Stuart Sieg

1.3k total citations
18 papers, 52 citations indexed

About

Stuart Sieg is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Stuart Sieg has authored 18 papers receiving a total of 52 indexed citations (citations by other indexed papers that have themselves been cited), including 16 papers in Electrical and Electronic Engineering, 6 papers in Surfaces, Coatings and Films and 4 papers in Biomedical Engineering. Recurrent topics in Stuart Sieg's work include Advancements in Photolithography Techniques (13 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers) and Advancements in Semiconductor Devices and Circuit Design (5 papers). Stuart Sieg is often cited by papers focused on Advancements in Photolithography Techniques (13 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers) and Advancements in Semiconductor Devices and Circuit Design (5 papers). Stuart Sieg collaborates with scholars based in United States, Israel and Germany. Stuart Sieg's co-authors include Martin Burkhardt, Scott Halle, John Arnold, Mark Somervell, Chi‐Chun Liu, Richard A. Farrell, Indira Seshadri, S.L. Rommel, Karen Petrillo and Anthony Lochtefeld and has published in prestigious journals such as Electronics Letters, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena and Journal of Photopolymer Science and Technology.

In The Last Decade

Stuart Sieg

15 papers receiving 43 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Stuart Sieg United States 4 44 16 15 12 6 18 52
Raja Muthinti United States 5 51 1.2× 7 0.4× 20 1.3× 5 0.4× 5 0.8× 8 57
Paloma López-Reyes Spain 5 14 0.3× 13 0.8× 14 0.9× 7 0.6× 4 0.7× 9 34
Vernon Wallace United States 3 23 0.5× 12 0.8× 6 0.4× 16 1.3× 12 2.0× 4 45
Marco Miliucci Italy 4 19 0.4× 8 0.5× 7 0.5× 15 1.3× 3 0.5× 14 36
A. Margain France 4 73 1.7× 6 0.4× 9 0.6× 4 0.3× 8 1.3× 6 78
G.S. Sun China 4 28 0.6× 4 0.3× 15 1.0× 9 0.8× 4 0.7× 5 34
A. Markowitz United States 4 11 0.3× 6 0.4× 9 0.6× 17 1.4× 7 1.2× 5 36
S. Mehta United States 5 79 1.8× 5 0.3× 10 0.7× 11 0.9× 4 0.7× 26 83
Sergei Trofimov Germany 4 31 0.7× 5 0.3× 5 0.3× 29 2.4× 18 3.0× 13 53
Yashuai Zhao China 4 11 0.3× 10 0.6× 6 0.4× 11 0.9× 14 2.3× 8 48

Countries citing papers authored by Stuart Sieg

Since Specialization
Citations

This map shows the geographic impact of Stuart Sieg's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Stuart Sieg with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Stuart Sieg more than expected).

Fields of papers citing papers by Stuart Sieg

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Stuart Sieg. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Stuart Sieg. The network helps show where Stuart Sieg may publish in the future.

Co-authorship network of co-authors of Stuart Sieg

This figure shows the co-authorship network connecting the top 25 collaborators of Stuart Sieg. A scholar is included among the top collaborators of Stuart Sieg based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Stuart Sieg. Stuart Sieg is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

18 of 18 papers shown
1.
2.
Chen, Zheng, Martin Burkhardt, Stuart Sieg, & Luciana Meli. (2023). EUV sub-resolution assist feature impact: experimental and simulation evaluation. 38–38. 2 indexed citations
3.
Sun, Xinghua, Yann Mignot, Christopher B. Cole, et al.. (2022). In-depth feasibility study of extreme ultraviolet damascene extension: Patterning, dielectric etch, and metallization. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 40(2). 2 indexed citations
4.
Petrillo, Karen, J. A. Church, Luciana Meli, et al.. (2022). Resist shrink characterization methodology for more accurate CD metrology. 24–24. 3 indexed citations
5.
Burkhardt, Martin, et al.. (2022). Focus considerations of design pitches and absorber choice for EUV random logic. 28–28. 12 indexed citations
6.
Miller, Eric R., Indira Seshadri, Dominik Metzler, et al.. (2022). Etch and patterning development for 2nm node nanosheet devices. 20–20.
7.
Meli, Luciana, Anuja De Silva, Karen Petrillo, et al.. (2021). The road towards aggressive pitch scaling with single exposure EUV. 25–25. 3 indexed citations
8.
Seshadri, Indira, Prateek Hundekar, Jingyun Zhang, et al.. (2021). Performance of stacked nanosheet gate all around FET’s with EUV patterned gate and sheets. 28–28. 3 indexed citations
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Li, Jun‐Tao, Julien Frougier, Raja Muthinti, et al.. (2018). (Invited) Epitaxy of (SiGe/Si) Superlattices for the Fabrication of Horizontal Gate-All-Around Nanosheet Transistors. ECS Meeting Abstracts. MA2018-02(31). 1075–1075. 1 indexed citations
12.
Bonam, Ravi, Chi‐Chun Liu, Stuart Sieg, et al.. (2017). Comprehensive analysis of line-edge and line-width roughness for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431A–101431A. 3 indexed citations
13.
Bonam, Ravi, Raja Muthinti, Chi‐Chun Liu, et al.. (2017). An OCD perspective of line edge and line width roughness metrology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10145. 1014511–1014511. 1 indexed citations
14.
Liu, Chi‐Chun, Stuart Sieg, Hsinyu Tsai, et al.. (2016). Directed self-assembly patterning for forming fin field effect transistors. SPIE Newsroom. 1 indexed citations
15.
Koay, Chiew-Seng, et al.. (2016). Assessments of image-based and scatterometry-based overlay targets. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9778. 97781K–97781K. 1 indexed citations
16.
Liu, Chi‐Chun, Stuart Sieg, Hsinyu Tsai, et al.. (2016). DSA patterning options for FinFET formation at 7nm node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9777. 97770R–97770R. 9 indexed citations
17.
Tang, Hao, Jeffrey C. Shearer, Nicole Saulnier, et al.. (2015). Reduction of Critical Dimension Difference in Litho-Etch-Litho- Etch Double Patterning Process. Journal of Photopolymer Science and Technology. 28(1). 13–16. 3 indexed citations
18.
Sieg, Stuart, et al.. (2008). Alloyed junction Ge Esaki diodes on Si substrates realised by aspect ratio trapping technique. Electronics Letters. 44(15). 930–932. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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