T. Glinsner

739 total citations
45 papers, 550 citations indexed

About

T. Glinsner is a scholar working on Biomedical Engineering, Electrical and Electronic Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, T. Glinsner has authored 45 papers receiving a total of 550 indexed citations (citations by other indexed papers that have themselves been cited), including 38 papers in Biomedical Engineering, 35 papers in Electrical and Electronic Engineering and 6 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in T. Glinsner's work include Nanofabrication and Lithography Techniques (38 papers), Advancements in Photolithography Techniques (22 papers) and 3D IC and TSV technologies (12 papers). T. Glinsner is often cited by papers focused on Nanofabrication and Lithography Techniques (38 papers), Advancements in Photolithography Techniques (22 papers) and 3D IC and TSV technologies (12 papers). T. Glinsner collaborates with scholars based in Austria, Germany and Japan. T. Glinsner's co-authors include Paul Lindner, Ulrich Plachetka, Viorel Drăgoi, Markus Bender, H. Kurz, Andreas Fuchs, Iris Bergmair, M. Mühlberger, Jianhua Ran and B. Vratzov and has published in prestigious journals such as Nature Photonics, Applied Physics A and European Food Research and Technology.

In The Last Decade

T. Glinsner

45 papers receiving 513 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
T. Glinsner Austria 13 411 333 117 60 41 45 550
F. Reuther Germany 15 465 1.1× 328 1.0× 180 1.5× 64 1.1× 67 1.6× 45 660
Michael Hornung Germany 10 348 0.8× 247 0.7× 80 0.7× 93 1.6× 33 0.8× 23 516
M. Beck Sweden 11 381 0.9× 261 0.8× 135 1.2× 56 0.9× 47 1.1× 18 452
Samuli Siitonen Finland 13 189 0.5× 142 0.4× 64 0.5× 81 1.4× 33 0.8× 28 383
Paul Lindner Austria 11 133 0.3× 269 0.8× 42 0.4× 13 0.2× 54 1.3× 61 432
N. Pérez Spain 11 164 0.4× 264 0.8× 79 0.7× 72 1.2× 136 3.3× 23 506
Timothy B. Michaelson United States 5 447 1.1× 407 1.2× 153 1.3× 78 1.3× 24 0.6× 5 522
Yuanrui Li China 10 121 0.3× 202 0.6× 65 0.6× 14 0.2× 80 2.0× 24 415
Aydin Sabouri United Kingdom 12 346 0.8× 436 1.3× 117 1.0× 28 0.5× 38 0.9× 16 653

Countries citing papers authored by T. Glinsner

Since Specialization
Citations

This map shows the geographic impact of T. Glinsner's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T. Glinsner with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T. Glinsner more than expected).

Fields of papers citing papers by T. Glinsner

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by T. Glinsner. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T. Glinsner. The network helps show where T. Glinsner may publish in the future.

Co-authorship network of co-authors of T. Glinsner

This figure shows the co-authorship network connecting the top 25 collaborators of T. Glinsner. A scholar is included among the top collaborators of T. Glinsner based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with T. Glinsner. T. Glinsner is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Lenk, Claudia, Martin Hofmann, Steve Lenk, et al.. (2019). High-throughput process chain for single electron transistor devices based on field-emission scanning probe lithography and Smart Nanoimprint lithography technology. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 37(2). 4 indexed citations
2.
Uhrmann, Thomas, et al.. (2014). Monolithic IC integration key alignment aspects for high process yield. 1–2. 4 indexed citations
3.
Lindner, Paul, T. Glinsner, Thomas Uhrmann, et al.. (2012). Key enabling processes for more-than-moore technologies. 1–2. 2 indexed citations
4.
Glinsner, T., et al.. (2010). Nanoimprint Lithography. Optik & Photonik. 5(2). 42–45. 7 indexed citations
5.
Glinsner, T., et al.. (2010). High accuracy UV-nanoimprint lithography step-and-repeat master stamp fabrication for wafer level camera application. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 28(6). C6M57–C6M62. 7 indexed citations
6.
Glinsner, T., et al.. (2009). Making a good impression. Nature Photonics. 4(1). 27–28. 19 indexed citations
7.
8.
Mühlberger, M., Iris Bergmair, Wolfgang Schwinger, et al.. (2007). A Moiré method for high accuracy alignment in nanoimprint lithography. Microelectronic Engineering. 84(5-8). 925–927. 27 indexed citations
9.
Mühlberger, M., Wolfgang Schwinger, T. Glinsner, et al.. (2007). High Precision Alignment in Multi-Layer NanoImprint Lithography. AIP conference proceedings. 893. 1495–1496. 2 indexed citations
10.
Glinsner, T., Ulrich Plachetka, T. Matthias, Markus Wimplinger, & Paul Lindner. (2007). Soft UV-based nanoimprint lithography for large-area imprinting applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6517. 651718–651718. 9 indexed citations
11.
Glinsner, T., Paul Lindner, M. Mühlberger, et al.. (2007). Fabrication of 3D-photonic crystals via UV-nanoimprint lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 25(6). 2337–2340. 15 indexed citations
12.
Mizuno, J., Tomochika Harada, T. Glinsner, et al.. (2006). Fabrications of Micro-Channel Device by Hot Emboss and Direct Bonding of PMMA. 26–29. 10 indexed citations
13.
Glinsner, T., Stephen C. Jakeway, H. John Crabtree, et al.. (2005). Transition of MEMS Technology to Nanofabrication. Journal of Nanoscience and Nanotechnology. 5(6). 864–868. 10 indexed citations
14.
Mizuno, J., Hiroyasu Ishida, Shari Farrens, et al.. (2005). Cyclo-Olefin polymer direct bonding using low temperature plasma activation bonding. 2. 1346–1349. 22 indexed citations
15.
Jakeway, Stephen C., et al.. (2004). Transition of MEMS technology to nanofabrication. 3680. 118–122. 1 indexed citations
16.
Bender, Markus, Ulrich Plachetka, Jianhua Ran, et al.. (2004). High resolution lithography with PDMS molds. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(6). 3229–3232. 87 indexed citations
17.
Wissen, M., H. Schulz, N. Bogdanski, et al.. (2004). Impact of residual layer uniformity on UV stabilization after embossing. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(6). 3224–3228. 5 indexed citations
18.
Wissen, M., et al.. (2003). Impact of vacuum environment on the hot embossing process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5037. 211–211. 13 indexed citations
19.
Lindner, Paul, et al.. (2003). One micron precision optically aligned method for hot-embossing and nanoimprinting. 2. 931–935. 4 indexed citations
20.
Glinsner, T., et al.. (2001). Reversible and Permanent Wafer Bonding for GaAs Processing. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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