W. Stickel

780 total citations
37 papers, 483 citations indexed

About

W. Stickel is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, W. Stickel has authored 37 papers receiving a total of 483 indexed citations (citations by other indexed papers that have themselves been cited), including 33 papers in Electrical and Electronic Engineering, 30 papers in Surfaces, Coatings and Films and 10 papers in Biomedical Engineering. Recurrent topics in W. Stickel's work include Advancements in Photolithography Techniques (28 papers), Electron and X-Ray Spectroscopy Techniques (27 papers) and Integrated Circuits and Semiconductor Failure Analysis (10 papers). W. Stickel is often cited by papers focused on Advancements in Photolithography Techniques (28 papers), Electron and X-Ray Spectroscopy Techniques (27 papers) and Integrated Circuits and Semiconductor Failure Analysis (10 papers). W. Stickel collaborates with scholars based in United States, Germany and Japan. W. Stickel's co-authors include J. Geiger, H. Boersch, H. C. Pfeiffer, T. R. Groves, Michael Gordon, Chris Robinson, R. A. Simpson, J. L. Mauer, Rodney Kendall and Michael S. Gordon and has published in prestigious journals such as Physical Review Letters, The Journal of Chemical Physics and Physics Letters A.

In The Last Decade

W. Stickel

36 papers receiving 433 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
W. Stickel United States 11 316 255 141 118 65 37 483
Hideo Todokoro Japan 12 255 0.8× 187 0.7× 200 1.4× 87 0.7× 148 2.3× 55 482
J. Barth Netherlands 12 249 0.8× 215 0.8× 84 0.6× 78 0.7× 163 2.5× 33 434
William A. Friday United States 5 210 0.7× 119 0.5× 403 2.9× 90 0.8× 21 0.3× 13 535
Stefan Wurm United States 14 505 1.6× 243 1.0× 97 0.7× 207 1.8× 5 0.1× 59 647
Marcel Möller Germany 10 179 0.6× 127 0.5× 319 2.3× 152 1.3× 313 4.8× 16 589
D. Martz United States 13 217 0.7× 40 0.2× 249 1.8× 64 0.5× 64 1.0× 27 484
J. L. Mauer United States 11 247 0.8× 47 0.2× 82 0.6× 43 0.4× 14 0.2× 20 369
Till Domröse Germany 4 112 0.4× 102 0.4× 170 1.2× 88 0.7× 224 3.4× 8 351
Xi Yang United States 10 204 0.6× 43 0.2× 114 0.8× 32 0.3× 47 0.7× 55 346
Nara Rubiano da Silva Brazil 9 122 0.4× 97 0.4× 266 1.9× 111 0.9× 224 3.4× 14 446

Countries citing papers authored by W. Stickel

Since Specialization
Citations

This map shows the geographic impact of W. Stickel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by W. Stickel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites W. Stickel more than expected).

Fields of papers citing papers by W. Stickel

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by W. Stickel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by W. Stickel. The network helps show where W. Stickel may publish in the future.

Co-authorship network of co-authors of W. Stickel

This figure shows the co-authorship network connecting the top 25 collaborators of W. Stickel. A scholar is included among the top collaborators of W. Stickel based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with W. Stickel. W. Stickel is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Pfeiffer, H. C., Michael S. Gordon, Rodney Kendall, et al.. (2002). PREVAIL: latest electron optics results. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4688. 535–535. 2 indexed citations
2.
Pfeiffer, H. C., et al.. (2001). <title>PREVAIL-EPL alpha tool electron optics subsystem</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4343. 70–79. 1 indexed citations
3.
Gordon, Michael, et al.. (2000). PREVAIL: Dynamic correction of aberrations. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 3079–3083. 2 indexed citations
4.
Pfeiffer, H. C., et al.. (2000). PREVAIL Alpha system: Status and design considerations. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 3072–3078. 9 indexed citations
5.
Stickel, W., et al.. (2000). PREVAIL — Evolution and properties of large area reduction projection electron optics. Microelectronic Engineering. 53(1-4). 283–286. 5 indexed citations
6.
Kojima, Soichi, et al.. (2000). Electron optical image correction subsystem in electron beam projection lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 3017–3022. 9 indexed citations
7.
Gordon, Michael S., et al.. (1999). PREVAIL: Operation of the electron optics proof-of-concept system. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 2851–2855. 8 indexed citations
8.
Stickel, W., et al.. (1999). PREVAIL: Theory of the proof of concept column electron optics. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 2847–2850. 11 indexed citations
9.
Stickel, W.. (1998). Simulation of Coulomb interactions in electron beam lithography systems—A comparison of theoretical models. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 16(6). 3211–3214. 18 indexed citations
10.
Pfeiffer, H. C. & W. Stickel. (1995). <title>Large-field electron optics: limitations and enhancements</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2522. 23–30. 5 indexed citations
11.
Butsch, R., Michael Gordon, T. R. Groves, et al.. (1995). Performance enhancements on IBM’s EL-4 electron-beam lithography system. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(6). 2478–2482. 6 indexed citations
12.
Pfeiffer, H. C., et al.. (1993). EL-4, a new generation electron-beam lithography system. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 11(6). 2332–2341. 16 indexed citations
13.
Stickel, W., et al.. (1992). Telecentric beam positioning for advanced e-beam lithography. Microelectronic Engineering. 17(1-4). 25–28. 2 indexed citations
14.
Pfeiffer, H. C., et al.. (1990). Optimization of variable axis immersion lens for resolution and normal landing. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 8(6). 1682–1685. 7 indexed citations
15.
Stickel, W., et al.. (1989). Electron optical performance of electron beam lithography columns predicted by a simple model. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 7(1). 98–103. 1 indexed citations
16.
Pfeiffer, H. C., et al.. (1981). Contactless electrical testing of large area specimens using electron beams. Journal of Vacuum Science and Technology. 19(4). 1014–1018. 20 indexed citations
17.
Stickel, W.. (1978). Method of optimizing registration signals for electron-beam microfabrication. Journal of Vacuum Science and Technology. 15(3). 901–905. 9 indexed citations
18.
Stickel, W. & H. C. Pfeiffer. (1973). Abstract: Emission Characteristics of a LaB6 Electron Gun. Journal of Vacuum Science and Technology. 10(6). 1128–1128. 1 indexed citations
19.
Geiger, J. & W. Stickel. (1969). Electron energy loss spectra of metals in the infra-red spectral region. Physics Letters A. 28(9). 629–630. 5 indexed citations
20.
Boersch, H., J. Geiger, & W. Stickel. (1964). Anregung von molekülschwingungen durch schnelle elektronen. Physics Letters. 10(3). 285–286. 9 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by Hideo Todokoro Breakdown of academic impact, for papers by J. Barth Breakdown of academic impact, for papers by William A. Friday Breakdown of academic impact, for papers by Stefan Wurm Breakdown of academic impact, for papers by Marcel Möller Breakdown of academic impact, for papers by D. Martz Breakdown of academic impact, for papers by J. L. Mauer Breakdown of academic impact, for papers by Till Domröse Breakdown of academic impact, for papers by Xi Yang Breakdown of academic impact, for papers by Nara Rubiano da Silva
Rankless by CCL
2026