Christopher P. Ausschnitt

725 total citations
47 papers, 570 citations indexed

About

Christopher P. Ausschnitt is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Mechanical Engineering. According to data from OpenAlex, Christopher P. Ausschnitt has authored 47 papers receiving a total of 570 indexed citations (citations by other indexed papers that have themselves been cited), including 42 papers in Electrical and Electronic Engineering, 16 papers in Biomedical Engineering and 15 papers in Mechanical Engineering. Recurrent topics in Christopher P. Ausschnitt's work include Advancements in Photolithography Techniques (34 papers), Advanced Measurement and Metrology Techniques (15 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). Christopher P. Ausschnitt is often cited by papers focused on Advancements in Photolithography Techniques (34 papers), Advanced Measurement and Metrology Techniques (15 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). Christopher P. Ausschnitt collaborates with scholars based in United States, Belgium and Netherlands. Christopher P. Ausschnitt's co-authors include R. K. Jain, J.P. Heritage, G. C. Bjorklund, R. R. Freeman, Timothy A. Brunner, R. H. Storz, Nelson Felix, Peter L. Hagelstein, Alan C. Thomas and Oleg Gluschenkov and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Optics Letters.

In The Last Decade

Christopher P. Ausschnitt

45 papers receiving 493 citations

Peers

Countries citing papers authored by Christopher P. Ausschnitt

Since Specialization

Citations

This map shows the geographic impact of Christopher P. Ausschnitt's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Christopher P. Ausschnitt with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Christopher P. Ausschnitt more than expected).

Fields of papers citing papers by Christopher P. Ausschnitt

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Christopher P. Ausschnitt. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Christopher P. Ausschnitt. The network helps show where Christopher P. Ausschnitt may publish in the future.

Co-authorship network of co-authors of Christopher P. Ausschnitt

This figure shows the co-authorship network connecting the top 25 collaborators of Christopher P. Ausschnitt. A scholar is included among the top collaborators of Christopher P. Ausschnitt based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Christopher P. Ausschnitt. Christopher P. Ausschnitt is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Image contrast metrology for EUV lithography 2022 ·Timothy A. Brunner, (unknown), Christopher P. Ausschnitt, (unknown), (unknown), (unknown), Lieve Van Look, Joern-Holger Franke	4
2	High-order wafer alignment in manufacturing 2012 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Nelson Felix, Vinayan C. Menon, Christopher P. Ausschnitt, (unknown), (unknown), Won Bae Kim, (unknown)	5
3	Smaller, smarter, faster, and more accurate: the new overlay metrology 2010 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Nelson Felix, Allen H. Gabor, (unknown), Christopher P. Ausschnitt	10
4	Combinatorial overlay control for double patterning 2009 ·Journal of Micro/Nanolithography MEMS and MOEMS ·Christopher P. Ausschnitt	5
5	Blossom overlay metrology implementation 2007 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Christopher P. Ausschnitt, (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), Hans‐Werner Fink, Nigel Smith, (unknown)	11
6	Process monitor gratings 2007 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Timothy A. Brunner, Christopher P. Ausschnitt	10
7	Overlay metrology tool calibration 2007 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), Nigel Smith, (unknown), Hans‐Werner Fink, Christopher P. Ausschnitt, (unknown), (unknown), (unknown)	4
8	Laser bandwidth and other sources of focus blur in lithography 2006 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Daniel Corliss, (unknown), (unknown), Christopher P. Ausschnitt, Mark D. Smith	6
9	Layout optimization for multilayer overlay targets 2006 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Nic Smith, Christopher P. Ausschnitt, (unknown), (unknown), (unknown), (unknown)	2
10	A new approach to pattern metrology 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Christopher P. Ausschnitt	7
11	CD control of low-k-factor step-and-scan lithography 2001 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Christopher P. Ausschnitt, (unknown), (unknown)	7
12	From compliance to control: off-roadmap metrology for low-k 1 lithography 2001 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Christopher P. Ausschnitt	1
13	<title>Photocluster control system implementation at the IBM Advanced Semiconductor Technology Center</title> 1994 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Christopher P. Ausschnitt, (unknown), (unknown), Alan C. Thomas	1
14	Stepper Overlay Calibration Using Alignment To A Latent Image 1985 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Christopher P. Ausschnitt	3
15	<title>Overlay Characterization Of Projection Aligners Using Electrical Probe Techniques</title> 1982 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Christopher P. Ausschnitt, Timothy A. Brunner, (unknown)	1
16	Laser-induced striations in a hydrogen-discharge plasma 1979 ·Optics Letters ·Christopher P. Ausschnitt, G. C. Bjorklund	5
17	Subpicosecond pulse generation in a synchronously mode-locked cw rhodamine 6G dye laser 1978 ·Optics Letters ·R. K. Jain, Christopher P. Ausschnitt	36
18	Hydrogen plasma diagnostics by resonant multiphoton optogalvanic spectroscopy 1978 ·Applied Physics Letters ·Christopher P. Ausschnitt, G. C. Bjorklund, R. R. Freeman	45
19	Pulse-width dependence on intracavity bandwidth in synchronously mode-locked cw dye lasers 1978 ·Applied Physics Letters ·Christopher P. Ausschnitt, R. K. Jain	47
20	Detection of atomic hydrogen and deuterium by resonant three-photon ionization 1978 ·Applied Physics Letters ·G. C. Bjorklund, Christopher P. Ausschnitt, R. R. Freeman, R. H. Storz	50

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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