Thomas Abell

640 total citations
19 papers, 530 citations indexed

About

Thomas Abell is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering and Mechanics of Materials. According to data from OpenAlex, Thomas Abell has authored 19 papers receiving a total of 530 indexed citations (citations by other indexed papers that have themselves been cited), including 17 papers in Electronic, Optical and Magnetic Materials, 15 papers in Electrical and Electronic Engineering and 10 papers in Mechanics of Materials. Recurrent topics in Thomas Abell's work include Copper Interconnects and Reliability (17 papers), Semiconductor materials and devices (14 papers) and Metal and Thin Film Mechanics (9 papers). Thomas Abell is often cited by papers focused on Copper Interconnects and Reliability (17 papers), Semiconductor materials and devices (14 papers) and Metal and Thin Film Mechanics (9 papers). Thomas Abell collaborates with scholars based in Belgium, United States and Netherlands. Thomas Abell's co-authors include Karen Maex, Francesca Iacopi, Denis Shamiryan, Youssef Travaly, Kristof Houthoofd, Piet J. Grobet, Reinhold H. Dauskardt, Peter A. Jacobs, B. Eyckens and Timo Sajavaara and has published in prestigious journals such as Journal of Applied Physics, Materials Today and Frontiers in Psychiatry.

In The Last Decade

Thomas Abell

18 papers receiving 516 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Thomas Abell Belgium 7 309 290 229 134 107 19 530
David M. Gage United States 7 151 0.5× 167 0.6× 174 0.8× 77 0.6× 56 0.5× 8 341
Wen-Fa Wu Taiwan 15 653 2.1× 245 0.8× 298 1.3× 147 1.1× 31 0.3× 87 841
Sharmistha Anwar India 14 280 0.9× 92 0.3× 507 2.2× 147 1.1× 36 0.3× 62 626
Haruo Yokomichi Japan 14 386 1.2× 60 0.2× 534 2.3× 134 1.0× 52 0.5× 49 620
Sa‐Kyun Rha South Korea 13 421 1.4× 190 0.7× 265 1.2× 128 1.0× 31 0.3× 42 562
D. Knoesen South Africa 15 500 1.6× 88 0.3× 334 1.5× 52 0.4× 216 2.0× 47 694
H. T. Langhammer Germany 21 531 1.7× 405 1.4× 951 4.2× 53 0.4× 22 0.2× 57 1.0k
K. Ait Aissa France 10 179 0.6× 171 0.6× 229 1.0× 125 0.9× 37 0.3× 10 428
P. Sanguino Portugal 12 186 0.6× 158 0.5× 340 1.5× 41 0.3× 36 0.3× 40 454
Giin-Shan Chen Taiwan 12 253 0.8× 171 0.6× 133 0.6× 62 0.5× 38 0.4× 61 390

Countries citing papers authored by Thomas Abell

Since Specialization
Citations

This map shows the geographic impact of Thomas Abell's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Thomas Abell with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Thomas Abell more than expected).

Fields of papers citing papers by Thomas Abell

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Thomas Abell. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Thomas Abell. The network helps show where Thomas Abell may publish in the future.

Co-authorship network of co-authors of Thomas Abell

This figure shows the co-authorship network connecting the top 25 collaborators of Thomas Abell. A scholar is included among the top collaborators of Thomas Abell based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Thomas Abell. Thomas Abell is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

19 of 19 papers shown
1.
2.
Iacopi, Francesca, Youssef Travaly, B. Eyckens, et al.. (2006). Short-ranged structural rearrangement and enhancement of mechanical properties of organosilicate glasses induced by ultraviolet radiation. Journal of Applied Physics. 99(5). 108 indexed citations
3.
Abell, Thomas, et al.. (2006). Challenges of Ultra Low-k Dielectric Measurement and Plasma Damage Assessment. MRS Proceedings. 914. 3 indexed citations
4.
Schuhmacher, Jörg, Mikhaı̈l R. Baklanov, Richard Ostwald, et al.. (2005). A theoretical and experimental study of atomic-layer-deposited films onto porous dielectric substrates. Journal of Applied Physics. 98(8). 15 indexed citations
5.
Abell, Thomas, Jörg Schuhmacher, Zsolt Tökei, Youssef Travaly, & Karen Maex. (2005). Lateral solvent diffusion characterization of low k dielectric plasma damage and ALD barrier film closure. Microelectronic Engineering. 82(3-4). 411–415. 8 indexed citations
6.
Travaly, Youssef, Jörg Schuhmacher, Thomas Abell, et al.. (2005). Characterization of atomic layer deposited nanoscale structure on dense dielectric substrates by X-ray reflectivity. Microelectronic Engineering. 82(3-4). 639–644. 5 indexed citations
7.
Travaly, Youssef, Jörg Schuhmacher, M. Van Hove, et al.. (2005). Interface characterization of nanoscale laminate structures on dense dielectric substrates by x-ray reflectivity. 11(16). 2 indexed citations
8.
Iacopi, Francesca, Sywert Brongersma, Herbert Struyf, et al.. (2005). Surface acoustic waves as a technique for in-line detection of processing damage to low-k dielectrics. 217–219. 3 indexed citations
9.
Travaly, Youssef, Jörg Schuhmacher, M. Van Hove, et al.. (2005). Interface characterization of nanoscale laminate structures on dense dielectric substrates by x-ray reflectivity. Journal of Applied Physics. 97(8). 18 indexed citations
10.
Abell, Thomas, Francesca Iacopi, Youssef Travaly, et al.. (2005). Comparison of modulus and density measurements by nanoidentation, SAWS, XRR and EP techniques of a porous low k MSQ dielectric. 2 indexed citations
11.
Abell, Thomas, Kristof Houthoofd, Francesca Iacopi, Piet J. Grobet, & Karen Maex. (2005). Solid state MAS NMR spectroscopic characterization of plasma damage and UV modification of low k dielectric films. MRS Proceedings. 863. 1 indexed citations
12.
Shamiryan, Denis, Thomas Abell, Francesca Iacopi, & Karen Maex. (2004). Low-k dielectric materials. Materials Today. 7(1). 34–39. 319 indexed citations
13.
Abell, Thomas, Jörg Schuhmacher, Youssef Travaly, & Karen Maex. (2004). Nucleation and Growth Dependence of ALD WNC on Substrate Surface Condition. MRS Proceedings. 812. 2 indexed citations
14.
Abell, Thomas & Karen Maex. (2004). Damage minimized plasma pore sealing of microporous low k dielectrics. Microelectronic Engineering. 76(1-4). 16–19. 27 indexed citations
15.
Besling, W.F.A., A. Satta, Jörg Schuhmacher, et al.. (2003). Atomic layer deposition of barriers for interconnect. 288–291. 4 indexed citations
16.
Shamiryan, Denis, Thomas Abell, Quoc Toan Le, & Karen Maex. (2003). Pinhole density measurements of barriers deposited on low-k films. Microelectronic Engineering. 70(2-4). 341–345. 9 indexed citations
17.
Abell, Thomas, Denis Shamiryan, Matthias Patz, & Karen Maex. (2003). Correlation between solvent diffusion, porosity and pore sealing for low k dielectrics. 1 indexed citations
18.
Lee, Jeffrey A., et al.. (2003). Integration Challenges for Chemical Mechanical Polishing of Cu/Low-κ Interconnects. MRS Proceedings. 767. 2 indexed citations
19.
Abell, Thomas, et al.. (2002). Precursor penetration and sealing for CVD SiCOH low k dielectric during atomic layer deposition of WCN barrier. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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