Mikhail Krishtab

798 citations

35 papers · 703 indexed · h-index 15

Impact in

Electronic, Optical and Magnetic Materials top 10%
- Copper Interconnects and Reliability
Inorganic Chemistry top 10%
- Metal-Organic Frameworks: Synthesis and Applications

Papers in

Electronic, Optical and Magnetic Materials 29
- Copper Interconnects and Reliability 29
Mechanics of Materials 16
- Metal and Thin Film Mechanics 14

Co-authors: Silvia Armini Stefan De Gendt Mikhaı̈l R. Baklanov Rob Ameloot Timothée Stassin Ivo Stassen Alexander John Cruz Oguzhan Orkut Okudur
Journals: Applied Physics Letters (5 papers)Microelectronic Engineering (4 papers)Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (3 papers)ACS Applied Materials & Interfaces (2 papers)ECS Journal of Solid State Science and Technology (2 papers)
Partner nations: Belgium Russia Germany

In The Last Decade

Mikhail Krishtab

34 papers receiving 691 citations

Peers

Countries citing papers authored by Mikhail Krishtab

Since Specialization

Citations

This map shows the geographic impact of Mikhail Krishtab's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mikhail Krishtab with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mikhail Krishtab more than expected).

Fields of papers citing papers by Mikhail Krishtab

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Mikhail Krishtab. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mikhail Krishtab. The network helps show where Mikhail Krishtab may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Mikhail Krishtab, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Mikhail Krishtab Line = papers co-authored together Mikhail Krishtab links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Inorganic capping layers in advanced photosensitive polymer based RDL processes: processing and reliability Zhu Bi-ren, Vineet Augustine, Ritwik Bhatia, Ganesh Sundaram, John Slabbekoorn, Mikhail Krishtab, Andy Miller, Eric Beyne	2023	3
2	Porosimetry for Thin Films of Metal–Organic Frameworks: A Comparison of Positron Annihilation Lifetime Spectroscopy and Adsorption‐Based Methods Advanced Materials ·Timothée Stassin, Rhea Verbeke, Alexander John Cruz, Sabina Rodríguez‐Hermida, Ivo Stassen, João Marreiros, Mikhail Krishtab, Marcel Dickmann, Werner Egger, Ivo F.J. Vankelecom, Shuhei Furukawa, Dirk De Vos, David Grosso, Matthias Thommes, Rob Ameloot	2021	72
3	Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration Materials Advances ·Arnold George Lee, Е. Н. Воронина, Mikhail Krishtab, D. G. Voloshin, Boon Teik Chan, Yu. A. Mankelevich, Т. В. Рахимова, Silvia Armini, Stefan De Gendt	2020	10
4	Integrated Cleanroom Process for the Vapor-Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films Chemistry of Materials ·Alexander John Cruz, Ivo Stassen, Mikhail Krishtab, Kristof Marcoen, Timothée Stassin, Sabina Rodríguez‐Hermida, Joan Teyssandier, Sven Pletincx, Rhea Verbeke, Víctor Rubio‐Giménez, Sergio Tatay, Carlos Martí‐Gastaldo, Johan Meersschaut, Philippe M. Vereecken, Steven De Feyter, Tom Hauffman, Rob Ameloot	2019	68
5	Vapor-deposited zeolitic imidazolate frameworks as gap-filling ultra-low-k dielectrics Nature Communications ·Mikhail Krishtab, Ivo Stassen, Timothée Stassin, Alexander John Cruz, Oguzhan Orkut Okudur, Silvia Armini, Ricardo Farias de Almeida, Stefan De Gendt, Rob Ameloot	2019	137
6	Metal barrier induced damage in self-assembly based organosilica low-k dielectrics and its reduction by organic template residues Applied Surface Science ·Mikhail Krishtab, Jean‐François de Marneffe, Silvia Armini, Johan Meersschaut, H. Bender, Christopher Wilson, Stefan De Gendt	2019	8
7	On the mechanical and electrical properties of self-assembly-based organosilicate porous films Journal of Materials Chemistry C ·Tom F. Driver, Silvia Armini, Thomas Berger, 黄建维, Mikhail Krishtab, Kris Vanstreels, Sigrid Bernstorff, Pascal Van Der Voort	2017	8
8	Impact of organic linking and terminal groups on the mechanical properties of self-assembly based low-k dielectrics Applied Physics Letters ·Kris Vanstreels, Mikhail Krishtab, L. García-González, Silvia Armini	2017	6
9	On-chip interconnect trends, challenges and solutions: How to keep RC and reliability under control Zs. Tôkei, Ivan Ciofi, Ph. Roussel, Peter Debacker, Prasanth Raghavan, Marleen H. van der Veen, N. Jourdan, Christopher Wilson, Endang Susanti, Christoph Adelmann, Lianggong Wen, Kristof Croes, B Poppi, Mikhail Krishtab, Silvia Armini, J. Bömmels	2016	17
10	UV cure of oxycarbosilane low-k films Microelectronic Engineering ·Tom F. Driver, Lutz Prager, Mikhail Krishtab, Silvia Armini, Kris Vanstreels, Alexis Franquet, Pascal Van Der Voort, Mikhaı̈l R. Baklanov	2016	8
11	Surface-confined activation of ultra low-k dielectrics in CO2 plasma Applied Physics Letters ·T. L. Harman, Mikhail Krishtab, Yu. A. Mankelevich, Liping Zhang, Steven De Feyter, Mikhaı̈l R. Baklanov, Silvia Armini	2016	12
12	Effect of the C-bridge length on the ultraviolet-resistance of oxycarbosilane low-k films Applied Physics Letters ·Tom F. Driver, Lutz Prager, S. Naumov, Mikhail Krishtab, Silvia Armini, Pascal Van Der Voort, Mikhaı̈l R. Baklanov	2016	12
13	Improvement of cohesion strength in ULK OSG materials by pore structure adjustment Microelectronic Engineering ·Mikhail Krishtab, Kris Vanstreels, John W. Van Meter, K. Matsunaga, Stefan De Gendt, Mikhaı̈l R. Baklanov	2015	5
14	Post-etch template removal strategy for reduction of plasma induced damage in spin-on OSG low-k dielectrics Mikhail Krishtab, Kris Vanstreels, Stefan De Gendt, Mikhaı̈l R. Baklanov	2015	2
15	Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics Journal of Applied Physics ·Jean‐François de Marneffe, Yunjun Yang, Markus Heyne, Mikołaj Łukaszewicz, MF Harris, 尚哉国貞, Soojung 안수정Ahn, 沈福馨, Mikhail Krishtab, Andy Goodyear, Mike Cooke, Patrick Verdonck, Mikhaı̈l R. Baklanov	2015	22
16	Dependence of dielectric constant of SiOCH low-k films on porosity and pore size Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·美貞金, Т. В. Рахимова, Mikhail Krishtab, Mikhaı̈l R. Baklanov	2015	16
17	Fractally aggregated micro- and nanosystems synthesized from sols Glass Physics and Chemistry ·Gunnar Axberger, В. А. Мошников, Mikhail Krishtab, И. А. Пронин	2014	13
18	Impact of Plasma Pretreatment and Pore Size on the Sealing of Ultra-Low-k Dielectrics by Self-Assembled Monolayers Langmuir ·T. L. Harman, Mikhail Krishtab, Herbert Struyf, Patrick Verdonck, Steven De Feyter, Mikhaı̈l R. Baklanov, Silvia Armini	2014	30
19	Study of Wet Surface Activation Routes to Enable the Deposition of Monomolecular Organic Thin Films on k 2.0 Porous Dielectrics ECS Journal of Solid State Science and Technology ·Silvia Armini, 江恒, Mikhail Krishtab, Thierry Conard, Johan Meersschaut, Quoc Toan Le, Patrick Verdonck, Mikhaı̈l R. Baklanov	2014	7
20	Pore sealing of k 2.0 dielectrics assisted by self-assembled monolayers deposited from vapor phase Microelectronic Engineering ·Silvia Armini, 江恒, Mikhail Krishtab, Johan Swerts, Patrick Verdonck, Johan Meersschaut, Thierry Conard, M. A. Blauw, Herbert Struyf, Mikhaı̈l R. Baklanov	2013	21

