Stuart Sieg

1.3k citations

18 papers · 52 indexed · h-index 4

Impact in

Surfaces, Coatings and Films
- Electron and X-Ray Spectroscopy Techniques
Electrical and Electronic Engineering
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design

Papers in ⓘ

Electrical and Electronic Engineering 16
- Advancements in Photolithography Techniques 13
- Integrated Circuits and Semiconductor Failure Analysis 8
- Advancements in Semiconductor Devices and Circuit Design 5
- Semiconductor materials and devices 4
Surfaces, Coatings and Films 6
- Electron and X-Ray Spectroscopy Techniques 4
- Optical Coatings and Gratings 2

Co-authors: Martin Burkhardt (3 shared papers)Scott Halle (3 shared papers)Hsinyu Tsai (2 shared papers)Jeffrey C. Shearer (3 shared papers)Nelson Felix (8 shared papers)S.L. Rommel (1 shared paper)Anthony Lochtefeld (1 shared paper)Richard A. Farrell (2 shared papers)
Journals: Journal of Photopolymer Science and Technology (1 paper)Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (1 paper)Electronics Letters (1 paper)ECS Meeting Abstracts (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (4 papers)
Partner nations: United States Israel Germany

In The Last Decade

Stuart Sieg

15 papers receiving 43 citations

Peers

Countries citing papers authored by Stuart Sieg

Since Specialization

Citations

This map shows the geographic impact of Stuart Sieg's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Stuart Sieg with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Stuart Sieg more than expected).

Fields of papers citing papers by Stuart Sieg

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Stuart Sieg. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Stuart Sieg. The network helps show where Stuart Sieg may publish in the future.

Co-authors

The 25 scholars most cited alongside Stuart Sieg, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Stuart Sieg Line = papers co-authored together Stuart Sieg links everyone, so they are left out of the graph.

