Akiteru Ko

412 citations

34 papers · 158 · h-index 8

Impact in

Surfaces, Coatings and Films
- Electron and X-Ray Spectroscopy Techniques
Electrical and Electronic Engineering
- Advancements in Photolithography Techniques
- Semiconductor materials and devices
- Integrated Circuits and Semiconductor Failure Analysis

Papers in

Electrical and Electronic Engineering 31
- Advancements in Photolithography Techniques 28
- Integrated Circuits and Semiconductor Failure Analysis 10
- 3D IC and TSV technologies 6
- Semiconductor materials and devices 4
Biomedical Engineering 16
- Advanced Surface Polishing Techniques 10
- Nanofabrication and Lithography Techniques 8

Co-authors: Nihar Mohanty (12 shared papers)Richard A. Farrell (13 shared papers)Mark Somervell (4 shared papers)Jeffrey Smith (6 shared papers)Andrew Metz (8 shared papers)Karen Petrillo (7 shared papers)Kandabara Tapily (3 shared papers)Gerard M. Schmid (2 shared papers)
Journals: Journal of Micro/Nanolithography MEMS and MOEMS (1 paper)Journal of Photopolymer Science and Technology (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (14 papers)SPIE Newsroom (2 papers)
Partner nations: United States Japan Belgium

In The Last Decade

Akiteru Ko

31 papers receiving 142 citations

Peers

Countries citing papers authored by Akiteru Ko

Since Specialization

Citations

This map shows the geographic impact of Akiteru Ko's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Akiteru Ko with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Akiteru Ko more than expected).

Fields of papers citing papers by Akiteru Ko

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Akiteru Ko. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Akiteru Ko. The network helps show where Akiteru Ko may publish in the future.

Co-authors

The 25 scholars most cited alongside Akiteru Ko, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Akiteru Ko Line = papers co-authored together Akiteru Ko links everyone, so they are left out of the graph.

All Works

Sort: Min cites: Since: Top N: Style:

