Marcel Lux

554 total citations
40 papers, 400 citations indexed

About

Marcel Lux is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Biomedical Engineering. According to data from OpenAlex, Marcel Lux has authored 40 papers receiving a total of 400 indexed citations (citations by other indexed papers that have themselves been cited), including 26 papers in Electrical and Electronic Engineering, 17 papers in Electronic, Optical and Magnetic Materials and 6 papers in Biomedical Engineering. Recurrent topics in Marcel Lux's work include Semiconductor materials and devices (22 papers), Copper Interconnects and Reliability (17 papers) and Advancements in Photolithography Techniques (6 papers). Marcel Lux is often cited by papers focused on Semiconductor materials and devices (22 papers), Copper Interconnects and Reliability (17 papers) and Advancements in Photolithography Techniques (6 papers). Marcel Lux collaborates with scholars based in Belgium, United States and Germany. Marcel Lux's co-authors include Guy Vereecke, Martin Klußmann, Quoc Toan Le, Paul Mertens, Rita Vos, Martine Claes, Lennart T. Scharf, Marius Peters, Michael E. Tauchert and Laurent Maron and has published in prestigious journals such as Journal of The Electrochemical Society, Organic Letters and Thin Solid Films.

In The Last Decade

Marcel Lux

37 papers receiving 384 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Marcel Lux Belgium 11 204 115 100 93 74 40 400
Liangliang Cheng China 14 171 0.8× 123 1.1× 132 1.3× 71 0.8× 54 0.7× 32 471
Dongxin Liu China 12 102 0.5× 177 1.5× 103 1.0× 29 0.3× 37 0.5× 30 391
Zhiheng Wang China 12 91 0.4× 231 2.0× 60 0.6× 72 0.8× 28 0.4× 36 377
Min Tan China 11 316 1.5× 255 2.2× 73 0.7× 55 0.6× 126 1.7× 37 627
Toshitaka Nakamura Japan 8 236 1.2× 213 1.9× 44 0.4× 55 0.6× 25 0.3× 9 418
Che‐Min Chou Taiwan 11 78 0.4× 123 1.1× 53 0.5× 96 1.0× 32 0.4× 25 376
Yongyi Gao China 12 132 0.6× 212 1.8× 76 0.8× 98 1.1× 97 1.3× 44 409
J. M. Kometani United States 15 169 0.8× 210 1.8× 109 1.1× 378 4.1× 26 0.4× 47 675
Saadat Sulaimankulova Kyrgyzstan 10 131 0.6× 219 1.9× 38 0.4× 111 1.2× 54 0.7× 18 356
Jianyu Fu China 9 262 1.3× 238 2.1× 30 0.3× 79 0.8× 38 0.5× 24 584

Countries citing papers authored by Marcel Lux

Since Specialization
Citations

This map shows the geographic impact of Marcel Lux's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Marcel Lux with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Marcel Lux more than expected).

Fields of papers citing papers by Marcel Lux

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Marcel Lux. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Marcel Lux. The network helps show where Marcel Lux may publish in the future.

