Marcel Lux

554 citations

40 papers · 400 indexed · h-index 11

Impact in

Electronic, Optical and Magnetic Materials
- Copper Interconnects and Reliability
Surfaces, Coatings and Films

Papers in ⓘ

Electrical and Electronic Engineering 26
- Semiconductor materials and devices 22
- Advancements in Photolithography Techniques 6
- Integrated Circuits and Semiconductor Failure Analysis 4
- Silicon and Solar Cell Technologies 3
Electronic, Optical and Magnetic Materials 17
- Copper Interconnects and Reliability 17

Co-authors: Guy Vereecke (23 shared papers)Martin Klußmann (2 shared papers)Quoc Toan Le (18 shared papers)Paul Mertens (18 shared papers)Rita Vos (16 shared papers)Martine Claes (6 shared papers)Marius Peters (1 shared paper)Hassan Osseili (1 shared paper)
Journals: Microelectronic Engineering (4 papers)Journal of The Electrochemical Society (2 papers)Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena (12 papers)Organic Chemistry Frontiers (1 paper)Japanese Journal of Applied Physics (1 paper)
Partner nations: Belgium United States Germany

In The Last Decade

Marcel Lux

37 papers receiving 384 citations

Peers

Countries citing papers authored by Marcel Lux

Since Specialization

Citations

This map shows the geographic impact of Marcel Lux's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Marcel Lux with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Marcel Lux more than expected).

Fields of papers citing papers by Marcel Lux

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Marcel Lux. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Marcel Lux. The network helps show where Marcel Lux may publish in the future.

