Y. Tamminga

1.8k total citations
51 papers, 1.3k citations indexed

About

Y. Tamminga is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Y. Tamminga has authored 51 papers receiving a total of 1.3k indexed citations (citations by other indexed papers that have themselves been cited), including 43 papers in Electrical and Electronic Engineering, 23 papers in Materials Chemistry and 12 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Y. Tamminga's work include Silicon and Solar Cell Technologies (19 papers), Semiconductor materials and devices (19 papers) and Thin-Film Transistor Technologies (12 papers). Y. Tamminga is often cited by papers focused on Silicon and Solar Cell Technologies (19 papers), Semiconductor materials and devices (19 papers) and Thin-Film Transistor Technologies (12 papers). Y. Tamminga collaborates with scholars based in Netherlands, Belgium and Finland. Y. Tamminga's co-authors include F.H.P.M. Habraken, A. E. T. Kuiper, J. B. Theeten, W. A. P. Claassen, Ray Duffy, G. J. van Gurp, A. van Oostrom, M. Hopstaken, F.R. de Boer and F. Roozeboom and has published in prestigious journals such as Physical review. B, Condensed matter, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Y. Tamminga

50 papers receiving 1.3k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Y. Tamminga Netherlands 21 977 569 350 173 137 51 1.3k
I. J. R. Baumvol Brazil 18 1.0k 1.1× 666 1.2× 183 0.5× 148 0.9× 201 1.5× 77 1.4k
Yusuke Mizokawa Japan 15 614 0.6× 530 0.9× 217 0.6× 122 0.7× 110 0.8× 49 996
W. M. Lau Canada 23 848 0.9× 678 1.2× 346 1.0× 348 2.0× 110 0.8× 91 1.5k
K. Edamoto Japan 21 606 0.6× 866 1.5× 446 1.3× 136 0.8× 140 1.0× 81 1.4k
R. W. M. Kwok Hong Kong 18 644 0.7× 573 1.0× 211 0.6× 146 0.8× 74 0.5× 74 1.1k
Š. Luby Slovakia 17 491 0.5× 458 0.8× 432 1.2× 147 0.8× 252 1.8× 134 1.1k
Haruhiko Ono Japan 19 887 0.9× 746 1.3× 240 0.7× 59 0.3× 133 1.0× 67 1.2k
Hisayoshi Itoh Japan 20 1.3k 1.3× 796 1.4× 264 0.8× 118 0.7× 149 1.1× 124 2.0k
R. J. Baird United States 20 414 0.4× 639 1.1× 370 1.1× 118 0.7× 83 0.6× 27 1.3k
S. Ismat Shah United States 14 322 0.3× 450 0.8× 315 0.9× 117 0.7× 205 1.5× 36 952

Countries citing papers authored by Y. Tamminga

Since Specialization
Citations

This map shows the geographic impact of Y. Tamminga's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Y. Tamminga with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Y. Tamminga more than expected).

Fields of papers citing papers by Y. Tamminga

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Y. Tamminga. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Y. Tamminga. The network helps show where Y. Tamminga may publish in the future.

