Wayne M. Moreau

1.2k total citations
38 papers, 793 citations indexed

About

Wayne M. Moreau is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Wayne M. Moreau has authored 38 papers receiving a total of 793 indexed citations (citations by other indexed papers that have themselves been cited), including 35 papers in Electrical and Electronic Engineering, 15 papers in Biomedical Engineering and 10 papers in Surfaces, Coatings and Films. Recurrent topics in Wayne M. Moreau's work include Advancements in Photolithography Techniques (33 papers), Nanofabrication and Lithography Techniques (10 papers) and Electron and X-Ray Spectroscopy Techniques (9 papers). Wayne M. Moreau is often cited by papers focused on Advancements in Photolithography Techniques (33 papers), Nanofabrication and Lithography Techniques (10 papers) and Electron and X-Ray Spectroscopy Techniques (9 papers). Wayne M. Moreau collaborates with scholars based in United States. Wayne M. Moreau's co-authors include Marie Angelopoulos, Darı́o L. Goldfarb, Paul F. Nealey, Juan Pablo, John P. Simons, Karl Weiss, Edward Gipstein, David R. Medeiros, Karen Petrillo and Wu‐Song Huang and has published in prestigious journals such as Nature, Journal of the American Chemical Society and Journal of The Electrochemical Society.

In The Last Decade

Wayne M. Moreau

38 papers receiving 743 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Wayne M. Moreau United States 11 459 354 151 138 104 38 793
Y. Ohnishi Japan 13 539 1.2× 348 1.0× 157 1.0× 125 0.9× 92 0.9× 25 763
Darı́o L. Goldfarb United States 20 732 1.6× 440 1.2× 225 1.5× 299 2.2× 73 0.7× 82 1.1k
L. F. Thompson United States 20 732 1.6× 367 1.0× 317 2.1× 312 2.3× 187 1.8× 49 1.3k
M. Keil Germany 12 547 1.2× 425 1.2× 241 1.6× 84 0.6× 98 0.9× 23 966
J. L. Taraci United States 9 518 1.1× 360 1.0× 256 1.7× 142 1.0× 33 0.3× 11 779
Frédéric S. Diana United States 6 483 1.1× 451 1.3× 387 2.6× 100 0.7× 55 0.5× 8 949
Chin-Shown Sheen United States 11 710 1.5× 364 1.0× 305 2.0× 105 0.8× 19 0.2× 25 873
Robert J. Visser Netherlands 18 496 1.1× 88 0.2× 245 1.6× 40 0.3× 172 1.7× 53 901
Elaine R. Chan United States 11 143 0.3× 277 0.8× 391 2.6× 91 0.7× 187 1.8× 18 735
Kalaichelvi Saravanamuttu Canada 16 167 0.4× 174 0.5× 173 1.1× 76 0.6× 90 0.9× 47 640

Countries citing papers authored by Wayne M. Moreau

Since Specialization
Citations

This map shows the geographic impact of Wayne M. Moreau's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Wayne M. Moreau with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Wayne M. Moreau more than expected).

Fields of papers citing papers by Wayne M. Moreau

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Wayne M. Moreau. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Wayne M. Moreau. The network helps show where Wayne M. Moreau may publish in the future.

Co-authorship network of co-authors of Wayne M. Moreau

This figure shows the co-authorship network connecting the top 25 collaborators of Wayne M. Moreau. A scholar is included among the top collaborators of Wayne M. Moreau based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Wayne M. Moreau. Wayne M. Moreau is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Petrillo, Karen, David R. Medeiros, J. J. Bucchignano, et al.. (2002). Enhancement of KRS-XE for 50 keV Advanced Mask Making Applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4889. 607–607. 1 indexed citations
2.
Medeiros, David R., Karen Petrillo, Gregory Breyta, Wu‐Song Huang, & Wayne M. Moreau. (2002). Sensitivity factors of CAR electron-beam resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4690. 442–442. 1 indexed citations
3.
Medeiros, David R., Ari Aviram, C. R. Guarnieri, et al.. (2001). Recent progress in electron-beam resists for advanced mask-making. IBM Journal of Research and Development. 45(5). 639–650. 27 indexed citations
4.
Medeiros, David R., Wayne M. Moreau, Karen Petrillo, et al.. (2001). High resolution patterning in chemically amplified resists: the effect of film thickness. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4345. 241–241. 12 indexed citations
5.
Simons, John P., Darı́o L. Goldfarb, Marie Angelopoulos, et al.. (2001). Image collapse issues in photoresist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4345. 19–19. 21 indexed citations
6.
Moreau, Wayne M., et al.. (2000). Defect printing issues with high-contrast chemically amplified resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 136–136. 1 indexed citations
7.
Huang, Wu‐Song, et al.. (2000). Acid amplifiers: proton transfer or direct acid formation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 591–591. 2 indexed citations
8.
Goldfarb, Darı́o L., Juan Pablo, Paul F. Nealey, et al.. (2000). Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 3313–3317. 98 indexed citations
9.
Huang, Wu‐Song, et al.. (1999). A New High Performance CA Resist for E-beam Lithography. MRS Proceedings. 584. 1 indexed citations
10.
Huang, Wu‐Song, et al.. (1998). High-contrast positive resists for e-beam mask making. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3546. 400–400. 1 indexed citations
11.
Moreau, Wayne M., et al.. (1997). Fluorescence detection of photoacid in chemically amplified resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3049. 879–879. 4 indexed citations
12.
Conley, Will, et al.. (1995). <title>New positive-tone deep-UV photoresist based on poly(4-hydroxystyrene) and an acid labile protecting group</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2438. 125–142. 1 indexed citations
13.
Moreau, Wayne M., et al.. (1995). <title>Shot-size reduction of photoresist formulations</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2438. 646–658. 2 indexed citations
14.
Moreau, Wayne M., et al.. (1994). Design of a bottom antireflective layer for optical lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2195. 422–422. 7 indexed citations
15.
Lynch, Thomas J., et al.. (1994). Properties and performance of near-UV reflectivity control layers (RCL). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2195. 225–225. 2 indexed citations
16.
Sachdev, Harbans S., et al.. (1991). Ultrasensitive chemically amplified resist systems. Microelectronic Engineering. 13(1-4). 19–22. 4 indexed citations
17.
Conley, Will, et al.. (1990). Negative tone aqueous developable resist for photon, electron, and x-ray lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1262. 49–49. 3 indexed citations
18.
Petrillo, Karen, et al.. (1988). Contrast and sensitivity enhancement of resists for high-resolution lithography. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(6). 2238–2244. 4 indexed citations
19.
Moreau, Wayne M.. (1982). <title>State Of The Art Of Acrylate Resists: An Overview Of Polymer Structure And Lithographic Performance</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 333. 2–7. 2 indexed citations
20.
Gipstein, Edward, et al.. (1976). Poly(Methyl Methacrylate‐Isobutylene) Copolymers as Highly Sensitive Electron Beam Resists. Journal of The Electrochemical Society. 123(7). 1105–1109. 10 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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