Agarwal, Ankur, Chad M. Huard, Alessandro Vaglio Pret, et al.. (2022). Evolution of lithography-to-etch bias in multi-patterning processes. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 40(6). 2 indexed citations
6.
Huang, Shuo, et al.. (2019). Plasma etching of high aspect ratio features in SiO2 using Ar/C4F8/O2 mixtures: A computational investigation. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 37(3). 84 indexed citations
7.
Huard, Chad M., et al.. (2018). Consequences of atomic layer etching on wafer scale uniformity in inductively coupled plasmas. Journal of Physics D Applied Physics. 51(15). 155201–155201. 14 indexed citations
8.
Huard, Chad M., Saravanapriyan Sriraman, Alex Paterson, & Mark J. Kushner. (2018). Transient behavior in quasi-atomic layer etching of silicon dioxide and silicon nitride in fluorocarbon plasmas. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 36(6). 55 indexed citations
9.
Chen, Mikai, Yifan Wang, Chad M. Huard, et al.. (2017). Abnormal Multiple Charge Memory States in Exfoliated Few-Layer WSe2 Transistors. ACS Nano. 11(1). 1091–1102. 42 indexed citations
10.
Huard, Chad M., et al.. (2017). Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactions. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 35(3). 48 indexed citations
11.
Huard, Chad M., et al.. (2017). Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 35(5). 50 indexed citations
12.
Huard, Chad M., et al.. (2016). Investigation of feature orientation and consequences of ion tilting during plasma etching with a three-dimensional feature profile simulator. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 35(2). 37 indexed citations
13.
Zhang, Qi, et al.. (2014). Highly stable and stretchable graphene–polymer processed silver nanowires hybrid electrodes for flexible displays. Journal of Materials Chemistry C. 3(7). 1528–1536. 57 indexed citations
14.
Guo, Jinbao, Chad M. Huard, Yang Yang, et al.. (2014). ITO‐Free, Compact, Color Liquid Crystal Devices Using Integrated Structural Color Filters and Graphene Electrodes. Advanced Optical Materials. 2(5). 435–441. 42 indexed citations
15.
Ok, Jong G., et al.. (2013). Photo–Roll Lithography (PRL) for Continuous and Scalable Patterning with Application in Flexible Electronics. Advanced Materials. 25(45). 6554–6561. 89 indexed citations
16.
Tan, Xuebin, Chad M. Huard, Hsun‐Jen Chuang, et al.. (2012). Control and enhancement of graphene sensitivity by engineering edge defects. 324. 1–4. 1 indexed citations
17.
Tan, Xuebin, et al.. (2012). Electrowetting on flexible, transparent and conducting single-layer graphene. 1037–1040. 7 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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