Co-authorship network of co-authors of Y. Tamminga

This figure shows the co-authorship network connecting the top 25 collaborators of Y. Tamminga. A scholar is included among the top collaborators of Y. Tamminga based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Y. Tamminga. Y. Tamminga is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Duffy, Ray, et al.. (2006). Groups III and V impurity solubilities in silicon due to laser, flash, and solid-phase-epitaxial-regrowth anneals. Applied Physics Letters. 89(7). 44 indexed citations
2.
Duffy, Ray, V. C. Venezia, Roger Loo, et al.. (2005). Low-temperature diffusion of high-concentration phosphorus in silicon, a preferential movement toward the surface. Applied Physics Letters. 86(8). 29 indexed citations
3.
Duffy, Ray, V. C. Venezia, A. Heringa, et al.. (2004). Dopant diffusion in amorphous silicon. MRS Proceedings. 810. 5 indexed citations
4.
Venezia, V. C., Ray Duffy, Lourdes Pelaz, et al.. (2004). Dopant redistribution effects in preamorphized silicon during low temperature annealing. 20.3.1–20.3.4. 3 indexed citations
5.
Kuiper, A. E. T., et al.. (2004). A surface science model for the Phillips ethylene polymerization catalyst: thermal activation and polymerization activity. Journal of Catalysis. 223(1). 134–141. 50 indexed citations
6.
Puurunen, Riikka L., Wilfried Vandervorst, W.F.A. Besling, et al.. (2004). Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy. Journal of Applied Physics. 96(9). 4878–4889. 127 indexed citations
7.
Borgna, Armando, Bruce G. Anderson, A.M. Saib, et al.. (2004). Pt−Co/SiO2Bimetallic Planar Model Catalysts for Selective Hydrogenation of Crotonaldehyde. The Journal of Physical Chemistry B. 108(46). 17905–17914. 47 indexed citations
8.
Kurt, Ralph, et al.. (2002). Radiation-induced carbon contamination of optics. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4688. 702–702. 16 indexed citations
9.
Kuiper, A. E. T., M. F. Gillies, V. Kottler, et al.. (2001). Plasma oxidation of thin aluminum layers for magnetic spin-tunnel junctions. Journal of Applied Physics. 89(3). 1965–1972. 49 indexed citations
10.
Gillies, M. F., et al.. (1999). The optimum oxidation state of AlO/sub x/ magnetic tunnel junctions. IEEE Transactions on Magnetics. 35(5). 2991–2993. 19 indexed citations
11.
Kuiper, A. E. T., F.H.P.M. Habraken, A. van Oostrom, & Y. Tamminga. (1983). Chemical composition of LPCVD silicon nitride and silicon oxynitride layers. 38. 1–18. 5 indexed citations
12.
Habraken, F.H.P.M., A. E. T. Kuiper, & Y. Tamminga. (1983). Thermal nitridation of monocrystalline silicon, polycrystalline silicon and silicon dioxide films. 38. 19–36. 3 indexed citations
13.
Kuiper, A. E. T., et al.. (1983). Deposition and composition of silicon oxynitride films. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 1(1). 62–66. 71 indexed citations
14.
Tamminga, Y., et al.. (1983). Optimization and application of glancing angle Rutherford backscattering spectrometry. Nuclear Instruments and Methods in Physics Research. 218(1-3). 107–110. 2 indexed citations
15.
Tamminga, Y., M. F. C. Willemsen, F.H.P.M. Habraken, & A. E. T. Kuiper. (1982). High-resolution Rutherford backscattering spectrometry and the analysis of very thin silicon nitride layers. Nuclear Instruments and Methods in Physics Research. 200(2-3). 499–504. 29 indexed citations
16.
Tamminga, Y., et al.. (1982). The Oxidation Inhibition in Nitrogen‐Implanted Silicon. Journal of The Electrochemical Society. 129(8). 1803–1811. 33 indexed citations
17.
Tamminga, Y., et al.. (1979). Elemental and dose dependent threshold for Nd-YAG laser induced recrystallization of silicon. AIP conference proceedings. 50. 321–324. 1 indexed citations
18.
Tamminga, Y., et al.. (1979). Differences between ruby and Nd:YAG laser annealing of ion implanted silicon. Physics Letters A. 69(6). 436–438. 9 indexed citations
19.
Gurp, G. J. van, et al.. (1979). Aluminum-silicide reactions. I. Diffusion, compound formation, and microstructure. Journal of Applied Physics. 50(11). 6915–6922. 70 indexed citations
20.
Arons, R. R., Y. Tamminga, & G. de Vries. (1970). On the Diffusion of H and D in Pd between 50 and 300 °K. physica status solidi (b). 40(1). 107–112. 29 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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