All Works

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18 of 18 papers shown

#	Work
1	Focus considerations of design pitches and absorber choice for EUV random logic Martin Burkhardt, Zheng G. Chen, Scott Halle, Romain J. Lallement, Stuart Sieg, Luciana Meli	2022	12
2	DSA patterning options for FinFET formation at 7nm node Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chi‐Chun Liu, Elliott Franke, Fee Li Lie, Stuart Sieg, Hsinyu Tsai, Kafai Lai, Hoa Truong, Richard A. Farrell, Mark Somervell, Daniel P. Sanders, Nelson Felix, Michael Guillorn, Sean Burns, David Hetzer, Akiteru Ko, John Arnold, Matthew Colburn	2016	9
3	Alloyed junction Ge Esaki diodes on Si substrates realised by aspect ratio trapping technique Electronics Letters ·D. Pawlik, Stuart Sieg, Santosh Kurinec, S.L. Rommel, Zhiyuan Cheng, J.-S. Park, Jennifer M. Hydrick, Anthony Lochtefeld	2008	6
4	The road towards aggressive pitch scaling with single exposure EUV Luciana Meli, Jennifer Church, Anuja De Silva, Karen Petrillo, Darı́o L. Goldfarb, Stuart Sieg, Romain Lallement, D. Lea, Martin Burkhardt, Nelson Felix, Cody Murray	2021	3
5	Comprehensive analysis of line-edge and line-width roughness for EUV lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ravi Bonam, Chi‐Chun Liu, Mary Breton, Stuart Sieg, Indira Seshadri, Nicole Saulnier, Jeffrey C. Shearer, Raja Muthinti, R. Patlolla, Huai Huang	2017	3
6	Reduction of Critical Dimension Difference in Litho-Etch-Litho- Etch Double Patterning Process Journal of Photopolymer Science and Technology ·Hao Tang, Jeffrey C. Shearer, Lin Lee Cheong, Nicole Saulnier, Stuart Sieg, Karen Petrillo, Andrew Metz, John Arnold	2015	3
7	Resist shrink characterization methodology for more accurate CD metrology Mary Breton, Karen Petrillo, J. A. Church, Luciana Meli, Jennifer Fullam, Stuart Sieg, Romain Lallement, Nelson Felix, Shimon Levi, Susan Zollinger, Felix Levitov, Seán Hand, Jason A. Osborne, Weijie Wang	2022	3
8	Performance of stacked nanosheet gate all around FET’s with EUV patterned gate and sheets Indira Seshadri, Jennifer Church, Prateek Hundekar, Mary Breton, Jingyun Zhang, Eric R. Miller, Andrew Greene, Julien Frougier, Chris Waskiewicz, Tao Li, Tsung-Sheng Kang, Daniel J. Dechene, C. Radens, Stuart Sieg, Veeraraghavan Basker, Nelson Felix, Chris A. Mack	2021	3
9	EUV sub-resolution assist feature impact: experimental and simulation evaluation Zheng Chen, Martin Burkhardt, Stuart Sieg, Luciana Meli	2023	2
10	In-depth feasibility study of extreme ultraviolet damascene extension: Patterning, dielectric etch, and metallization Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Xinghua Sun, Yann Mignot, Christopher B. Cole, Eric Liu, Daniel Ramírez de los Santos, Angélique Raley, Jennifer Church, Luciana Meli, Stuart Sieg, Peter Biolsi	2022	2
11	Assessments of image-based and scatterometry-based overlay targets Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chiew-Seng Koay, Nelson Felix, Bassem Hamieh, Scott Halle, Chumeng Zheng, Stuart Sieg	2016	1
12	A comparative analysis of EUV sheet and gate patterning for beyond 7nm gate all around stacked nanosheet FET’s (Conference Presentation) Indira Seshadri, Praveen Joseph, Stuart Sieg, Tao Li, Wenyu Xu, Eric R. Miller, Dan J. Dechene, Andrew Greene, C. Radens, Jingyun Zhang, Yann Mignot, P. Montanini, Mary Breton, Veeraraghavan Basker, Nelson Felix	2020	1
13	EUVL mask process development and verification using advanced modeling and characterization techniques Michael E. Green, Romain Lallement, Mohamed Ramadan, Derren Dunn, Henry Kamberian, Stuart Sieg, Young Ham, Chris Progler	2020	1
14	Directed self-assembly patterning for forming fin field effect transistors SPIE Newsroom ·Chi‐Chun Liu, Elliott Franke, Fee Li Lie, Stuart Sieg, Hsinyu Tsai, Kafai Lai, Hoa Truong, Richard A. Farrell, Mark Somervell, Daniel P. Sanders, Nelson Felix, Michael Guillorn, Sean Burns, David Hetzer, Akiteru Ko, John Arnold, Matthew Colburn	2016	1
15	An OCD perspective of line edge and line width roughness metrology Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ravi Bonam, Raja Muthinti, Mary Breton, Chi‐Chun Liu, Stuart Sieg, Indira Seshadri, Nicole Saulnier, Jeffrey C. Shearer, R. Patlolla, Huai Huang	2017	1
16	(Invited) Epitaxy of (SiGe/Si) Superlattices for the Fabrication of Horizontal Gate-All-Around Nanosheet Transistors ECS Meeting Abstracts ·Nicolas Loubet, Jun‐Tao Li, Robin Chao, Chunwing Yeung, Julien Frougier, Curtis Durfee, Abraham Arceo de la Peña, Raja Muthinti, Zhenxing Bi, M. Sankarapandian, Wenyu Xu, Yann Mignot, Stuart Sieg, Rena M. Conti, Basker Veeraraghavan, Hemanth Jagannathan, Bala Haran, R. Divakaruni, Huiming Bu	2018	1
17	Accelerating high-NA EUV lithography insertion for interconnect scaling and beyond: Performance, cost, and future prospects Luciana Meli, Indira Seshadri, Jed Rankin, Jennifer Church, Yasiel Cabrera, Christopher Penny, Jaime Morillo, Stuart Sieg, Darı́o L. Goldfarb, Nicholas Latham, T.M. Howe, Shing Yip Lee, Yann Mignot, Scott Halle	2025	0
18	Etch and patterning development for 2nm node nanosheet devices Eric R. Miller, Indira Seshadri, Tsung-Sheng Kang, Dominik Metzler, Joe Lee, Stuart Sieg, Sebastian Engelmann, Jeff Shearer, John Arnold, Nelson Felix	2022	0

About Stuart Sieg

Stuart Sieg is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films, Biomedical Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials, having authored 18 papers that have together received 52 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (13 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers), Advancements in Semiconductor Devices and Circuit Design (5 papers), Electron and X-Ray Spectroscopy Techniques (4 papers), Semiconductor materials and devices (4 papers), Industrial Vision Systems and Defect Detection (2 papers), Nanofabrication and Lithography Techniques (2 papers) and Optical Coatings and Gratings (2 papers). The work is most often cited by research in Surfaces, Coatings and Films (16 citations), Electrical and Electronic Engineering (44 citations), Radiation (5 citations), Biomedical Engineering (15 citations) and Instrumentation (1 citation). Stuart Sieg has collaborated with scholars based in United States, Israel and Germany. Frequent co-authors include Martin Burkhardt, Scott Halle, Hsinyu Tsai, Jeffrey C. Shearer, Nelson Felix, S.L. Rommel, Anthony Lochtefeld, Richard A. Farrell, Zhiyuan Cheng and Mark Somervell. Their work appears in journals such as Journal of Photopolymer Science and Technology, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, Electronics Letters, ECS Meeting Abstracts and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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