B. Pelissier

1.0k citations
37 papers · 842 indexed · h-index 17

Impact in

Papers in

    • Electron and X-Ray Spectroscopy Techniques 5
    • Semiconductor materials and devices 20
    • Plasma Diagnostics and Applications 9
    • Advancements in Photolithography Techniques 7
    • Advancements in Semiconductor Devices and Circuit Design 7
    • Chalcogenide Semiconductor Thin Films 5
    • Integrated Circuits and Semiconductor Failure Analysis 5

B. Pelissier

37 papers receiving 811 citations

Peers

B. Pelissier
Comparison fields: 5 of 51
  • Electrical and Electronic Engineering 661
  • Surfaces, Coatings and Films 68
  • Materials Chemistry 374
  • Biomedical Engineering 243
  • Electronic, Optical and Magnetic Materials 97
Replace Jin–Cherng Hsu with:
Jin–Cherng Hsu Taiwan
H.S. Reehal United Kingdom
J. Elders Netherlands
Young H. Lee United States
W. Pamler Germany
Shin’ichiro Kimura Japan
Thomas Tillocher France
Hiroaki Kakiuchi Japan
N. Rochat France
Yun Cui China
B. Pelissier relative to Jin–Cherng Hsu Taiwan Jin–Cherng Hsu's profile →
Citations per field
00.5×1.5×
Jin–Cherng Hsu · 1×
Citations per year

Countries citing papers authored by B. Pelissier

Since Specialization
Citations

This map shows the geographic impact of B. Pelissier's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by B. Pelissier with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites B. Pelissier more than expected).

Fields of papers citing papers by B. Pelissier

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by B. Pelissier. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by B. Pelissier. The network helps show where B. Pelissier may publish in the future.

Co-authorship network

The 25 scholars most cited alongside B. Pelissier, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with B. Pelissier Line = papers co-authored together B. Pelissier links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1 20251
2 20243
3 20203
4 20196
5 201715
6 201710
7 201710
8 20168
9 201419
10 20115
11 201013
12 200933
13 200932
14 200937
15 200810
16
Cleaning Aluminum Fluoride coatings from plasma reactor walls in SiCl4/Cl2 plasmas
20071
17 200724
18 200744
19 200587
20 200375

About B. Pelissier

B. Pelissier is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Ceramics and Composites, Materials Chemistry and Electronic, Optical and Magnetic Materials, having authored 37 papers that have together received 842 indexed citations. Recurring topics across this work include Semiconductor materials and devices (20 papers), Plasma Diagnostics and Applications (9 papers), Advancements in Photolithography Techniques (7 papers), Advancements in Semiconductor Devices and Circuit Design (7 papers), Chalcogenide Semiconductor Thin Films (5 papers), Electron and X-Ray Spectroscopy Techniques (5 papers), Integrated Circuits and Semiconductor Failure Analysis (5 papers) and Phase-change materials and chalcogenides (4 papers). The work is most often cited by research in Electrical and Electronic Engineering (661 citations), Surfaces, Coatings and Films (68 citations), Materials Chemistry (374 citations), Biomedical Engineering (243 citations) and Electronic, Optical and Magnetic Materials (97 citations). B. Pelissier has collaborated with scholars based in France, United States and Switzerland. Frequent co-authors include O. Joubert, G. Cunge, R. Ramos, A. Beaurain, C. Vallée, T. Baron, M. Zelsmann, J. Boussey, E. Gourvest and N. Sadeghi. Their work appears in journals such as Microelectronic Engineering, Applied Physics Letters, Journal of Physics D Applied Physics, Plasma Sources Science and Technology and Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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