Benjamin Bunday
- Surfaces, Coatings and Films top 0.5%
- Electron and X-Ray Spectroscopy Techniques 58
- Optical Coatings and Gratings 17
- Structural Biology top 5%
-
- Advancements in Photolithography Techniques 76
- Integrated Circuits and Semiconductor Failure Analysis 44
- Computational Mechanics top 5%
- Surface Roughness and Optical Measurements 15
-
- Surface and Thin Film Phenomena 12
-
- Advanced Surface Polishing Techniques 11
-
- Advanced Measurement and Metrology Techniques 10
- Co-authors
- John S. VillarrubiaJohn A. AllgairChris A. MackMichael BishopRavikiran AttotaAndrás VládarVictor VartanianThomas A. Germer
- Journals
- Journal of Micro/Nanolithography MEMS and MOEMS (5 papers)Microscopy and Microanalysis (2 papers)Optics Express (1 paper)
- Partner nations
- United StatesIsraelJapan
In The Last Decade
Benjamin Bunday
96 papers receiving 1.1k citations
Peers
Comparison fields: 5 of 57
- Surfaces, Coatings and Films 634
- Structural Biology 42
- Electrical and Electronic Engineering 922
- Computational Mechanics 215
- Atomic and Molecular Physics, and Optics 284
Countries citing papers authored by Benjamin Bunday
This map shows the geographic impact of Benjamin Bunday's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Benjamin Bunday with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Benjamin Bunday more than expected).
Fields of papers citing papers by Benjamin Bunday
This network shows the impact of papers produced by Benjamin Bunday. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Benjamin Bunday. The network helps show where Benjamin Bunday may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Benjamin Bunday, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2022 | 1 | |
| 2 | 2021 | 3 | |
| 3 | 2018 | 15 | |
| 4 | 2017 | 9 | |
| 5 | 2016 | 5 | |
| 6 | 2015 | 19 | |
| 7 | 2015 | 21 | |
| 8 | 2015 | 3 | |
| 9 | 2015 | 10 | |
| 10 | 2011 | 22 | |
| 11 | 2011 | 7 | |
| 12 | 2010 | 20 | |
| 13 | Phenomenology of ArF photoresist shrinkage trends | 2008 | 1 |
| 14 | 2008 | 5 | |
| 15 | 2008 | 2 | |
| 16 | 2007 | 6 | |
| 17 | 2007 | 6 | |
| 18 | 2006 | 4 | |
| 19 | 2004 | 64 | |
| 20 | 2003 | 21 |
About Benjamin Bunday
Benjamin Bunday is a scholar working on Surfaces, Coatings and Films, Structural Biology, Electrical and Electronic Engineering, Industrial and Manufacturing Engineering and Computational Mechanics, having authored 102 papers that have together received 1.3k indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (76 papers), Electron and X-Ray Spectroscopy Techniques (58 papers), Integrated Circuits and Semiconductor Failure Analysis (44 papers), Optical Coatings and Gratings (17 papers), Surface Roughness and Optical Measurements (15 papers), Surface and Thin Film Phenomena (12 papers), Advanced Surface Polishing Techniques (11 papers) and Advanced Measurement and Metrology Techniques (10 papers). The work is most often cited by research in Surfaces, Coatings and Films (634 citations), Structural Biology (42 citations), Electrical and Electronic Engineering (922 citations), Computational Mechanics (215 citations) and Atomic and Molecular Physics, and Optics (284 citations). Benjamin Bunday has collaborated with scholars based in United States, Israel and Japan. Frequent co-authors include John S. Villarrubia, John A. Allgair, Chris A. Mack, Michael Bishop, Ravikiran Attota, András Vládar, Victor Vartanian, Thomas A. Germer, Ronald G. Dixson and Ndubuisi G. Orji. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Microscopy and Microanalysis, Optics Express, IEEE Transactions on Semiconductor Manufacturing and Applied Physics Letters.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.