Alexander Reum
About
Alexander Reum is a scholar working on Atomic and Molecular Physics, and Optics, Biomedical Engineering and Electrical and Electronic Engineering.
According to data from OpenAlex, Alexander Reum has authored 25 papers receiving a total of 343 indexed citations (citations by other indexed papers that have themselves been cited), including 23 papers in Atomic and Molecular Physics, and Optics, 16 papers in Biomedical Engineering and 15 papers in Electrical and Electronic Engineering. Recurrent topics in Alexander Reum's work include Force Microscopy Techniques and Applications (23 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers) and Nanofabrication and Lithography Techniques (7 papers). Alexander Reum is often cited by papers focused on Force Microscopy Techniques and Applications (23 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers) and Nanofabrication and Lithography Techniques (7 papers). Alexander Reum collaborates with scholars based in Germany, United States and Poland. Alexander Reum's co-authors include Ivo W. Rangelow, Tzvetan Ivanov, Mathias Holz, Ahmad Ahmad, Marcus Kaestner, Claudia Lenk, Steve Lenk, Elshad Guliyev, Martin Hofmann and Manuel Höfer and has published in prestigious journals such as Nano Letters, Sensors and Actuators A Physical and Applied Physics A.
In The Last Decade
Alexander Reum
24 papers receiving 340 citations
Peers
Alexander Reum
R. Brockenbrough United States
Andrzej Sierakowski Poland
N. Abedinov Germany
Zhikang Zhou China
M. G. R. Thomson United States
Lee Smith United States
S. Sivakumar United States
Albert K. Henning United States
Kathy Barla Belgium
Pratyush Das Kanungo Switzerland
Citations per year, relative to Alexander Reum Alexander Reum (= 1×)
peers
R. Brockenbrough
Countries citing papers authored by Alexander Reum
Since
Specialization
Citations
This map shows the geographic impact of Alexander Reum's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Alexander Reum with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Alexander Reum more than expected).
Fields of papers citing papers by Alexander Reum
Since
Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences
This network shows the impact of papers produced by Alexander Reum. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Alexander Reum. The network helps show where Alexander Reum may publish in the future.
Co-authorship network of co-authors of Alexander Reum
This figure shows the co-authorship network connecting the top 25 collaborators of Alexander Reum. A scholar is included among the top collaborators of Alexander Reum based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Alexander Reum. Alexander Reum is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
1.
Randall, John N., Joshua B. Ballard, James H. G. Owen, et al.. (2021). Advanced Scanning Probe Nanolithography Using GaN Nanowires. Nano Letters. 21(13). 5493–5499.
2.
Rishinaramangalam, Ashwin K., Daniel Feezell, Tito Busani, et al.. (2020). Field emission scanning probe lithography with GaN nanowires on active cantilevers. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 38(3).
3.
Holz, Mathias, Ahmad Ahmad, Alexander Reum, et al.. (2019). Correlative Microscopy and Nanofabrication with AFM Integrated with SEM. Microscopy Today. 27(6). 24–30.
4.
Holz, Mathias, Alexander Reum, Ahmad Ahmad, et al.. (2019). Atomic force microscope integrated into a scanning electron microscope for fabrication and metrology at the nanometer scale. 51–51.
5.
Holz, Mathias, Frances I. Allen, Ahmad Ahmad, et al.. (2019). Tip-based electron beam induced deposition using active cantilevers. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 37(6).
6.
Lenk, Claudia, Martin Hofmann, Steve Lenk, et al.. (2019). High-throughput process chain for single electron transistor devices based on field-emission scanning probe lithography and Smart Nanoimprint lithography technology. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 37(2).
7.
Holz, Mathias, Alexander Reum, Ahmad Ahmad, et al.. (2019). High throughput AFM inspection system with parallel active cantilevers. 50–50.
8.
Lenk, Claudia, Martin Hofmann, Steve Lenk, et al.. (2018). Nanofabrication by field-emission scanning probe lithography and cryogenic plasma etching. Microelectronic Engineering. 192. 77–82.
9.
Rangelow, Ivo W., Martin Hofmann, Tzvetan Ivanov, et al.. (2018). Single nano-digit and closed-loop scanning probe lithography for manufacturing of electronic and optical nanodevices. 66–66.
10.
Rangelow, Ivo W., Marcus Kaestner, Tzvetan Ivanov, et al.. (2018). Atomic force microscope integrated with a scanning electron microscope for correlative nanofabrication and microscopy. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 36(6).
11.
Lenk, Claudia, Martin Hofmann, Tzvetan Ivanov, et al.. (2018). Sharp GaN nanowires used as field emitter on active cantilevers for scanning probe lithography. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 36(6).
12.
Holz, Mathias, Elshad Guliyev, Ahmad Ahmad, et al.. (2018). Field-emission scanning probe lithography tool for 150 mm wafer. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 36(6).
13.
Ahmad, Abdul Razak, Tzv. Ivanov, Alexander Reum, et al.. (2018). Thermomechanically and electromagnetically actuated piezoresistive cantilevers for fast-scanning probe microscopy investigations. Sensors and Actuators A Physical. 276. 237–245.
14.
Hofmann, Martin, Claudia Lenk, Tzvetan Ivanov, et al.. (2018). Field emission from diamond nanotips for scanning probe lithography. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 36(6).
15.
Rangelow, Ivo W., Tzvetan Ivanov, Ahmad Ahmad, et al.. (2017). Review Article: Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 35(6).
16.
Ahmad, Ahmad, Elshad Guliyev, Alexander Reum, et al.. (2016). Six-axis AFM in SEM with self-sensing and self-transduced cantilever for high speed analysis and nanolithography. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 34(6).
17.
Guliyev, Elshad, Ivan Buliev, Marcus Kaestner, et al.. (2016). Scanning probe-based high-accuracy overlay alignment concept for lithography applications. Applied Physics A. 123(1).
18.
Kaestner, Marcus, Tzvetan Ivanov, Ahmad Ahmad, et al.. (2015). Advanced electric-field scanning probe lithography on molecular resist using active cantilever. Journal of Micro/Nanolithography MEMS and MOEMS. 14(3). 31202–31202.
19.
Kaestner, Marcus, Tzvetan Ivanov, Steve Lenk, et al.. (2015). Advanced electric-field scanning probe lithography on molecular resist using active cantilever. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9423. 94230E–94230E.
20.
Kaestner, Marcus, Tzvetan Ivanov, Steve Lenk, et al.. (2014). Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9049. 90490C–90490C.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.
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