Paul Gräupner

481 citations

24 papers · 357 indexed · h-index 12

Impact in

Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
Radiation top 10%
- Advanced X-ray Imaging Techniques

Papers in

Surfaces, Coatings and Films 16
- Electron and X-Ray Spectroscopy Techniques 10
- Optical Coatings and Gratings 7
Radiation 4
- Advanced X-ray Imaging Techniques 3

Co-authors: Jens Timo Neumann Winfried Kaiser Andreas Erdmann Peter Evanschitzky Jean‐Louis Coutaz A. Cachard J.‐C. POMMIER Jan van Schoot
Journals: Journal of Micro/Nanolithography MEMS and MOEMS (1 paper)Journal of Applied Physics (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (13 papers)
Partner nations: Germany Netherlands United States

In The Last Decade

Paul Gräupner

23 papers receiving 308 citations

Peers

Countries citing papers authored by Paul Gräupner

Since Specialization

Citations

This map shows the geographic impact of Paul Gräupner's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Paul Gräupner with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Paul Gräupner more than expected).

Fields of papers citing papers by Paul Gräupner

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Paul Gräupner. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Paul Gräupner. The network helps show where Paul Gräupner may publish in the future.

Co-authors

The 25 scholars most cited alongside Paul Gräupner, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Paul Gräupner Line = papers co-authored together Paul Gräupner links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	EUV optics at ZEISS: status, outlook, and future J. Kalden, Jens Timo Neumann, Lars Samuelson, Paul Gräupner, Wolfgang Seitz, Peter Kuerz	2024	2
2	The next step in Moore’s law: high-NA EUV introduction at the customer Moreno Mondragón Daniela, Rudy Peeters, Marieni A., Sjoerd Lok, Jan van Schoot, Paul Gräupner, Peter Kuerz, N. G. Smirnova, Oleksandra Dmytrenko, Peter Vanoppen	2024	4
3	Emergence of next generation EUV optics: status, outlook and future D. Golde, Björn Butscher, Paul Gräupner, Peter Kürz, Josef Chladil, Boris Chobrutskiy Chobrutskiy, Jan van Schoot, Judon Stoeldraijer	2023	2
4	Status and outlook of EUV optics at ZEISS Jörg Zimmermann, Jens Timo Neumann, Josef Chladil, Paul Gräupner	2023	5
5	High-NA EUV platform realization as next step in EUV technology Moreno Mondragón Daniela, Rudy Peeters, Jeroen van Dongen, Marieni A., Sjoerd Lok, Jan van Schoot, Paul Gräupner, Peter Kuerz, M. Carlos Galindo Pérez, H. W. Paine, Peter Vanoppen	2023	4
6	High-NA EUV lithography optics becomes reality L. Wischmeier, Paul Gräupner, Peter Kürz, Winfried Kaiser, Jan van Schoot, N. G. Smirnova, Alaeddin Kordenaeej, Judon Stoeldraijer	2020	22
7	High-NA EUV Optics – The key for miniaturization of integrated circuits in the next decade Назаров Александр Викторович, Paul Gräupner, Peter Kürz, Winfried Kaiser	2019	2
8	High-NA EUV lithography: pushing the limits 澄子宮田, Paul Gräupner, Jan van Schoot, Peter Kuerz, Judon Stoeldraijer, Winfried Kaiser	2019	29
9	Mask-induced best-focus shifts in deep ultraviolet and extreme ultraviolet lithography Journal of Micro/Nanolithography MEMS and MOEMS ·Andreas Erdmann, Peter Evanschitzky, Jens Timo Neumann, Paul Gräupner	2016	27
10	Imaging performance of EUV lithography optics configuration for sub-9nm resolution Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jens Timo Neumann, 陈克平, Paul Gräupner, Tim Crich, Bernhard Kneer, Winfried Kaiser, Koen van Ingen Schenau	2015	20
11	Mask-induced best-focus-shifts in DUV and EUV lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Andreas Erdmann, Peter Evanschitzky, Jens Timo Neumann, Paul Gräupner	2015	11
