Hualiang Shi
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials top 10%
- Mechanics of Materials top 10%
- Materials Chemistry
- Atomic and Molecular Physics, and Optics
- Co-authors
- Paul S. HoHuai HuangJean‐François de MarneffeAdam UrbanowiczMikhaı̈l R. BaklanovТ. В. РахимоваDenis ShamiryanYa Yan Lu
- Topics
- Optical Coatings and Gratings (5 papers)Copper Interconnects and Reliability (4 papers)Semiconductor materials and devices (4 papers)
- Cited by
- Electronic, Optical and Magnetic MaterialsMechanics of MaterialsElectrical and Electronic Engineering
- Partner nations
- United StatesHong KongChina
In The Last Decade
Hualiang Shi
12 papers receiving 322 citations
Peers
Comparison fields: 5 of 27
- Electrical and Electronic Engineering 286
- Electronic, Optical and Magnetic Materials 222
- Mechanics of Materials 149
- Materials Chemistry 51
- Atomic and Molecular Physics, and Optics 47
Countries citing papers authored by Hualiang Shi
This map shows the geographic impact of Hualiang Shi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Hualiang Shi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Hualiang Shi more than expected).
Fields of papers citing papers by Hualiang Shi
This network shows the impact of papers produced by Hualiang Shi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Hualiang Shi. The network helps show where Hualiang Shi may publish in the future.
Co-authorship network of co-authors of Hualiang Shi
This figure shows the co-authorship network connecting the top 25 collaborators of Hualiang Shi. A scholar is included among the top collaborators of Hualiang Shi based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Hualiang Shi. Hualiang Shi is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 2 | |
| 2 | 1 | |
| 3 | 1 | |
| 4 | 5 | |
| 5 | 3 | |
| 6 | 8 | |
| 7 | 14 | |
| 8 | 243 | |
| 9 | 40 | |
| 10 | 7 | |
| 11 | 3 | |
| 12 | 8 |
About Hualiang Shi
Hualiang Shi is a scholar working on Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials and Mechanics of Materials, having authored 12 papers that have together received 335 indexed citations. Recurring topics across this work include Optical Coatings and Gratings (5 papers), Copper Interconnects and Reliability (4 papers) and Semiconductor materials and devices (4 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (222 citations), Mechanics of Materials (149 citations) and Electrical and Electronic Engineering (286 citations). Hualiang Shi has collaborated with scholars based in United States, Hong Kong and China. Frequent co-authors include Paul S. Ho, Huai Huang, Jean‐François de Marneffe, Adam Urbanowicz, Mikhaı̈l R. Baklanov, Т. В. Рахимова, Denis Shamiryan, Ya Yan Lu, Junjun Liu and Yifeng Zhou. Their work appears in journals such as Journal of Applied Physics, Optics Express and Journal of the Optical Society of America A.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.