M. Bonvalot

492 total citations
24 papers, 398 citations indexed

About

M. Bonvalot is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Mechanics of Materials. According to data from OpenAlex, M. Bonvalot has authored 24 papers receiving a total of 398 indexed citations (citations by other indexed papers that have themselves been cited), including 20 papers in Electrical and Electronic Engineering, 11 papers in Materials Chemistry and 7 papers in Mechanics of Materials. Recurrent topics in M. Bonvalot's work include Semiconductor materials and devices (19 papers), Ferroelectric and Negative Capacitance Devices (6 papers) and Metal and Thin Film Mechanics (6 papers). M. Bonvalot is often cited by papers focused on Semiconductor materials and devices (19 papers), Ferroelectric and Negative Capacitance Devices (6 papers) and Metal and Thin Film Mechanics (6 papers). M. Bonvalot collaborates with scholars based in France, Japan and United States. M. Bonvalot's co-authors include C. Vallée, O. Joubert, Christophe Durand, C. Dubourdieu, Hervé Roussel, V. Loup, L. Vallier, D. Fuard, O. Renault and P. Gonon and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Chemistry of Materials.

In The Last Decade

M. Bonvalot

24 papers receiving 390 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
M. Bonvalot France 12 326 197 90 44 29 24 398
Karsten Arts Netherlands 12 488 1.5× 366 1.9× 67 0.7× 89 2.0× 36 1.2× 16 562
M. Gros‐Jean France 15 417 1.3× 200 1.0× 76 0.8× 42 1.0× 52 1.8× 44 492
E. Çetinörgü Israel 15 369 1.1× 389 2.0× 55 0.6× 38 0.9× 37 1.3× 19 462
Yasushi Nakasaki Japan 12 465 1.4× 161 0.8× 182 2.0× 93 2.1× 39 1.3× 44 530
Si Kyung Choi South Korea 10 254 0.8× 218 1.1× 62 0.7× 34 0.8× 58 2.0× 19 433
Shuwei Fan China 12 233 0.7× 280 1.4× 57 0.6× 82 1.9× 83 2.9× 34 347
Grazia Litrico Italy 11 323 1.0× 104 0.5× 80 0.9× 24 0.5× 37 1.3× 41 384
А. А. Лотин Russia 12 204 0.6× 258 1.3× 79 0.9× 32 0.7× 43 1.5× 62 349
R. Saia United States 11 314 1.0× 83 0.4× 85 0.9× 33 0.8× 49 1.7× 38 377
J. Schaeffer United States 13 595 1.8× 189 1.0× 69 0.8× 63 1.4× 20 0.7× 32 628

Countries citing papers authored by M. Bonvalot

Since Specialization
Citations

This map shows the geographic impact of M. Bonvalot's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M. Bonvalot with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M. Bonvalot more than expected).

Fields of papers citing papers by M. Bonvalot

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by M. Bonvalot. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M. Bonvalot. The network helps show where M. Bonvalot may publish in the future.

