Ivan L. Berry

860 total citations
58 papers, 630 citations indexed

About

Ivan L. Berry is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Computational Mechanics. According to data from OpenAlex, Ivan L. Berry has authored 58 papers receiving a total of 630 indexed citations (citations by other indexed papers that have themselves been cited), including 38 papers in Electrical and Electronic Engineering, 9 papers in Electronic, Optical and Magnetic Materials and 8 papers in Computational Mechanics. Recurrent topics in Ivan L. Berry's work include Semiconductor materials and devices (24 papers), Advancements in Photolithography Techniques (9 papers) and Copper Interconnects and Reliability (9 papers). Ivan L. Berry is often cited by papers focused on Semiconductor materials and devices (24 papers), Advancements in Photolithography Techniques (9 papers) and Copper Interconnects and Reliability (9 papers). Ivan L. Berry collaborates with scholars based in United States, Germany and Belgium. Ivan L. Berry's co-authors include Tom Tabler, J. Melngailis, A. Mondelli, H. Xin, A.L. Caviglia, Thorsten Lill, Keren J. Kanarik, Samantha Tan, Richard A. Gottscho and Tom Costello and has published in prestigious journals such as Journal of The Electrochemical Society, Poultry Science and Computers and Electronics in Agriculture.

In The Last Decade

Ivan L. Berry

50 papers receiving 557 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Ivan L. Berry United States 12 361 142 113 105 72 58 630
P. J. James United Kingdom 11 267 0.7× 196 1.4× 117 1.0× 17 0.2× 30 0.4× 33 633
Keran Zhang China 17 642 1.8× 132 0.9× 410 3.6× 94 0.9× 21 0.3× 36 976
Joonghan Shin South Korea 18 593 1.6× 287 2.0× 185 1.6× 24 0.2× 116 1.6× 59 1.2k
Fei He China 13 165 0.5× 394 2.8× 82 0.7× 30 0.3× 198 2.8× 38 758
Étienne Petit France 13 99 0.3× 41 0.3× 127 1.1× 14 0.1× 69 1.0× 29 452
Do Hyun Kim South Korea 15 176 0.5× 116 0.8× 338 3.0× 22 0.2× 19 0.3× 32 588
Zoltán Kántor Hungary 12 217 0.6× 105 0.7× 275 2.4× 6 0.1× 194 2.7× 43 582
R. Hillel France 12 225 0.6× 37 0.3× 429 3.8× 308 2.9× 17 0.2× 43 932
Xueyan Chen China 19 237 0.7× 407 2.9× 445 3.9× 54 0.5× 27 0.4× 41 1.3k
Liang Zhong China 15 65 0.2× 150 1.1× 95 0.8× 55 0.5× 34 0.5× 24 595

Countries citing papers authored by Ivan L. Berry

Since Specialization
Citations

This map shows the geographic impact of Ivan L. Berry's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ivan L. Berry with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ivan L. Berry more than expected).

Fields of papers citing papers by Ivan L. Berry

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ivan L. Berry. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ivan L. Berry. The network helps show where Ivan L. Berry may publish in the future.

Co-authorship network of co-authors of Ivan L. Berry

This figure shows the co-authorship network connecting the top 25 collaborators of Ivan L. Berry. A scholar is included among the top collaborators of Ivan L. Berry based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ivan L. Berry. Ivan L. Berry is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kanarik, Keren J., Samantha Tan, Wenbing Yang, et al.. (2017). Predicting synergy in atomic layer etching. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 35(5). 98 indexed citations
2.
3.
Berry, Ivan L., et al.. (2016). Ultra shallow junction (USJ) formation using plasma assisted doping on 3D devices structures. 39–43. 2 indexed citations
4.
Mannaert, G., Rita Vos, D. Tsvetanova, et al.. (2011). Optimization of Resist Ash Processes on Si0.45Ge0.55 Substrates for Post Extension-Halo Ion Implantation. ECS Transactions. 41(7). 283–291. 2 indexed citations
5.
Radisic, D., Denis Shamiryan, G. Mannaert, et al.. (2010). Metrology for Implanted Si Substrate Loss Studies. Journal of The Electrochemical Society. 157(5). H580–H580. 3 indexed citations
6.
Mannaert, G., Liesbeth Witters, Denis Shamiryan, et al.. (2009). Post Extension Ion Implant Photo Resist Strip for 32 nm Technology and beyond. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 145-146. 253–256. 3 indexed citations
7.
Liang, Yi, Tom Tabler, S.E. Watkins, H. Xin, & Ivan L. Berry. (2009). Energy Use Analysis of Open-Curtain vs. Totally Enclosed Broiler Houses in Northwest Arkansas. Applied Engineering in Agriculture. 25(4). 577–584. 10 indexed citations
8.
Berry, Ivan L., et al.. (2007). Requirements and Constraints on Optimizing UV Processing of Low-k Dielectrics. MRS Proceedings. 990. 3 indexed citations
9.
10.
Han, Qing, et al.. (2005). Activated He:H<sub>2</sub> Strip of Photoresist over Porous Low-k Materials. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 103-104. 341–344. 7 indexed citations
11.
Chen, Wei, et al.. (2004). Plasma Impacts to an O-SiC Low-k Barrier Film. Journal of The Electrochemical Society. 151(8). F182–F182. 14 indexed citations
12.
Louis, D., et al.. (2000). Resist removal process in dual damascene structure integrating Cu and SiLK® for 0.18 μm technology. Microelectronic Engineering. 53(1-4). 381–384. 5 indexed citations
13.
Berry, Ivan L.. (1998). Economic and technical case for ion projection lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 16(4). 2444–2448. 5 indexed citations
14.
Xin, H., Ivan L. Berry, & Tom Tabler. (1996). Minimum Ventilation Requirement and Associated Energy Cost for Aerial Ammonia Control in Broiler Houses. Transactions of the ASAE. 39(2). 645–648. 31 indexed citations
15.
Xin, H., et al.. (1994). Feed and Water Consumption, Growth, and Mortality of Male Broilers. Poultry Science. 73(5). 610–616. 41 indexed citations
16.
Xin, H., Ivan L. Berry, & Tom Costello. (1994). A computerized measurement and data acquisition system for field poultry research. Computers and Electronics in Agriculture. 11(2-3). 143–156. 7 indexed citations
17.
Costello, Tom & Ivan L. Berry. (1990). An aspirated psychrometer with a fan-actuated sensor-dipping mechanism for use in dusty environments.. Paper - American Society of Agricultural Engineers. 1 indexed citations
18.
Berry, Ivan L., Tom Costello, & R. Benz. (1990). Cooling broiler chickens by surface wetting.. Paper - American Society of Agricultural Engineers. 7 indexed citations
19.
Berry, Ivan L. & A.L. Caviglia. (1983). High resolution patterning of silicon by selective gallium doping. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 1(4). 1059–1061. 40 indexed citations
20.
Kibler, H. H., et al.. (1962). Environmental physiology and shelter engineering with special reference to domestic animals. LX, Vaporization rates in Brown Swiss, Holstein, and Jersey calves during growth at constant 50 degrees and 80 degrees temperatures. MOspace Institutional Repository (University of Missouri). 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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