F.N. Cubaynes

519 total citations
26 papers, 388 citations indexed

About

F.N. Cubaynes is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, F.N. Cubaynes has authored 26 papers receiving a total of 388 indexed citations (citations by other indexed papers that have themselves been cited), including 26 papers in Electrical and Electronic Engineering, 2 papers in Atomic and Molecular Physics, and Optics and 2 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in F.N. Cubaynes's work include Semiconductor materials and devices (23 papers), Advancements in Semiconductor Devices and Circuit Design (16 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). F.N. Cubaynes is often cited by papers focused on Semiconductor materials and devices (23 papers), Advancements in Semiconductor Devices and Circuit Design (16 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). F.N. Cubaynes collaborates with scholars based in Belgium, Netherlands and Finland. F.N. Cubaynes's co-authors include A.J. Scholten, Jurriaan Schmitz, R.J. Havens, L.F. Tiemeijer, P.A. Stolk, R. de Kort, Roger Loo, M. Jurczak, G. Groeseneken and Piet Wambacq and has published in prestigious journals such as Applied Physics Letters, Journal of The Electrochemical Society and Applied Surface Science.

In The Last Decade

F.N. Cubaynes

22 papers receiving 374 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
F.N. Cubaynes Belgium 9 369 60 48 34 12 26 388
P. Charvát United States 4 390 1.1× 93 1.6× 47 1.0× 56 1.6× 6 0.5× 5 412
T. Grabolla Germany 10 224 0.6× 47 0.8× 63 1.3× 42 1.2× 6 0.5× 31 263
F. Leverd France 11 386 1.0× 67 1.1× 41 0.9× 44 1.3× 3 0.3× 36 390
S. Baudot France 8 134 0.4× 42 0.7× 30 0.6× 35 1.0× 4 0.3× 24 160
A. Naem Canada 9 272 0.7× 40 0.7× 62 1.3× 105 3.1× 6 0.5× 28 311
Hiroaki Arimura Belgium 15 620 1.7× 95 1.6× 95 2.0× 82 2.4× 12 1.0× 96 651
Nicolas Daval France 11 429 1.2× 90 1.5× 30 0.6× 73 2.1× 13 1.1× 49 441
Hiroshi Horie Japan 11 716 1.9× 83 1.4× 59 1.2× 77 2.3× 10 0.8× 41 742
C. Kerner Belgium 11 347 0.9× 40 0.7× 26 0.5× 63 1.9× 8 0.7× 33 360
T.C. Mele United States 6 249 0.7× 22 0.4× 37 0.8× 49 1.4× 4 0.3× 22 262

Countries citing papers authored by F.N. Cubaynes

Since Specialization
Citations

This map shows the geographic impact of F.N. Cubaynes's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by F.N. Cubaynes with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites F.N. Cubaynes more than expected).

Fields of papers citing papers by F.N. Cubaynes

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by F.N. Cubaynes. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by F.N. Cubaynes. The network helps show where F.N. Cubaynes may publish in the future.

