Chad M. Huard

657 citations
17 papers · 537 indexed · h-index 10
Topics
Plasma Diagnostics and Applications (9 papers)Semiconductor materials and devices (8 papers)Advancements in Photolithography Techniques (4 papers)

In The Last Decade

Chad M. Huard

14 papers receiving 503 citations

Peers

Chad M. Huard
Comparison fields: 5 of 39
  • Electrical and Electronic Engineering 431
  • Biomedical Engineering 176
  • Materials Chemistry 136
  • Mechanics of Materials 90
  • Electronic, Optical and Magnetic Materials 69
Replace Alok Ranjan with:
Alok Ranjan Singapore
Won Mok Kim South Korea
Xiaoyun Sun China
Aicha Elshabini United States
Jeong Soo Lee South Korea
Youngjae Kim South Korea
Jeff Tsung‐Hui Tsai Taiwan
Byoungdeog Choi South Korea
Ulrich Plachetka Germany
Yiling Lian China
Chad M. Huard relative to Alok Ranjan Singapore Alok Ranjan's profile →
Citations per field
00.5×4.8×
Alok Ranjan · 1×
Citations per year

Countries citing papers authored by Chad M. Huard

Since Specialization
Citations

This map shows the geographic impact of Chad M. Huard's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Chad M. Huard with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Chad M. Huard more than expected).

Fields of papers citing papers by Chad M. Huard

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Chad M. Huard. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Chad M. Huard. The network helps show where Chad M. Huard may publish in the future.

Co-authorship network of co-authors of Chad M. Huard

This figure shows the co-authorship network connecting the top 25 collaborators of Chad M. Huard. A scholar is included among the top collaborators of Chad M. Huard based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Chad M. Huard. Chad M. Huard is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

17 of 17 papers shown
#WorkIndexed citations
1 4
2 0
3 1
4 2
5 4
6 84
7 55
8 14
9 42
10 50
11 48
12 37
13 57
14 42
15 89
16 7
17 1

About Chad M. Huard

Chad M. Huard is a scholar working on Electrical and Electronic Engineering, Bioengineering and Surfaces, Coatings and Films, having authored 17 papers that have together received 537 indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (9 papers), Semiconductor materials and devices (8 papers) and Advancements in Photolithography Techniques (4 papers). The work is most often cited by research in Electrical and Electronic Engineering (431 citations), Surfaces, Coatings and Films (32 citations) and Biomedical Engineering (176 citations). Chad M. Huard has collaborated with scholars based in United States, South Korea and China. Frequent co-authors include Mark J. Kushner, L. Jay Guo, Alex Paterson, Saravanapriyan Sriraman, Moon Kyu Kwak, Jong G. Ok, Jinbao Guo, Shuo Huang, Sang Ki Nam and Seung‐Bo Shim. Their work appears in journals such as Advanced Materials, ACS Nano and Journal of Physics D Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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