12	EUV source-mask optimization for 7nm node and beyond Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Xiaofeng Liu, Tinto Brass, Stephen D. H. Hsu, Kaiyu Yang, Rugare Mahovo, Frank Driessen, Huayu Liu, Steven G. Hansen, Koen van Ingen Schenau, 郝勇 Hao Yong, Nataliia Holiardyk, Kars Troost, Jörg Zimmermann, Marco Lagori, Thomas Jefferson Randolph, Paul Gräupner	2014	24
13	Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jörg Zimmermann, Paul Gräupner, Jens Timo Neumann, Christiane Welti, Josef Chladil, Michael Patra, Thomas Jefferson Randolph, Alison L. Crocker, 哲哉岸本, 李万忍, O.F.J. Noordman, P Bauer, Sean S. Park, Jennifer Kourassanis	2010	21
14	Imaging budgets for EUV optics: ready for 22-nm node and beyond Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Hans Gunther Klemm, María Platón Corchado, Hasan H Uysal, Martin Lowisch, Paul Gräupner, Tilmann Heil, Reiner Garreis, Koen van Ingen Schenau, Saad Ahmed Mohamed Youssef	2009	2
15	The impact of projection lens polarization properties on lithographic process at hyper-NA Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·哲哉岸本, Johannes Ruoff, Jörg Zimmermann, Paul Gräupner, Michael Totzeck, Markus Mengel, Fasheng SUn, Qiang Duan	2007	23
16	Catadioptric lens design: the breakthrough to hyper-NA optics Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Bernhard Kneer, Paul Gräupner, Reiner Garreis, Ralph Kläsges, Назаров Александр Викторович	2006	5
17	The next phase for immersion lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Buvinic Sonja, Jan Mulkens, C Pedrosa, A. Guastoni, Adele Pashely, Paul Gräupner	2006	8
18	Predictive modeling of advanced illumination pupils used as imaging enhancement for low-k 1 applications Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Tilmann Heil, Paul Gräupner, Reiner Garreis, Rafael Egger, G Shishkovsky, Jo Finders, Steve Hansen	2004	8
19	Extending optical lithography with immersion Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Adele Pashely, 俞惠良, Mark D. Griffith, Jan Mulkens, Praveen M.P, Н.А. Храмова, Donis G. Flagello, Buvinic Sonja, Paul Gräupner	2004	30
20	Electro-optical effect in aluminum nitride waveguides Journal of Applied Physics ·Paul Gräupner, J.‐C. POMMIER, A. Cachard, Jean‐Louis Coutaz	1992	35

About Paul Gräupner

Paul Gräupner is a scholar working on Surfaces, Coatings and Films, Radiation, Electrical and Electronic Engineering, Biomedical Engineering and Marketing, having authored 24 papers that have together received 357 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (20 papers), Electron and X-Ray Spectroscopy Techniques (10 papers), Integrated Circuits and Semiconductor Failure Analysis (9 papers), Optical Coatings and Gratings (7 papers), Advanced Surface Polishing Techniques (3 papers), Nanofabrication and Lithography Techniques (3 papers), Advanced X-ray Imaging Techniques (3 papers) and Advanced optical system design (2 papers). The work is most often cited by research in Surfaces, Coatings and Films (135 citations), Radiation (48 citations), Electrical and Electronic Engineering (305 citations), Media Technology (33 citations) and Biomedical Engineering (152 citations). Paul Gräupner has collaborated with scholars based in Germany, Netherlands and United States. Frequent co-authors include Jens Timo Neumann, Winfried Kaiser, Andreas Erdmann, Peter Evanschitzky, Jean‐Louis Coutaz, A. Cachard, J.‐C. POMMIER, Jan van Schoot, Judon Stoeldraijer and Jörg Zimmermann. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Journal of Applied Physics and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

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