Co-authors

The 25 scholars most cited alongside Marcel Lux, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Marcel Lux Line = papers co-authored together Marcel Lux links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 40 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Synthesis and Reactivity of Palladium Complexes Featuring a Diphosphinoborane Ligand Organometallics ·Tobias Schindler, Marcel Lux, Marius Peters, Lennart T. Scharf, Hassan Osseili, Laurent Maron, Michael E. Tauchert	2015	60
2	WS<inf>2</inf> transistors on 300 mm wafers with BEOL compatibility T. Schram, Quentin Smets, Benjamin Groven, Markus Heyne, E. Kunnen, Arame Thiam, K. Devriendt, Annelies Delabie, Dennis Lin, Marcel Lux, Daniele Chiappe, Inge Asselberghs, S. Brus, Cedric Huyghebaert, Şafak Sayan, A. Juncker, Matty Caymax, Iuliana Radu	2017	39
3	Additions of Aldehyde-Derived Radicals and Nucleophilic N-Alkylindoles to Styrenes by Photoredox Catalysis Organic Letters ·Marcel Lux, Martin Klußmann	2020	31
4	Evaluation of Megasonic Cleaning for Sub-90nm Technologies Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·Guy Vereecke, Frank Holsteyns, Sophia Arnauts, S. Beckx, Patrick Jaenen, Karine Kenis, Marjorie Lismont, Marcel Lux, Rita Vos, James Snow, Paul Mertens	2005	27
5	Removal of Submicrometer Particles from Silicon Wafer Surfaces Using HF-Based Cleaning Mixtures Journal of The Electrochemical Society ·Rita Vos, Marcel Lux, Kai Xu, Wim Fyen, Conny Kenens, Thierry Conard, Paul Mertens, M. Heyns, Z Hatcher, Mark Hoffman	2001	27
6	Removal of post-etch photoresist and sidewall residues using organic solvent and additive combined with physical forces Microelectronic Engineering ·Quoc Toan Le, Martine Claes, Thierry Conard, E. Kesters, Marcel Lux, Guy Vereecke	2008	26
7	A Novel Resist and Post-Etch Residue Removal Process Using Ozonated Chemistry Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·Stefan De Gendt, Preston T. Snee, Ingrid Cornelissen, Marcel Lux, Rita Vos, Paul Mertens, D. Martin Knotter, M. Meuris, Marc Heyns	1998	21
8	Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·Kai Xu, Rita Vos, Guy Vereecke, Marcel Lux, Wim Fyen, Frank Holsteyns, Karine Kenis, Paul Mertens, Marc Heyns, Chris Vinckier	2003	20
9	Radical addition of ketones and cyanide to olefinsviaacid catalyzed formation of intermediate alkenyl peroxides Organic Chemistry Frontiers ·Wen Shao, Marcel Lux, Martin Breugst, Martin Klußmann	2019	14
10	Chemical and structural modifications in a 193-nm photoresist after low-k dry etch Thin Solid Films ·E. Kesters, Mónica Claes, Quoc Toan Le, Marcel Lux, Alexis Franquet, Guy Vereecke, Paul Mertens, Martin M. Frank, Robert Carleer, Peter Adriaensens, J.J. Biebuyk, S. Bebelman	2008	13
11	All-Wet Strip Approaches for Post-Etch Photoresist Layers After Low-K Patterning ECS Transactions ·Martine Claes, Quoc Toan Le, Els Kesters, Marcel Lux, Ariana Urionabarrenetxea, Guy Vereecke, P. Mertens, Robert Carleer, Peter Adriaensens	2007	12
12	Alternative Photoresist Removal Process to Minimize Damage of Low-k Material Induced by Ash Plasma Japanese Journal of Applied Physics ·Quoc Toan Le, Johan Keldermans, Nicolò Chiodarelli, Els Kesters, Marcel Lux, Martine Claes, Guy Vereecke	2008	10
13	Post Ion-Implant Photoresist Removal via Wet Chemical Cleans Combined with Physical Force Pretreatments ECS Transactions ·George G. Totir, Martin M. Frank, Rita Vos, Sophia Arnauts, Twan Bearda, Karine Kenis, Martine Delande, Quoc Toan Le, Els Kesters, Guy Vereecke, G. Mannaert, Marcel Lux, I. Hoflijk, Thierry Conard, Souvik Banerjee, Stéphane Malhouitre, Leonardus H. A. Leunissen, P. Mertens	2007	10
14	Implementation of the IMEC-Clean in advanced CMOS manufacturing Marc Meuris, Sophia Arnauts, Ingrid Cornelissen, Karine Kenis, Marcel Lux, S. DeGendt, Paul Mertens, Ivo Teerlinck, Rita Vos, Lee M. Loewenstein, Marc Heyns, K. Wolke	2003	10
15	Selection of ESH solvents for the wet removal of post-etch photoresists in low-k dielectrics integration Microelectronic Engineering ·E. Kesters, M. Claes, Quoc Toan Le, K. Barthomeuf, Marcel Lux, Guy Vereecke, John Durkee	2008	9
16	Removal of post-etch 193nm photoresist in porous low-k dielectric patterning using UV irradiation and ozonated water Microelectronic Engineering ·E. Kesters, Quoc Toan Le, Marcel Lux, Lutz Prager, Guy Vereecke	2009	9
17	BEOL compatible WS2 transistors fully fabricated in a 300 mm pilot line T. Schram, Quentin Smets, Markus Heyne, B. Graven, E. Kunnen, Arame Thiam, K. Devriendt, Annelies Delabie, Dennis Lin, Daniele Chiappe, Inge Asselberghs, Marcel Lux, S. Brus, Cedric Huyghebaert, Şafak Sayan, A. Juncker, Matty Caymax, Iuliana Radu	2017	7
18	Modification of Photoresist by UV for Post-Etch Wet Strip Applications Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·Quoc Toan Le, Els Kesters, Lutz Prager, Martine Claes, Marcel Lux, Guy Vereecke	2009	6
19	Improved Phosphoric Acid Mixtures for Nitride Strip Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·Rita Vos, Marcel Lux, Thierry Conard, H. De Witte, Paul Mertens, Marc Heyns, Z Hatcher	2001	4
20	Photoresist Characterization and Wet Strip after Low-k Dry Etch Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·Martine Claes, Quoc Toan Le, Johan Keldermans, Els Kesters, Marcel Lux, Alexis Franquet, Guy Vereecke, Paul Mertens, Martin M. Frank, Robert Carleer, Peter Adriaensens, Dirk Vanderzande	2007	4

About Marcel Lux

Marcel Lux is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Biomedical Engineering, Materials Chemistry and Mechanics of Materials, having authored 40 papers that have together received 400 indexed citations. Recurring topics across this work include Semiconductor materials and devices (22 papers), Copper Interconnects and Reliability (17 papers), Advancements in Photolithography Techniques (6 papers), Integrated Circuits and Semiconductor Failure Analysis (4 papers), Metal and Thin Film Mechanics (3 papers), Advanced Surface Polishing Techniques (3 papers), Silicon and Solar Cell Technologies (3 papers) and Recycling and Waste Management Techniques (2 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (74 citations), Surfaces, Coatings and Films (26 citations), Electrical and Electronic Engineering (204 citations), Inorganic Chemistry (49 citations) and Organic Chemistry (100 citations). Marcel Lux has collaborated with scholars based in Belgium, United States and Germany. Frequent co-authors include Guy Vereecke, Martin Klußmann, Quoc Toan Le, Paul Mertens, Rita Vos, Martine Claes, Marius Peters, Hassan Osseili, Laurent Maron and Michael E. Tauchert. Their work appears in journals such as Microelectronic Engineering, Journal of The Electrochemical Society, Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena, Organic Chemistry Frontiers and Japanese Journal of Applied Physics.

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