Ravi Bonam

494 total citations
36 papers, 393 citations indexed

About

Ravi Bonam is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Industrial and Manufacturing Engineering. According to data from OpenAlex, Ravi Bonam has authored 36 papers receiving a total of 393 indexed citations (citations by other indexed papers that have themselves been cited), including 34 papers in Electrical and Electronic Engineering, 18 papers in Surfaces, Coatings and Films and 7 papers in Industrial and Manufacturing Engineering. Recurrent topics in Ravi Bonam's work include Advancements in Photolithography Techniques (23 papers), Integrated Circuits and Semiconductor Failure Analysis (18 papers) and Electron and X-Ray Spectroscopy Techniques (15 papers). Ravi Bonam is often cited by papers focused on Advancements in Photolithography Techniques (23 papers), Integrated Circuits and Semiconductor Failure Analysis (18 papers) and Electron and X-Ray Spectroscopy Techniques (15 papers). Ravi Bonam collaborates with scholars based in United States, Japan and Germany. Ravi Bonam's co-authors include John G. Hartley, Timothy A. Starkey, Timothy J. Bunning, James C. Grande, Michael Due Larsen, Rajesh R. Naik, Zhexiong Tang, Radislav A. Potyrailo, Milana Vasudev and Peter Vukusic and has published in prestigious journals such as Nature Communications, IEEE Transactions on Semiconductor Manufacturing and Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.

In The Last Decade

Ravi Bonam

34 papers receiving 373 citations

Peers

Countries citing papers authored by Ravi Bonam

Since Specialization

Citations

This map shows the geographic impact of Ravi Bonam's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ravi Bonam with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ravi Bonam more than expected).

Fields of papers citing papers by Ravi Bonam

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ravi Bonam. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ravi Bonam. The network helps show where Ravi Bonam may publish in the future.

Co-authorship network of co-authors of Ravi Bonam

This figure shows the co-authorship network connecting the top 25 collaborators of Ravi Bonam. A scholar is included among the top collaborators of Ravi Bonam based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ravi Bonam. Ravi Bonam is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	D2W and W2W Hybrid Bonding System with Below 2.5 Micron Pitch for 3D Chiplet AI Applications 2024 ·Katsuyuki Sakuma, (unknown), (unknown), Arvind Kumar, (unknown), Michael Belyansky, (unknown), Ravi Bonam, (unknown), (unknown), (unknown), Hemanth Jagannathan	1
2	Signal and Power Integrity Design and Analysis for Bunch-of-Wires (BoW) Interface for Chiplet Integration on Advanced Packaging 2023 ·(unknown), Atom O. Watanabe, John Golz, Ravi Bonam, Frank Libsch, Elyse Rosenbaum, Arvind Kumar	3
3	Direct Bonded Heterogeneous Integration (DBHi) Si Bridge 2021 ·Kamal Sikka, Ravi Bonam, Yang Liu, Paul Andry, Dishit P. Parekh, (unknown), (unknown), R. Divakaruni, (unknown), (unknown), (unknown), (unknown), Hongqing Zhang, (unknown), (unknown), Hiroyuki Mori, Sayuri Kohara	31
4	Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch 2020 ·Journal of Micro/Nanolithography MEMS and MOEMS ·(unknown), Luciana Meli, Jing Guo, Martin Burkhardt, Chris A. Mack, Anuja De Silva, Karen Petrillo, (unknown), Ravi Bonam, (unknown), Eric S. Miller, (unknown), (unknown), Nelson Felix	4
5	Engineering neural networks for improved defect detection and classification 2019 ·Dhruv Patel, Ravi Bonam, Assad A. Oberai	4
6	Printability and actinic AIMS review of programmed mask blank defects 2017 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Pawitter J. S. Mangat, Obert R. Wood, (unknown), Yulu Chen, (unknown), (unknown), (unknown), (unknown), Ravi Bonam, (unknown), Nelson Felix, Daniel Corliss	7
7	Comprehensive analysis of line-edge and line-width roughness for EUV lithography 2017 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ravi Bonam, Chi‐Chun Liu, (unknown), Stuart Sieg, Indira Seshadri, Nicole Saulnier, Jeffrey C. Shearer, Raja Muthinti, R. Patlolla, Huai Huang	3
8	Detection of Printable EUV Mask Absorber Defects and Defect Adders by Full Chip Optical Inspection of EUV Patterned Wafers 2017 ·IEEE Transactions on Semiconductor Manufacturing ·Luciana Meli, Ravi Bonam, Scott Halle, Nelson Felix	3
9	Large area three dimensional structure fabrication using multilayer electron beam lithography 2016 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Ravi Bonam, John G. Hartley	4
10	Towards outperforming conventional sensor arrays with fabricated individual photonic vapour sensors inspired by Morpho butterflies 2015 ·Nature Communications ·Radislav A. Potyrailo, Ravi Bonam, John G. Hartley, Timothy A. Starkey, Peter Vukusic, Milana Vasudev, Timothy J. Bunning, Rajesh R. Naik, Zhexiong Tang, M.A. Palacios, Michael Due Larsen, (unknown), James C. Grande, Sheng Zhong, Tao Deng	189
11	ENDEAVOUR to understand EUV buried defect printability 2015 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), M. Kagawa, (unknown), (unknown), Karen Badger, Zhengqing John Qi, (unknown), (unknown), Ravi Bonam	5
12	Exploring EUV mask backside defectivity and control methods 2015 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), Ravi Bonam, (unknown), (unknown), (unknown), M. Kagawa	1
13	E-beam inspection of EUV mask defects: To etch or not to etch? 2014 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ravi Bonam, (unknown), (unknown), Scott Halle, Fei Wang, Daniel Corliss, Wei Fang, (unknown)	7
14	EUV mask black border evolution 2014 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Ravi Bonam, Emily Gallagher, (unknown), M. Kagawa, (unknown), (unknown), (unknown), (unknown)	7
15	Characterization of e-beam patterned grating structures using Mueller matrix based scatterometry 2013 ·Journal of Micro/Nanolithography MEMS and MOEMS ·(unknown), (unknown), Ravi Bonam, Alain C. Diebold	6
16	E-beam inspection of EUV programmed defect wafers for printability analysis 2013 ·Ravi Bonam, Scott Halle, Daniel Corliss, (unknown), Fei Wang, Wei Fang, (unknown)	5
17	Operation and performance of the CNSE Vistec VB300 electron beam lithography system 2010 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·John G. Hartley, T. R. Groves, Ravi Bonam, (unknown), (unknown), (unknown), (unknown), (unknown), (unknown)	4
18	Performance characterization of negative resists for sub-10-nm electron beam lithography 2010 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Ravi Bonam, (unknown), (unknown), John G. Hartley	16
19	Redundancy optimization for clock-free nanowire crossbar architecture 2007 ·(unknown), Ravi Bonam, Minsu Choi	2
20	Defect-Tolerant Gate Macro Mapping & Placement in Clock-Free Nanowire Crossbar Architecture 2007 ·Ravi Bonam, Yong-Bin Kim, Minsu Choi	6

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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