Co-authorship network of co-authors of F.N. Cubaynes

This figure shows the co-authorship network connecting the top 25 collaborators of F.N. Cubaynes. A scholar is included among the top collaborators of F.N. Cubaynes based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with F.N. Cubaynes. F.N. Cubaynes is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Parvais, Bertrand, Jonathan Borremans, A. Mercha, et al.. (2006). Device and circuit-level analog performance trade-offs: a comparative study of planar bulk FETs versus FinFETs. 898–901. 50 indexed citations
2.
Cubaynes, F.N., V. C. Venezia, C. van der Marel, et al.. (2005). Plasma-nitrided silicon-rich oxide as an extension to ultrathin nitrided oxide gate dielectrics. Applied Physics Letters. 86(17). 7 indexed citations
3.
Veloso, A., F.N. Cubaynes, A. Rothschild, et al.. (2004). Ultra-thin oxynitride gate dielectrics by pulsed-RF DPN for 65 nm general purpose CMOS applications. 239–242. 1 indexed citations
4.
Schmitz, Jurriaan, F.N. Cubaynes, R. de Kort, et al.. (2004). The RF-CV method for characterization of leaky gate dielectrics. Microelectronic Engineering. 72(1-4). 149–153. 2 indexed citations
5.
Marel, C. van der, et al.. (2004). Thickness and composition of ultrathin SiO2 layers on Si. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 22(4). 1572–1578. 10 indexed citations
6.
Schmitz, Jurriaan, et al.. (2004). Test Structure Design Considerations for RF-CV Measurements on Leaky Dielectrics. IEEE Transactions on Semiconductor Manufacturing. 17(2). 150–154. 16 indexed citations
7.
Cubaynes, F.N.. (2004). Ultra-thin plasma nitrided oxide gate dielectrics for advanced MOS transistors. University of Twente Research Information. 1 indexed citations
8.
Surdeanu, R., Richard Lindsay, Mark van Dal, et al.. (2004). Advanced PMOS Device Architecture for Highly-Doped Ultra-Shallow Junctions. Japanese Journal of Applied Physics. 43(4S). 1778–1778. 4 indexed citations
9.
Schmitz, Jurriaan, F.N. Cubaynes, R.J. Havens, et al.. (2003). RF capacitance-voltage characterization of MOSFETs with high leakage dielectrics. IEEE Electron Device Letters. 24(1). 37–39. 53 indexed citations
10.
Cubaynes, F.N., Xiafang Zhang, L. Daté, et al.. (2003). In-line electrical characterization of ultrathin gate dielectric films. 1–5.
11.
Schmitz, Jurriaan, F.N. Cubaynes, R.J. Havens, et al.. (2003). Test structure design considerations for RF-CV measurements on leaky dielectrics. University of Twente Research Information. 181–185. 6 indexed citations
12.
Cubaynes, F.N., Jurriaan Schmitz, C. van der Marel, et al.. (2003). Plasma nitridation optimization for sub-15 A gate dielectrics. University of Twente Research Information. 595–604.
13.
Hurley, Paul K., B. J. O’Sullivan, F.N. Cubaynes, et al.. (2002). Examination of the Si(111)-SiO[sub 2], Si(110)-SiO[sub 2], and Si(100)-SiO[sub 2] Interfacial Properties Following Rapid Thermal Annealing. Journal of The Electrochemical Society. 149(3). G194–G194. 32 indexed citations
14.
Ponomarev, Y.V., C. Dachs, F.N. Cubaynes, et al.. (2002). A manufacturable 25 nm planar MOSFET technology. 33–34. 2 indexed citations
15.
Langevelde, R. van, A.J. Scholten, Ray Duffy, et al.. (2002). Gate current: Modeling, ΔL extraction and impact on RF performance. 13.2.1–13.2.4. 36 indexed citations
16.
Berkum, J. G. M. van, et al.. (2002). Quantitative depth profiling of SiOxNy layers on Si. Applied Surface Science. 203-204. 414–417. 7 indexed citations
17.
Ponomarev, Y.V., et al.. (2001). A Manufacturable Sub-50nm PMOSFET Technology. 147–150. 1 indexed citations
18.
O’Sullivan, Barry, Paul K. Hurley, F.N. Cubaynes, P.A. Stolk, & F. Widdershoven. (2001). Flat band voltage shift and oxide properties after rapid thermal annealing. Microelectronics Reliability. 41(7). 1053–1056. 14 indexed citations
19.
Surdeanu, R., C. Dachs, P.A. Stolk, F.N. Cubaynes, & Y.V. Ponomarev. (2001). Pockets and offset spacer engineering for 100 nm CMOS. 431–434.
20.
Cubaynes, F.N., et al.. (2001). The influence of polysilicon gate morphology on dopant activation and deactivation kinetics in deep-submicron CMOS transistors. Materials Science in Semiconductor Processing. 4(4). 351–356. 15 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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