Geert Vandenberghe

1.4k total citations
133 papers, 933 citations indexed

About

Geert Vandenberghe is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Geert Vandenberghe has authored 133 papers receiving a total of 933 indexed citations (citations by other indexed papers that have themselves been cited), including 128 papers in Electrical and Electronic Engineering, 59 papers in Surfaces, Coatings and Films and 41 papers in Biomedical Engineering. Recurrent topics in Geert Vandenberghe's work include Advancements in Photolithography Techniques (124 papers), Integrated Circuits and Semiconductor Failure Analysis (71 papers) and Electron and X-Ray Spectroscopy Techniques (52 papers). Geert Vandenberghe is often cited by papers focused on Advancements in Photolithography Techniques (124 papers), Integrated Circuits and Semiconductor Failure Analysis (71 papers) and Electron and X-Ray Spectroscopy Techniques (52 papers). Geert Vandenberghe collaborates with scholars based in Belgium, United States and Netherlands. Geert Vandenberghe's co-authors include Danilo De Simone, Kurt Ronse, Eric Hendrickx, Joost Bekaert, Roel Gronheid, Ivan Pollentier, Vincent Wiaux, Pieter Vanelderen, Mireille Maenhoudt and Peter De Bisschop and has published in prestigious journals such as ACS Applied Materials & Interfaces, Japanese Journal of Applied Physics and IEEE Transactions on Circuits and Systems I Regular Papers.

In The Last Decade

Geert Vandenberghe

121 papers receiving 879 citations

Peers

Geert Vandenberghe

EEE

SCF

Manish Chandhok United States

Kafai Lai United States

Dieter Van den Heuvel Belgium

Neal Lafferty United States

Frieda Van Roey Belgium

Hye-Keun Oh South Korea

Yuansheng Ma United States

Hiroki Kawada Japan

Huixiong Dai United States

Kathleen Nafus Belgium

Manish Chandhok United States

Geert Vandenberghe

597 ×0.7

EEE

249 ×0.7

SCF

182 ×0.6

77 ×0.7

18 ×0.3

Citations per year, relative to Geert Vandenberghe Geert Vandenberghe (= 1×) peers Manish Chandhok

Countries citing papers authored by Geert Vandenberghe

Since Specialization

Citations

This map shows the geographic impact of Geert Vandenberghe's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Geert Vandenberghe with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Geert Vandenberghe more than expected).

Fields of papers citing papers by Geert Vandenberghe

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Geert Vandenberghe. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Geert Vandenberghe. The network helps show where Geert Vandenberghe may publish in the future.

Co-authorship network of co-authors of Geert Vandenberghe

This figure shows the co-authorship network connecting the top 25 collaborators of Geert Vandenberghe. A scholar is included among the top collaborators of Geert Vandenberghe based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Geert Vandenberghe. Geert Vandenberghe is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Nagahara, Seiji, Yoshihiro Kondo, Kathleen Nafus, et al.. (2020). EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity. 9–9. 10 indexed citations

Kosma, Vasiliki, Danilo De Simone, & Geert Vandenberghe. (2019). Metal Based Materials for EUV Lithography. Journal of Photopolymer Science and Technology. 32(1). 179–183. 2 indexed citations

Simone, Danilo De, et al.. (2019). Photoresist Absorption Measurement at Extreme Ultraviolet (EUV) Wavelength by Thin Film Transmission Method. Journal of Photopolymer Science and Technology. 32(1). 57–66. 5 indexed citations

Simone, Danilo De, et al.. (2018). The Path to Better Understanding Stochastics in EUV Photoresist. Journal of Photopolymer Science and Technology. 31(5). 651–655. 10 indexed citations

Jiang, Jing, Danilo De Simone, & Geert Vandenberghe. (2017). Difference in EUV photoresist design towards reduction of LWR and LCDU. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10146. 101460A–101460A. 8 indexed citations

Simone, Danilo De, et al.. (2017). Exploring the readiness of EUV photo materials for patterning advanced technology nodes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101430R–101430R. 18 indexed citations

Stowers, Jason K., Jeremy T. Anderson, Brian Cardineau, et al.. (2016). Metal oxide EUV photoresist performance for N7 relevant patterns and processes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9779. 977904–977904. 34 indexed citations

Simone, Danilo De, Şafak Sayan, Ivan Pollentier, et al.. (2016). Novel metal containing resists for EUV lithography extendibility. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 977606–977606. 11 indexed citations

Sayan, Şafak, Tao Zheng, Danilo De Simone, & Geert Vandenberghe. (2016). EUV extendibility via dry development rinse process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 977610–977610. 1 indexed citations

10.

Grenville, Andrew, Jeremy T. Anderson, Benjamin L. Clark, et al.. (2015). Integrated fab process for metal oxide EUV photoresist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9425. 94250S–94250S. 67 indexed citations

11.

Gao, Weimin, et al.. (2015). Experimental validation of stochastic modeling for negative-tone develop EUV resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 942223–942223. 2 indexed citations

12.

Simone, Danilo De, Ivan Pollentier, & Geert Vandenberghe. (2015). Metal-containing Materials as Turning Point of EUV Lithography. Journal of Photopolymer Science and Technology. 28(4). 507–514. 23 indexed citations

13.

Ronse, Kurt, et al.. (2008). Lithography options for the 32nm half pitch node and beyond. 6924 24. 371–378. 3 indexed citations

14.

Bekaert, Joost, et al.. (2007). Combined illumination sources for hyper-NA contact hole printing. Solid State Technology. 50(11). 48–50. 1 indexed citations

15.

Vandenberghe, Geert, et al.. (2005). Opportunities and Challenges in Immersion Lithography. Journal of Photopolymer Science and Technology. 18(5). 571–577. 4 indexed citations

16.

Vandenberghe, Geert, et al.. (2002). High-NA ArF lithography for 70-nm technologies. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 1613–1613. 2 indexed citations

17.

Lucas, Kevin, et al.. (2001). Model-based OPC for first-generation 193-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4346. 119–119. 2 indexed citations

18.

Jonckheere, R., et al.. (2001). Reticle quality needs for advanced 193-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4409. 108–108. 2 indexed citations

19.

Roey, Frieda Van, et al.. (2000). Implementation of ArF Resist Processes for 130nm and below.. Journal of Photopolymer Science and Technology. 13(4). 635–644. 1 indexed citations

20.

Ronse, Kurt, et al.. (1999). <title>Recent trends and progress in deep-UV lithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3741. 34–39. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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