Boon Teik Chan

1.2k citations

48 papers · 621 indexed · h-index 14

Impact in

Electrical and Electronic Engineering top 10%
- Semiconductor materials and devices
- Advancements in Photolithography Techniques
- Ferroelectric and Negative Capacitance Devices
- Advanced Memory and Neural Computing
- Advancements in Semiconductor Devices and Circuit Design
Surfaces, Coatings and Films top 10%

Papers in

Electrical and Electronic Engineering 44
- Advancements in Photolithography Techniques 24
- Semiconductor materials and devices 16
- Advancements in Semiconductor Devices and Circuit Design 8
- Integrated Circuits and Semiconductor Failure Analysis 4
- Ferroelectric and Negative Capacitance Devices 4
Materials Chemistry 28
- Block Copolymer Self-Assembly 25

Co-authors: Roel Gronheid Annelies Delabie Yoann Tomczak Efrain Altamirano Sánchez Gregory N. Parsons Guanyang Lin Joost Bekaert Yi Cao
Journals: Journal of Micro/Nanolithography MEMS and MOEMS (5 papers)IEEE Transactions on Electron Devices (3 papers)Japanese Journal of Applied Physics (2 papers)Journal of Photopolymer Science and Technology (2 papers)Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2 papers)
Partner nations: Belgium United States Japan

In The Last Decade

Boon Teik Chan

48 papers receiving 605 citations

Peers

Countries citing papers authored by Boon Teik Chan

Since Specialization

Citations

This map shows the geographic impact of Boon Teik Chan's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Boon Teik Chan with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Boon Teik Chan more than expected).

Fields of papers citing papers by Boon Teik Chan

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Boon Teik Chan. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Boon Teik Chan. The network helps show where Boon Teik Chan may publish in the future.