20 of 20 papers shown

Showing the 20 most-cited of 34 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Fabrication of 28nm pitch Si fins with DSA lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Gerard M. Schmid, Richard A. Farrell, Ji Xu, Chanro Park, Moshe E. Preil, Vidhya Chakrapani, Nihar Mohanty, Akiteru Ko, Michael Cicoria, David Hetzer, Mark Somervell, Benjamen M. Rathsack	2013	21
2	Self-aligned quadruple patterning integration using spacer on spacer pitch splitting at the resist level for sub-32nm pitch applications Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Angélique Raley, Sophie Thibaut, Nihar Mohanty, Subhadeep Kal, Satoru Nakamura, Akiteru Ko, David O’Meara, Kandabara Tapily, Steven Consiglio, Peter Biolsi	2016	19
3	Challenges and mitigation strategies for resist trim etch in resist-mandrel based SAQP integration scheme Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Nihar Mohanty, Elliott Franke, Eric Liu, Angélique Raley, Jeffrey Smith, Richard A. Farrell, Mingmei Wang, Kiyohito Ito, Sanjana Das, Akiteru Ko, Kaushik Kumar, Alok Ranjan, David O’Meara, Kenjiro Nawa, Steven Scheer, Anton DeVillers, Peter Biolsi	2015	11
4	EPE improvement thru self-alignment via multi-color material integration Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Nihar Mohanty, Jeffrey Smith, Lior Huli, Cheryl Pereira, Angélique Raley, Subhadeep Kal, Carlos Fonseca, Xinghua Sun, Ryan L. Burns, Richard A. Farrell, David Hetzer, Andrew Metz, Akiteru Ko, Steven Scheer, Peter Biolsi, Anton DeVillers	2017	9
5	DSA patterning options for FinFET formation at 7nm node Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chi‐Chun Liu, Elliott Franke, Fee Li Lie, Stuart Sieg, Hsinyu Tsai, Kafai Lai, Hoa Truong, Richard A. Farrell, Mark Somervell, Daniel P. Sanders, Nelson Felix, Michael Guillorn, Sean Burns, David Hetzer, Akiteru Ko, John Arnold, Matthew Colburn	2016	9
6	Fin formation using graphoepitaxy DSA for FinFET device fabrication Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chi‐Chun Liu, Fee Li Lie, Vinayak Rastogi, Elliott Franke, Nihar Mohanty, Richard A. Farrell, Hsinyu Tsai, Kafai Lai, Melih Ozlem, Wooyong Cho, Sung Gon Jung, J. Strane, Mark Somervell, Sean Burns, Nelson Felix, Michael Guillorn, David Hetzer, Akiteru Ko, Matthew Colburn	2015	8
7	Resist process applications to improve EUV patterning Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Karen Petrillo, Kyoungyoung Cho, Alexander Friz, Cecilia Montgomery, Dominic Ashworth, Mark Neisser, Stefan Wurm, Takashi Saitō, Lior Huli, Akiteru Ko, Andrew Metz	2013	8
8	Advances in Low Diffusion EUV Resists Journal of Photopolymer Science and Technology ·James W. Thackeray, James F. Cameron, Michael Wagner, Suzanne M. Coley, Vipu Paul Labeaume, Owndi Ongayi, Warren Montgomery, Dave Lovell, John J. Biafore, Vidhya Chakrapane, Akiteru Ko	2012	7
9	Line width roughness control for EUV patterning Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Karen Petrillo, George Huang, Dominic Ashworth, Liping Ren, K.-Y. Cho, Stefan Wurm, Shinichiro Kawakami, Lior Huli, Shannon Dunn, Akiteru Ko	2012	7
10	Self-aligned blocking integration demonstration for critical sub-40nm pitch Mx level patterning Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Angélique Raley, Nihar Mohanty, Xinghua Sun, Richard A. Farrell, Jeffrey Smith, Akiteru Ko, Andrew Metz, Peter Biolsi, Anton Devilliers	2017	6
11	Dual frequency mid-gap capacitively coupled plasma (m-CCP) for conventional and DSA patterning at 10nm node and beyond Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Nihar Mohanty, Akiteru Ko, C. B. Cole, Vinayak Rastogi, Kaushik Kumar, Gerard M. Schmid, Richard A. Farrell, Todd E. Ryan, Erik R. Hosler, Ji Xu, Moshe E. Preil	2014	6
12	Line roughness improvements on EUV 36nm pitch pattern by plasma treatment method Toshiharu Wada, Chia‐Yun Hsieh, Akiteru Ko, Peter Biolsi	2019	5
13	Self-aligned blocking integration demonstration for critical sub-30-nm pitch Mx level patterning with EUV self-aligned double patterning Journal of Micro/Nanolithography MEMS and MOEMS ·Angélique Raley, Joe Lee, Jeffrey Smith, Xinghua Sun, Richard A. Farrell, Jeffrey C. Shearer, Yongan Xu, Akiteru Ko, Andrew Metz, Peter Biolsi, Anton Devilliers, John Arnold, Nelson Felix	2018	5
14	Advanced multiple patterning technologies for high density hexagonal hole arrays Bae Nayoung, Sophie Thibaut, Toshiharu Wada, Andrew Metz, Akiteru Ko, Peter Biolsi	2021	4
15	Roughness and uniformity improvements on self-aligned quadruple patterning technique for 10nm node and beyond by wafer stress engineering Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Eric Liu, Akiteru Ko, David O’Meara, Nihar Mohanty, Elliott Franke, Karthik V. Pillai, Peter Biolsi	2017	3
16	Coater/developer based techniques to improve high-resolution EUV patterning defectivity Eric Liu, Akiteru Ko, Koichi Hontake, Lior Huli, David Hetzer, Karen Petrillo, Luciana Meli, Nelson Felix, Richard Johnson, Takeshi Shimoaoki, Shinichiro Kawakami, Yongan Xu, Cody Murray, Corey Lemley, Alex Hubbard, Anuja De Silva, Kōichiro Tanaka, Yusaku Hashimoto	2017	3
17	LER improvement for sub-32nm pitch self-aligned quadruple patterning (SAQP) at back end of line (BEOL) Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Nihar Mohanty, Richard A. Farrell, Cheryl Periera, Subhadeep Kal, Elliott Franke, Jeffrey Smith, Akiteru Ko, Anton Devilliers, Peter Biolsi, Lei Sun, Genevieve Beique, Erik R. Hosler, Erik Verdujn, Wenhui Wang, (unknown), Ryoung-Han Kim	2016	3
18	Benchmarking of EUV lithography line/space patterning versus immersion lithography multipatterning schemes at equivalent pitch Angélique Raley, Chris A. Mack, Eric Liu, Sophie Thibaut, Akiteru Ko	2018	3
19	Optimization of low-diffusion EUV resist for linewidth roughness and pattern collapse on various substrates Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·James W. Thackeray, James F. Cameron, Michael Wagner, Suzanne M. Coley, Owendi Ongayi, Warren Montgomery, Dave Lovell, John J. Biafore, Vidhya Chakrapani, Akiteru Ko	2012	3
20	Self-aligned blocking integration demonstration for critical sub-30nm pitch Mx level patterning with EUV self-aligned double patterning Angélique Raley, Joe Lee, Jeffrey Smith, Xinghua Sun, Richard J. Farrell, Jeffrey C. Shearer, Yongan Xu, Akiteru Ko, Andrew Metz, Peter Biolsi, Anton Devilliers, John Arnold, Nelson Felix	2018	3

About Akiteru Ko

Akiteru Ko is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering, Electronic, Optical and Magnetic Materials, Surfaces, Coatings and Films and Mechanics of Materials, having authored 34 papers that have together received 158 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (28 papers), Integrated Circuits and Semiconductor Failure Analysis (10 papers), Copper Interconnects and Reliability (10 papers), Advanced Surface Polishing Techniques (10 papers), Nanofabrication and Lithography Techniques (8 papers), Electron and X-Ray Spectroscopy Techniques (7 papers), 3D IC and TSV technologies (6 papers) and Semiconductor materials and devices (4 papers). The work is most often cited by research in Surfaces, Coatings and Films (35 citations), Electrical and Electronic Engineering (128 citations), Biomedical Engineering (62 citations), Materials Chemistry (52 citations) and Electronic, Optical and Magnetic Materials (12 citations). Akiteru Ko has collaborated with scholars based in United States, Japan and Belgium. Frequent co-authors include Nihar Mohanty, Richard A. Farrell, Mark Somervell, Jeffrey Smith, Andrew Metz, Karen Petrillo, Kandabara Tapily, Gerard M. Schmid, Satoru Nakamura and Vidhya Chakrapani. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Journal of Photopolymer Science and Technology, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE and SPIE Newsroom.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Akiteru Ko

Impact in

Papers in i

In The Last Decade

Akiteru Ko

Peers

Countries citing papers authored by Akiteru Ko

Fields of papers citing papers by Akiteru Ko

All Works

About Akiteru Ko

Explore authors with similar magnitude of impact

Papers in