Frieda Van Roey

582 total citations
45 papers, 463 citations indexed

About

Frieda Van Roey is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Frieda Van Roey has authored 45 papers receiving a total of 463 indexed citations (citations by other indexed papers that have themselves been cited), including 42 papers in Electrical and Electronic Engineering, 21 papers in Surfaces, Coatings and Films and 10 papers in Biomedical Engineering. Recurrent topics in Frieda Van Roey's work include Advancements in Photolithography Techniques (42 papers), Integrated Circuits and Semiconductor Failure Analysis (24 papers) and Electron and X-Ray Spectroscopy Techniques (19 papers). Frieda Van Roey is often cited by papers focused on Advancements in Photolithography Techniques (42 papers), Integrated Circuits and Semiconductor Failure Analysis (24 papers) and Electron and X-Ray Spectroscopy Techniques (19 papers). Frieda Van Roey collaborates with scholars based in Belgium, United States and Netherlands. Frieda Van Roey's co-authors include Gian F. Lorusso, Roel Gronheid, Chris A. Mack, Yasin Ekinci, Alain Moussa, Harun H. Solak, Kurt Ronse, David Van Steenwinckel, Dieter Van den Heuvel and Ivan Pollentier and has published in prestigious journals such as Chemistry of Materials, Microelectronic Engineering and Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.

In The Last Decade

Frieda Van Roey

43 papers receiving 426 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Frieda Van Roey Belgium 12 403 191 159 49 37 45 463
Han-Ku Cho South Korea 9 381 0.9× 141 0.7× 140 0.9× 25 0.5× 45 1.2× 111 421
Naoya Hayashi Japan 11 438 1.1× 208 1.1× 165 1.0× 42 0.9× 30 0.8× 132 526
Soichi Inoue Japan 11 344 0.9× 144 0.8× 125 0.8× 31 0.6× 21 0.6× 96 412
Alessandro Vaglio Pret Belgium 12 389 1.0× 184 1.0× 98 0.6× 24 0.5× 23 0.6× 64 408
Jan Mulkens Netherlands 13 401 1.0× 127 0.7× 218 1.4× 45 0.9× 28 0.8× 47 467
Ki‐Ho Baik United States 10 399 1.0× 96 0.5× 177 1.1× 24 0.5× 28 0.8× 90 435
Mireille Maenhoudt Belgium 12 419 1.0× 105 0.5× 211 1.3× 23 0.5× 42 1.1× 47 457
Katsuya Okumura Japan 12 374 0.9× 86 0.5× 98 0.6× 26 0.5× 54 1.5× 56 430
Neal Lafferty United States 11 293 0.7× 129 0.7× 155 1.0× 16 0.3× 68 1.8× 42 368
Dieter Van den Heuvel Belgium 13 430 1.1× 237 1.2× 112 0.7× 18 0.4× 129 3.5× 57 501

Countries citing papers authored by Frieda Van Roey

Since Specialization
Citations

This map shows the geographic impact of Frieda Van Roey's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Frieda Van Roey with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Frieda Van Roey more than expected).

Fields of papers citing papers by Frieda Van Roey

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Frieda Van Roey. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Frieda Van Roey. The network helps show where Frieda Van Roey may publish in the future.