About Mikhail Krishtab

Mikhail Krishtab is a scholar working on Electronic, Optical and Magnetic Materials, Mechanics of Materials, Electrical and Electronic Engineering, Ceramics and Composites and Inorganic Chemistry, having authored 35 papers that have together received 703 indexed citations. Recurring topics across this work include Copper Interconnects and Reliability (29 papers), Semiconductor materials and devices (29 papers), Metal and Thin Film Mechanics (14 papers), Mesoporous Materials and Catalysis (5 papers), Molecular Junctions and Nanostructures (5 papers), Metal-Organic Frameworks: Synthesis and Applications (3 papers), Corrosion Behavior and Inhibition (2 papers) and Silicone and Siloxane Chemistry (2 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (325 citations), Inorganic Chemistry (167 citations), Electrical and Electronic Engineering (442 citations), Ceramics and Composites (41 citations) and Materials Chemistry (304 citations). Mikhail Krishtab has collaborated with scholars based in Belgium, Russia and Germany. Frequent co-authors include Silvia Armini, Stefan De Gendt, Mikhaı̈l R. Baklanov, Rob Ameloot, Timothée Stassin, Ivo Stassen, Alexander John Cruz, Oguzhan Orkut Okudur, Johan Meersschaut and Patrick Verdonck. Their work appears in journals such as Applied Physics Letters, Microelectronic Engineering, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, ACS Applied Materials & Interfaces and ECS Journal of Solid State Science and Technology.

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