Chiew-Seng Koay

796 total citations
40 papers, 482 citations indexed

About

Chiew-Seng Koay is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Chiew-Seng Koay has authored 40 papers receiving a total of 482 indexed citations (citations by other indexed papers that have themselves been cited), including 34 papers in Electrical and Electronic Engineering, 16 papers in Surfaces, Coatings and Films and 13 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Chiew-Seng Koay's work include Advancements in Photolithography Techniques (31 papers), Integrated Circuits and Semiconductor Failure Analysis (16 papers) and Electron and X-Ray Spectroscopy Techniques (13 papers). Chiew-Seng Koay is often cited by papers focused on Advancements in Photolithography Techniques (31 papers), Integrated Circuits and Semiconductor Failure Analysis (16 papers) and Electron and X-Ray Spectroscopy Techniques (13 papers). Chiew-Seng Koay collaborates with scholars based in United States, Qatar and Japan. Chiew-Seng Koay's co-authors include Martin Richardson, Christian Keyser, Obert R. Wood, M. C. Richardson, Karen Petrillo, Simi George, Yayi Wei, Thomas I. Wallow, Robert L. Brainard and Warren Montgomery and has published in prestigious journals such as Optics Letters, Journal of International Crisis and Risk Communication Research and Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena.

In The Last Decade

Chiew-Seng Koay

39 papers receiving 442 citations

Peers

Countries citing papers authored by Chiew-Seng Koay

Since Specialization

Citations

This map shows the geographic impact of Chiew-Seng Koay's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Chiew-Seng Koay with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Chiew-Seng Koay more than expected).

Fields of papers citing papers by Chiew-Seng Koay

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Chiew-Seng Koay. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Chiew-Seng Koay. The network helps show where Chiew-Seng Koay may publish in the future.

Co-authorship network of co-authors of Chiew-Seng Koay

This figure shows the co-authorship network connecting the top 25 collaborators of Chiew-Seng Koay. A scholar is included among the top collaborators of Chiew-Seng Koay based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Chiew-Seng Koay. Chiew-Seng Koay is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Assessments of image-based and scatterometry-based overlay targets 2016 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chiew-Seng Koay, Nelson Felix, Bassem Hamieh, Scott Halle, (unknown), Stuart Sieg	1
2	Systematic studies on reactive ion etch-induced deformations of organic underlayers 2011 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Martin Glodde, Sebastian Engelmann, Michael Guillorn, Sivananda Kanakasabapathy, Erin Mclellan, Chiew-Seng Koay, (unknown), M. Sankarapandian, John Arnold, Karen Petrillo, Markus Brink, Hiroyuki Miyazoe, (unknown), (unknown), (unknown), Yayi Wei, (unknown), Pushkara R. Varanasi	18
3	Automated optimized overlay sampling for high-order processing in double patterning lithography 2010 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chiew-Seng Koay, Matthew Colburn, (unknown), John C. Robinson, (unknown), Hiroyuki Kurita, (unknown)	4
4	Evaluation of double-patterning techniques for advanced logic nodes 2010 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chiew-Seng Koay, Steven J. Holmes, Karen Petrillo, Matthew Colburn, Sean Burns, (unknown), (unknown), (unknown), (unknown), (unknown), Aiqin Jiang, (unknown), (unknown), (unknown), (unknown), Martin Rodgers, (unknown), (unknown)	4
5	Flare evaluation of ASML alpha demo tool 2009 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Hiroyuki Mizuno, Gregory McIntyre, Chiew-Seng Koay, Martin Burkhardt, Bruno La Fontaine, Obert R. Wood	8
6	EUVL reticle defectivity evaluation 2009 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Uzodinma Okoroanyanwu, (unknown), Bruno La Fontaine, (unknown), (unknown), (unknown), (unknown), Chiew-Seng Koay, Karen Petrillo, Hiroyuki Mizuno	5
7	Integration of EUV lithography in the fabrication of 22-nm node devices 2009 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Obert R. Wood, Chiew-Seng Koay, Karen Petrillo, Hiroyuki Mizuno, (unknown), John Arnold, (unknown), Martin Burkhardt, Gregory McIntyre, Yunfei Deng, Bruno La Fontaine, Uzodinma Okoroanyanwu, (unknown), Tom Wallow, (unknown), Matthew Colburn, (unknown), Bala S. Haran, (unknown)	40
8	Are extreme ultraviolet resists ready for the 32nm node? 2007 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Karen Petrillo, Yayi Wei, Robert L. Brainard, Gregory Denbeaux, Darı́o L. Goldfarb, Chiew-Seng Koay, (unknown), Warren Montgomery, (unknown), Thomas I. Wallow, Obert R. Wood	5
9	Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas 2007 ·Optics Letters ·Simi George, W. T. Silfvast, (unknown), (unknown), Chiew-Seng Koay, G. Shimkaveg, M. C. Richardson	28
10	Radiation studies of the tin-doped microscopic droplet laser plasma light source specific to EUV lithography 2006 ·Journal of International Crisis and Risk Communication Research ·Chiew-Seng Koay	3
11	EUV generation from lithium laser plasma for lithography 2006 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Simi George, W. T. Silfvast, (unknown), (unknown), Chiew-Seng Koay, (unknown), Martin Richardson, (unknown), H. A. Scott	6
12	EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas 2005 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Simi George, Chiew-Seng Koay, (unknown), (unknown), (unknown), Christian Keyser, Vivek Bakshi, H. A. Scott, Martin Richardson	11
13	Diagnostics for laser plasma EUV sources 2005 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·M. C. Richardson, Chiew-Seng Koay, (unknown), Christian Keyser, (unknown), Simi George, (unknown)	12
14	High-efficiency tin-based EUV sources 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·M. C. Richardson, Chiew-Seng Koay, Christian Keyser, (unknown), Etsuo Fujiwara, (unknown)	9
15	High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography 2004 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Martin Richardson, Chiew-Seng Koay, (unknown), Christian Keyser, (unknown)	71
16	Spectroscopic studies of the Sn-based droplet laser plasma EUV source 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chiew-Seng Koay, (unknown), Etsuo Fujiwara, (unknown), M. C. Richardson	3
17	Laser plasma EUVL sources: progress and challenges 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·M. C. Richardson, Chiew-Seng Koay, (unknown), Christian Keyser, Simi George, (unknown), (unknown), H. A. Scott	12
18	High conversion efficiency limited laser plasma source for EUV lithography 2003 ·Conference on Lasers and Electro-Optics ·Christian Keyser, Chiew-Seng Koay, (unknown), Martin Richardson, (unknown), (unknown)	1
19	High-conversion-efficiency tin material laser-plasma source for EUVL 2003 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chiew-Seng Koay, Christian Keyser, (unknown), Etsuo Fujiwara, (unknown), M. C. Richardson, I. C. E. Turcu, (unknown), A. Douglas Stone, James H. Morris	13
20	Repeller field debris mitigation approach for EUV sources 2003 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Chiew-Seng Koay, M. C. Richardson, I. C. E. Turcu	12

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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