Jörg Schuhmacher
- Materials Chemistry top 5%
- Electrical and Electronic Engineering top 5%
- Ceramics and Composites top 1%
- Mechanical Engineering top 5%
- Electronic, Optical and Magnetic Materials top 10%
- Co-authors
- Peter KlüfersFritz AldingerMarkus WeinmannKlaus MüllerJoachim BillKaren MaexAndreas RotersHans Jürgen Seifert
- Topics
- Semiconductor materials and devices (23 papers)Copper Interconnects and Reliability (19 papers)Metal and Thin Film Mechanics (18 papers)
- Partner nations
- GermanyBelgiumUnited States
In The Last Decade
Jörg Schuhmacher
56 papers receiving 1.7k citations
Peers
Comparison fields: 5 of 73
- Materials Chemistry 768
- Electrical and Electronic Engineering 754
- Ceramics and Composites 585
- Mechanical Engineering 381
- Electronic, Optical and Magnetic Materials 280
Countries citing papers authored by Jörg Schuhmacher
This map shows the geographic impact of Jörg Schuhmacher's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jörg Schuhmacher with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jörg Schuhmacher more than expected).
Fields of papers citing papers by Jörg Schuhmacher
This network shows the impact of papers produced by Jörg Schuhmacher. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jörg Schuhmacher. The network helps show where Jörg Schuhmacher may publish in the future.
Co-authorship network of co-authors of Jörg Schuhmacher
This figure shows the co-authorship network connecting the top 25 collaborators of Jörg Schuhmacher. A scholar is included among the top collaborators of Jörg Schuhmacher based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jörg Schuhmacher. Jörg Schuhmacher is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 16 | |
| 2 | 19 | |
| 3 | 77 | |
| 4 | 8 | |
| 5 | 6 | |
| 6 | 21 | |
| 7 | 15 | |
| 8 | 1 | |
| 9 | 8 | |
| 10 | 4 | |
| 11 | Precursor penetration and sealing for CVD SiCOH low k dielectric during atomic layer deposition of WCN barrier | 1 |
| 12 | 16 | |
| 13 | 209 | |
| 14 | 32 | |
| 15 | 14 | |
| 16 | 17 | |
| 17 | 21 | |
| 18 | 50 | |
| 19 | 69 | |
| 20 | 17 |
About Jörg Schuhmacher
Jörg Schuhmacher is a scholar working on Ceramics and Composites, Electronic, Optical and Magnetic Materials and Inorganic Chemistry, having authored 58 papers that have together received 1.7k indexed citations. Recurring topics across this work include Semiconductor materials and devices (23 papers), Copper Interconnects and Reliability (19 papers) and Metal and Thin Film Mechanics (18 papers). The work is most often cited by research in Ceramics and Composites (585 citations), Materials Chemistry (768 citations) and Electronic, Optical and Magnetic Materials (280 citations). Jörg Schuhmacher has collaborated with scholars based in Germany, Belgium and United States. Frequent co-authors include Peter Klüfers, Fritz Aldinger, Markus Weinmann, Klaus Müller, Joachim Bill, Karen Maex, Andreas Roters, Hans Jürgen Seifert, Joachim Bill and Jianqiang Peng. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics and Chemistry of Materials.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.