Co-authorship network of co-authors of M. Bonvalot

This figure shows the co-authorship network connecting the top 25 collaborators of M. Bonvalot. A scholar is included among the top collaborators of M. Bonvalot based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with M. Bonvalot. M. Bonvalot is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Tran, Duc, C. Mannequin, M. Bonvalot, et al.. (2024). Thermal catalytic etching of diamond by double-metal layers. Diamond and Related Materials. 145. 111075–111075. 2 indexed citations
2.
Kim, Youngjin, et al.. (2021). An Empirical Investigation on the Effect of Oxygen Vacancy in ZrO2 Thin Film on the Frequency-Dependent Capacitance Degradation in the Metal–Insulator–Metal Capacitor. IEEE Transactions on Electron Devices. 68(11). 5753–5757. 12 indexed citations
3.
Bonvalot, M., C. Vallée, C. Mannequin, et al.. (2021). Area selective deposition using alternate deposition and etch super-cycle strategies. Dalton Transactions. 51(2). 442–450. 14 indexed citations
4.
Gassilloud, R., et al.. (2021). Topographical selective deposition: A comparison between plasma-enhanced atomic layer deposition/sputtering and plasma-enhanced atomic layer deposition/quasi-atomic layer etching approaches. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 39(3). 3 indexed citations
5.
Vallée, C., M. Bonvalot, Sylvain David, et al.. (2020). Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 38(3). 44 indexed citations
6.
Nguyễn, Việt Hương, Abderrahime Sekkat, César Masse de La Huerta, et al.. (2020). Atmospheric Plasma-Enhanced Spatial Chemical Vapor Deposition of SiO2 Using Trivinylmethoxysilane and Oxygen Plasma. Chemistry of Materials. 32(12). 5153–5161. 24 indexed citations
7.
Vallée, C., et al.. (2020). Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 39(1). 7 indexed citations
8.
Grenouillet, L., et al.. (2020). TiN/Gd:HfO2/TiN capacitors grown by PEALD showing high endurance ferroelectric switching. Applied Physics Letters. 117(25). 11 indexed citations
9.
Bonvalot, M., et al.. (2019). Impact of roughness of TiN bottom electrode on the forming voltage of HfO2 based resistive memories. Microelectronic Engineering. 221. 111194–111194. 9 indexed citations
10.
Vallée, C., P. Gonon, C. Mannequin, et al.. (2011). Plasma treatment of HfO2-based metal–insulator–metal resistive memories. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 29(4). 9 indexed citations
11.
Bonvalot, M., et al.. (2010). Combined spectroscopic ellipsometry and attenuated total reflection analyses of Al2O3/HfO2 nanolaminates. Thin Solid Films. 518(18). 5057–5060. 5 indexed citations
12.
Jorel, Corentin, C. Vallée, E. Gourvest, et al.. (2009). Physicochemical and electrical characterizations of atomic layer deposition grown HfO2 on TiN and Pt for metal-insulator-metal application. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 27(1). 378–383. 33 indexed citations
13.
Vallée, C., et al.. (2007). Improved electrical properties using SrTiO3/Y2O3 bilayer dielectrics for MIM capacitor applications. Microelectronics Reliability. 47(4-5). 773–776. 21 indexed citations
14.
Durand, Christophe, C. Vallée, V. Loup, et al.. (2004). Metal–insulator–metal capacitors using Y2O3 dielectric grown by pulsed-injection plasma enhanced metalorganic chemical vapor deposition. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 22(3). 655–660. 28 indexed citations
15.
Durand, Christophe, C. Vallée, C. Dubourdieu, et al.. (2003). Silicate interface formation during the deposition of Y2O3 on Si. MRS Proceedings. 786. 1 indexed citations
16.
Fuard, D., O. Joubert, L. Vallier, & M. Bonvalot. (2001). High density plasma etching of low k dielectric polymers in oxygen-based chemistries. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(2). 447–455. 30 indexed citations
17.
Bonvalot, M., et al.. (1999). Thin gate oxide behavior during plasma patterning of silicon gates. Applied Physics Letters. 75(8). 1069–1070. 21 indexed citations
18.
Bonvalot, M., P. Courtois, Pascale Gillon, & R. Tournier. (1995). Magnetic levitation stabilized by eddy currents. Journal of Magnetism and Magnetic Materials. 151(1-2). 283–289. 14 indexed citations
19.
Bonvalot, M., et al.. (1992). Low-field microwave absorption of the Nd1.85Ce0.15CuO4–ysuperconducting system. Journal of the Chemical Society Faraday Transactions. 88(16). 2387–2392. 2 indexed citations
20.
Kulik, J., Y. Y. Xue, Yanyi Sun, & M. Bonvalot. (1990). An electron diffraction study of Bi2Sr2(GdxCa1−x)0.8Cu2O8+δ. Journal of materials research/Pratt's guide to venture capital sources. 5(8). 1625–1638. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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