Co-authors

The 25 scholars most cited alongside Boon Teik Chan, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Boon Teik Chan Line = papers co-authored together Boon Teik Chan links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	CFET SRAM With Double-Sided Interconnect Design and DTCO Benchmark IEEE Transactions on Electron Devices ·Hsiao-Hsuan Liu, P. Schuddinck, Zhenlin Pei, Lynn Verschueren, Hans Mertens, Shairfe Muhammad Salahuddin, Gaspard Hiblot, Yang Xiang, Boon Teik Chan, Sujith Subramanian, Pieter Weckx, Geert Hellings, M. Garcia Bardon, Julien Ryckaert, Chenyun Pan, Francky Catthoor	2023	8
2	Challenges for spacer and source/drain cavity patterning in CFET devices G. Mannaert, Hans Mertens, Maryam Hosseini, S. Demuynck, Vy Thi Hoang Nguyen, Boon Teik Chan, Frédéric Lazzarino	2023	3
3	Middle-of-line plasma dry etch challenges for CFET integration D. Radisic, Maryam Hosseini, Hans Mertens, Daisy Zhou, Victor Vega Gonzalez, Shouhua Wang, Boon Teik Chan, Dmitry Batuk, Emmanuel Dupuy, Zheng Tao, E. Dentoni Litta, Naoto Horiguchi	2023	1
4	DTCO of sequential and monolithic CFET SRAM Hsiao-Hsuan Liu, Shairfe Muhammad Salahuddin, Boon Teik Chan, P. Schuddinck, Yang Xiang, Pieter Weckx, Geert Hellings, Francky Catthoor	2023	5
5	Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration Materials Advances ·Ivan Zyulkov, Е. Н. Воронина, Mikhail Krishtab, D. G. Voloshin, Boon Teik Chan, Yu. A. Mankelevich, Т. В. Рахимова, Silvia Armini, Stefan De Gendt	2020	10
6	Insight into Selective Surface Reactions of Dimethylamino-trimethylsilane for Area-Selective Deposition of Metal, Nitride, and Oxide The Journal of Physical Chemistry C ·Job Soethoudt, Yoann Tomczak, Ben Meynaerts, Boon Teik Chan, Annelies Delabie	2020	48
7	High-throughput process chain for single electron transistor devices based on field-emission scanning probe lithography and Smart Nanoimprint lithography technology Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Claudia Lenk, Yana Krivoshapkina, Martin Hofmann, Steve Lenk, Tzvetan Ivanov, Ivo W. Rangelow, Ahmad Ahmad, Alexander Reum, Mathias Holz, T. Glinsner, Martin Eibelhuber, D. Treiblmayr, Barbara Schamberger, Mustapha Chouiki, Boon Teik Chan, Ziad El Otell, Jean‐François de Marneffe	2019	4
8	Area-Selective Atomic Layer Deposition of TiN, TiO₂, and HfO₂ on Silicon Nitride with inhibition on Amorphous Carbon Chemistry of Materials ·Eric C. Stevens, Yoann Tomczak, Boon Teik Chan, Efrain Altamirano Sánchez, Gregory N. Parsons, Annelies Delabie	2018	73
9	Dual brush process for selective surface modification in graphoepitaxy directed self-assembly Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jan Doise, Boon Teik Chan, Masafumi Hori, Roel Gronheid	2017	3
10	Influence of template fill in graphoepitaxy DSA Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jan Doise, Joost Bekaert, Boon Teik Chan, Sung-Eun Hong, Guanyang Lin, Roel Gronheid	2016	3
11	Influence of block copolymer composition in grapho-epitaxy directed self-assembly for contact hole multiplication Lirias (KU Leuven) ·Jan Doise, Boon Teik Chan, Masafumi Hori, Roel Gronheid	2016	1
12	Integration of a templated directed self-assembly-based hole shrink in a short loop via chain Journal of Micro/Nanolithography MEMS and MOEMS ·Paulina A. Rincon-Delgadillo, Boon Teik Chan, Jan Doise, Marleen van der Veen, N. Heylen, S. Demuynck, Juergen Boemmels, Roel Gronheid	2016	3
13	Impact of sequential infiltration synthesis on pattern fidelity of DSA lines Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Arjun Singh, W. Knaepen, Şafak Sayan, Ziad El Otell, Boon Teik Chan, Jan Willem Maes, Roel Gronheid	2015	11
14	Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Hari Pathangi, Boon Teik Chan, Hareen Bayana, Nadia Vandenbroeck, Dieter Van den Heuvel, Lieve Van Look, Paulina A. Rincon-Delgadillo, Yi Cao, Jihoon Kim, Guanyang Lin, Doni Parnell, Kathleen Nafus, Ryota Harukawa, Ito Chikashi, Venkat Nagaswami, Lucia D’Urzo, Roel Gronheid, Paul F. Nealey	2015	12
15	Implementation of templated DSA for via layer patterning at the 7nm node Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Roel Gronheid, Jan Doise, Joost Bekaert, Boon Teik Chan, Ioannis Karageorgos, Julien Ryckaert, Geert Vandenberghe, Yi Cao, Guanyang Lin, Mark Somervell, Germain Fenger, Daisuke Fuchimoto	2015	23
16	Patterning sub-25nm half-pitch hexagonal arrays of contact holes with chemo-epitaxial DSA guided by ArFi pre-patterns Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Arjun Singh, Boon Teik Chan, Doni Parnell, Hengpeng Wu, Jian Yin, Yi Cao, Roel Gronheid	2015	6
17	28 nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy Directed Self-Assembly (DSA) process flow Microelectronic Engineering ·Boon Teik Chan, Shigeru Tahara, Doni Parnell, Paulina A. Rincon Delgadillo, Roel Gronheid, Jean‐François de Marneffe, Kaidong Xu, Eiichi Nishimura, Werner Boullart	2014	12
18	Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Joost Bekaert, Jan Doise, Vijaya-Kumar Murugesan Kuppuswamy, Roel Gronheid, Boon Teik Chan, Geert Vandenberghe, Yi Cao, YoungJun Her	2014	13
19	Progress in directed self-assembly hole shrink applications Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Todd R. Younkin, Roel Gronheid, Paulina Rincon Delgadillo, Boon Teik Chan, Nadia Vandenbroeck, S. Demuynck, Ainhoa Romo-Negreira, Doni Parnell, Kathleen Nafus, Shigeru Tahara, Mark Somervell	2013	16
20	Rectification of EUV-patterned contact holes using directed self-assembly Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Roel Gronheid, Arjun Singh, Todd R. Younkin, Paulina Rincon Delgadillo, Paul F. Nealey, Boon Teik Chan, Kathleen Nafus, Ainhoa Romo Negreira, Mark Somervell	2013	18

About Boon Teik Chan

Boon Teik Chan is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Surfaces, Coatings and Films, Biomedical Engineering and Electronic, Optical and Magnetic Materials, having authored 48 papers that have together received 621 indexed citations. Recurring topics across this work include Block Copolymer Self-Assembly (25 papers), Advancements in Photolithography Techniques (24 papers), Nanofabrication and Lithography Techniques (19 papers), Semiconductor materials and devices (16 papers), Advancements in Semiconductor Devices and Circuit Design (8 papers), Copper Interconnects and Reliability (4 papers), Integrated Circuits and Semiconductor Failure Analysis (4 papers) and Ferroelectric and Negative Capacitance Devices (4 papers). The work is most often cited by research in Electrical and Electronic Engineering (505 citations), Surfaces, Coatings and Films (55 citations), Materials Chemistry (333 citations), Biomedical Engineering (142 citations) and Electronic, Optical and Magnetic Materials (54 citations). Boon Teik Chan has collaborated with scholars based in Belgium, United States and Japan. Frequent co-authors include Roel Gronheid, Annelies Delabie, Yoann Tomczak, Efrain Altamirano Sánchez, Gregory N. Parsons, Guanyang Lin, Joost Bekaert, Yi Cao, Attilio Belmonte and Paul F. Nealey. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, IEEE Transactions on Electron Devices, Japanese Journal of Applied Physics, Journal of Photopolymer Science and Technology and Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.

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