Co-authorship network of co-authors of Frieda Van Roey

This figure shows the co-authorship network connecting the top 25 collaborators of Frieda Van Roey. A scholar is included among the top collaborators of Frieda Van Roey based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Frieda Van Roey. Frieda Van Roey is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Constantoudis, Vassilios, et al.. (2019). Deep learning nanometrology of line edge roughness. 109–109. 2 indexed citations
2.
Simone, Danilo De, Romuald Blanc, Roberto Fallica, et al.. (2019). Staggered pillar patterning using 0.33NA EUV lithography. 10586. 25–25.
3.
Mack, Chris A., Frieda Van Roey, & Gian F. Lorusso. (2019). Unbiased roughness measurements: subtracting out SEM effects, part 3. 23–23. 9 indexed citations
4.
Constantoudis, Vassilios, et al.. (2018). Line edge roughness metrology: recent challenges and advances toward more complete and accurate measurements. Journal of Micro/Nanolithography MEMS and MOEMS. 17(4). 1–1. 9 indexed citations
5.
6.
Moussa, Alain, Gian F. Lorusso, Frieda Van Roey, et al.. (2018). The need for LWR metrology standardization: the imec roughness protocol. 12–12. 21 indexed citations
7.
Sayan, Şafak, Boon Teik Chan, Roel Gronheid, et al.. (2014). Directed self-assembly process integration: Fin patterning approaches and challenges. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9051. 90510M–90510M. 9 indexed citations
8.
Simone, Danilo De, Frieda Van Roey, Tao Zheng, et al.. (2014). Progresses and Challenges of EUV Lithography Materials. Journal of Photopolymer Science and Technology. 27(5). 601–610. 15 indexed citations
9.
Roey, Frieda Van, et al.. (2011). Recent Advancements in EUV Resist Materials and Process Performance. Journal of Photopolymer Science and Technology. 24(1). 25–32. 6 indexed citations
10.
Lorusso, Gian F., Jan Hermans, Frieda Van Roey, et al.. (2008). Imaging performance of the EUV alpha semo tool at IMEC. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6921. 69210O–69210O. 11 indexed citations
11.
Tran, Hoang V., Eric Hendrickx, Roger H. French, et al.. (2008). High Refractive Index Fluid Evaluations at 193nm: Fluid Lifetime and Fluid/Resist Interaction Studies. Journal of Photopolymer Science and Technology. 21(5). 631–639. 3 indexed citations
12.
Gronheid, Roel, Frieda Van Roey, & David Van Steenwinckel. (2008). Using KLUP for Understanding Trends in EUV Resist Performance. Journal of Photopolymer Science and Technology. 21(3). 429–434. 10 indexed citations
13.
Jonckheere, R., Gian F. Lorusso, Jan Hermans, et al.. (2007). EUV lithography program at IMEC. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6517. 651709–651709. 24 indexed citations
14.
Hermans, Jan, et al.. (2007). Status of EUV lithography at IMEC. Journal of Photopolymer Science and Technology. 20(3). 383–392. 17 indexed citations
15.
Gronheid, Roel, et al.. (2006). Progress in EUV resist Performance. Journal of Photopolymer Science and Technology. 19(4). 501–506. 16 indexed citations
16.
Ronse, Kurt, Peter De Bisschop, Jan Hermans, et al.. (2003). Status 157-nm lithography development at IMEC. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5040. 640–640. 1 indexed citations
17.
Bisschop, Peter De, Jan Hermans, R. Jonckheere, et al.. (2003). Introducing 157 nm Full Field Lithography. Journal of Photopolymer Science and Technology. 16(4). 549–556. 6 indexed citations
18.
Roey, Frieda Van, et al.. (2000). Implementation of ArF Resist Processes for 130nm and below.. Journal of Photopolymer Science and Technology. 13(4). 635–644. 1 indexed citations
19.
Jaenen, Patrick, et al.. (1999). Recent advancements in 193 nm step and scan lithography.. Journal of Photopolymer Science and Technology. 12(3). 445–455. 1 indexed citations
20.
Roey, Frieda Van, et al.. (1998). Integrated Silylation and Dry Development of Resist for sub-0.15.MU.m Top Surface Imaging Applications.. Journal of Photopolymer Science and Technology. 11(4). 597–612. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by Han-Ku Cho Breakdown of academic impact, for papers by Naoya Hayashi Breakdown of academic impact, for papers by Soichi Inoue Breakdown of academic impact, for papers by Alessandro Vaglio Pret Breakdown of academic impact, for papers by Jan Mulkens Breakdown of academic impact, for papers by Ki‐Ho Baik Breakdown of academic impact, for papers by Mireille Maenhoudt Breakdown of academic impact, for papers by Katsuya Okumura Breakdown of academic impact, for papers by Neal Lafferty Breakdown of academic impact, for papers by Dieter Van den Heuvel
Rankless by CCL
2026