Co-authorship network of co-authors of Marcel Lux

This figure shows the co-authorship network connecting the top 25 collaborators of Marcel Lux. A scholar is included among the top collaborators of Marcel Lux based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Marcel Lux. Marcel Lux is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Lux, Marcel & Martin Klußmann. (2020). Additions of Aldehyde-Derived Radicals and Nucleophilic N-Alkylindoles to Styrenes by Photoredox Catalysis. Organic Letters. 22(9). 3697–3701. 31 indexed citations
2.
Shao, Wen, Marcel Lux, Martin Breugst, & Martin Klußmann. (2019). Radical addition of ketones and cyanide to olefinsviaacid catalyzed formation of intermediate alkenyl peroxides. Organic Chemistry Frontiers. 6(11). 1796–1800. 14 indexed citations
3.
Vereecke, Guy, Quoc Toan Le, Marcel Lux, et al.. (2012). An environment friendly wet strip process for 193nm lithography patterning in BEOL applications. Microelectronic Engineering. 105. 119–123. 2 indexed citations
4.
Le, Quoc Toan, et al.. (2009). Influence of UV Irradiation on the Removal of Post-etch Photoresist in Porous Low-k Dielectric Patterning. ECS Transactions. 25(5). 63–70. 3 indexed citations
5.
Le, Quoc Toan, et al.. (2009). Removal of Photoresist and BARC in Cu BEOL using an All-wet Process. ECS Transactions. 25(5). 173–178. 2 indexed citations
6.
Le, Quoc Toan, et al.. (2009). Modification of Photoresist by UV for Post-Etch Wet Strip Applications. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 145-146. 323–326. 6 indexed citations
7.
Le, Quoc Toan, et al.. (2008). Alternative Photoresist Removal Process to Minimize Damage of Low-k Material Induced by Ash Plasma. Japanese Journal of Applied Physics. 47(8S2). 6870–6870. 10 indexed citations
8.
Le, Quoc Toan, et al.. (2008). Removal of post-etch photoresist and sidewall residues using organic solvent and additive combined with physical forces. Microelectronic Engineering. 86(2). 181–185. 26 indexed citations
9.
Le, Quoc Toan, et al.. (2008). Selection of ESH solvents for the wet removal of post-etch photoresists in low-k dielectrics integration. Microelectronic Engineering. 86(2). 160–164. 9 indexed citations
10.
Sioncke, Sonja, Marcel Lux, Wim Fyen, et al.. (2007). Particle Deposition and Removal from Ge Wafers. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 134. 173–176. 2 indexed citations
11.
Frank, Martin M., Rita Vos, Sophia Arnauts, et al.. (2007). Post Ion-Implant Photoresist Removal via Wet Chemical Cleans Combined with Physical Force Pretreatments. ECS Transactions. 11(2). 219–226. 10 indexed citations
12.
Vereecke, Guy, Quoc Toan Le, Marcel Lux, et al.. (2007). Modifications of Porous Low-k by Plasma Treatments and Wet Cleans. ECS Transactions. 11(2). 409–416.
13.
Vereecke, Guy, Frank Holsteyns, Marcel Lux, et al.. (2004). Evaluation of megasonic cleaning systems for particle removal efficiency and damaging. 145–152. 2 indexed citations
14.
Meuris, Marc, Sophia Arnauts, Karine Kenis, et al.. (2003). Implementation of the IMEC-Clean in advanced CMOS manufacturing. 99 1. 157–160. 10 indexed citations
15.
Gendt, Stefan De, Preston T. Snee, Marcel Lux, et al.. (2002). A novel resist and post-etch residue removal process using ozonated chemistries. 168–169. 3 indexed citations
16.
Vos, Rita, Bernd O. Kolbesen, Marcel Lux, et al.. (2001). Single Chemistry Cleaning Solution for Advanced Wafer Cleaning. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 76-77. 119–122. 1 indexed citations
17.
Vos, Rita, Kai Xu, Marcel Lux, et al.. (2001). Use of Surfactants for Improved Particle Performance of dHF-Based Cleaning Recipes. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 76-77. 263–266. 2 indexed citations
18.
Vos, Rita, Marcel Lux, Thierry Conard, et al.. (2001). Improved Phosphoric Acid Mixtures for Nitride Strip. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 76-77. 43–46. 4 indexed citations
19.
Meuris, Marc, Sophia Arnauts, Karine Kenis, et al.. (2000). The IMEC Clean: implementation in advanced CMOS manufacturing. 11. 295–299. 3 indexed citations
20.
Gendt, Stefan De, Preston T. Snee, Marcel Lux, et al.. (1998). A Novel Resist and Post-Etch Residue Removal Process Using Ozonated Chemistry. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 65-66. 165–168. 21 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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