Anuja De Silva

640 total citations
47 papers, 501 citations indexed

About

Anuja De Silva is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Anuja De Silva has authored 47 papers receiving a total of 501 indexed citations (citations by other indexed papers that have themselves been cited), including 44 papers in Electrical and Electronic Engineering, 22 papers in Surfaces, Coatings and Films and 9 papers in Biomedical Engineering. Recurrent topics in Anuja De Silva's work include Advancements in Photolithography Techniques (38 papers), Electron and X-Ray Spectroscopy Techniques (22 papers) and Integrated Circuits and Semiconductor Failure Analysis (20 papers). Anuja De Silva is often cited by papers focused on Advancements in Photolithography Techniques (38 papers), Electron and X-Ray Spectroscopy Techniques (22 papers) and Integrated Circuits and Semiconductor Failure Analysis (20 papers). Anuja De Silva collaborates with scholars based in United States, Japan and Belgium. Anuja De Silva's co-authors include Christopher K. Ober, Nelson Felix, Vivek M. Prabhu, Shuhui Kang, Wen‐Li Wu, Luciana Meli, Hai Deng, Xavier André, Jin‐Kyun Lee and Heidi B. Cao and has published in prestigious journals such as Advanced Materials, Chemistry of Materials and Macromolecules.

In The Last Decade

Anuja De Silva

43 papers receiving 478 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Anuja De Silva United States 12 395 213 130 108 53 47 501
Hoa D. Truong United States 12 392 1.0× 275 1.3× 89 0.7× 273 2.5× 138 2.6× 33 590
Brian C. Trinque United States 10 219 0.6× 183 0.9× 52 0.4× 40 0.4× 84 1.6× 22 355
Benjamin L. Clark United States 11 337 0.9× 68 0.3× 119 0.9× 255 2.4× 10 0.2× 20 453
C.M. Leewis Netherlands 10 175 0.4× 80 0.4× 38 0.3× 156 1.4× 31 0.6× 19 343
Danilo De Simone Belgium 16 750 1.9× 238 1.1× 413 3.2× 68 0.6× 49 0.9× 126 839
S.H. Mousavi Iran 15 177 0.4× 226 1.1× 23 0.2× 276 2.6× 24 0.5× 38 474
T. Randall Lee United States 9 384 1.0× 106 0.5× 167 1.3× 209 1.9× 20 0.4× 10 494
Eun‐Ah You South Korea 11 170 0.4× 136 0.6× 55 0.4× 93 0.9× 18 0.3× 17 354
Daren Xu China 11 319 0.8× 168 0.8× 33 0.3× 305 2.8× 16 0.3× 18 519
Blanka Janicek United States 7 180 0.5× 64 0.3× 53 0.4× 270 2.5× 15 0.3× 16 443

Countries citing papers authored by Anuja De Silva

Since Specialization
Citations

This map shows the geographic impact of Anuja De Silva's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Anuja De Silva with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Anuja De Silva more than expected).

Fields of papers citing papers by Anuja De Silva

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Anuja De Silva. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Anuja De Silva. The network helps show where Anuja De Silva may publish in the future.

Co-authorship network of co-authors of Anuja De Silva

This figure shows the co-authorship network connecting the top 25 collaborators of Anuja De Silva. A scholar is included among the top collaborators of Anuja De Silva based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Anuja De Silva. Anuja De Silva is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Meli, Luciana, Anuja De Silva, Karen Petrillo, et al.. (2021). The road towards aggressive pitch scaling with single exposure EUV. 25–25. 3 indexed citations
3.
Goldfarb, Darı́o L., et al.. (2020). EUV chemically amplified resist component distribution and efficiency for stochastic defect control. 8–8. 3 indexed citations
4.
Silva, Anuja De, et al.. (2019). High-Z metal-based underlayer to improve EUV stochastics (Conference Presentation). 30–30. 1 indexed citations
5.
Burkhardt, Martin, et al.. (2019). Investigation of mask absorber induced image shift in EUV lithography. 33–33. 15 indexed citations
6.
Yao, Yiping, et al.. (2018). Inorganic Hardmask Development for EUV Patterning. VII. 27–27. 2 indexed citations
7.
Chowdhury, Piyas, Kamal Sikka, Anuja De Silva, & Indira Seshadri. (2018). On Thermal Interface Materials With Polydisperse Fillers: Packing Algorithm and Effective Properties. 3 indexed citations
8.
Silva, Anuja De, Luciana Meli, Yiping Yao, et al.. (2018). Inorganic hardmask development for extreme ultraviolet patterning. Journal of Micro/Nanolithography MEMS and MOEMS. 18(1). 1–1. 5 indexed citations
9.
Silva, Anuja De, Karen Petrillo, Luciana Meli, et al.. (2017). Single-expose patterning development for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431G–101431G. 7 indexed citations
10.
Seshadri, Indira, Anuja De Silva, Luciana Meli, et al.. (2017). Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431D–101431D. 3 indexed citations
11.
Liu, Eric, Karen Petrillo, Luciana Meli, et al.. (2017). Coater/developer based techniques to improve high-resolution EUV patterning defectivity. 9776. 66–66. 3 indexed citations
12.
Silva, Anuja De, Indira Seshadri, Abraham Arceo, et al.. (2017). Development of TiO2 containing hardmasks through PEALD deposition. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10146. 1014615–1014615. 1 indexed citations
13.
Silva, Anuja De, Yann Mignot, Luciana Meli, et al.. (2017). Development of amorphous silicon based EUV hardmasks through physical vapor deposition. 46–46. 2 indexed citations
14.
Silva, Anuja De, Indira Seshadri, Abraham Arceo, et al.. (2016). Study of alternate hardmasks for extreme ultraviolet patterning. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 34(6). 12 indexed citations
15.
Silva, Anuja De, Linda K. Sundberg, Ratnam Sooriyakumaran, et al.. (2011). Hexafluoroalcohol (HFA) containing molecular resist materials for high-resolution lithographic applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7972. 79721Z–79721Z. 1 indexed citations
16.
VanderHart, David L., Vivek M. Prabhu, Anuja De Silva, Nelson Felix, & Christopher K. Ober. (2009). Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator. Journal of Materials Chemistry. 19(18). 2683–2683. 11 indexed citations
17.
Silva, Anuja De, Nelson Felix, & Christopher K. Ober. (2008). Molecular Glass Resists as High‐Resolution Patterning Materials. Advanced Materials. 20(17). 3355–3361. 91 indexed citations
18.
Silva, Anuja De & Christopher K. Ober. (2008). Hydroxyphenylbenzene derivatives as glass forming molecules for high resolution photoresists. Journal of Materials Chemistry. 18(16). 1903–1903. 24 indexed citations
19.
Felix, Nelson, Anuja De Silva, Jing Sha, & Christopher K. Ober. (2008). Achieving small dimensions with an environmentally friendly solvent: photoresist development using supercritical CO2. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6923. 69233L–69233L. 1 indexed citations
20.
Silva, Anuja De, et al.. (2006). Molecular glass resists for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 615341–615341. 7 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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