B. Pelissier
Impact in
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- Semiconductor materials and devices
- Plasma Diagnostics and Applications
- Ferroelectric and Negative Capacitance Devices
- Advancements in Photolithography Techniques
- Surfaces, Coatings and Films top 10%
Papers in
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- Electron and X-Ray Spectroscopy Techniques 5
-
- Semiconductor materials and devices 20
- Plasma Diagnostics and Applications 9
- Advancements in Photolithography Techniques 7
- Advancements in Semiconductor Devices and Circuit Design 7
- Chalcogenide Semiconductor Thin Films 5
- Integrated Circuits and Semiconductor Failure Analysis 5
- Journals
- Microelectronic Engineering (10 papers)Applied Physics Letters (3 papers)Journal of Physics D Applied Physics (3 papers)Plasma Sources Science and Technology (2 papers)Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (2 papers)
- Partner nations
- FranceUnited StatesSwitzerland
In The Last Decade
B. Pelissier
37 papers receiving 811 citations
Peers
Comparison fields: 5 of 51
- Electrical and Electronic Engineering 661
- Surfaces, Coatings and Films 68
- Materials Chemistry 374
- Biomedical Engineering 243
- Electronic, Optical and Magnetic Materials 97
Countries citing papers authored by B. Pelissier
This map shows the geographic impact of B. Pelissier's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by B. Pelissier with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites B. Pelissier more than expected).
Fields of papers citing papers by B. Pelissier
This network shows the impact of papers produced by B. Pelissier. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by B. Pelissier. The network helps show where B. Pelissier may publish in the future.
Co-authorship network
The 25 scholars most cited alongside B. Pelissier, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2025 | 1 | |
| 2 | 2024 | 3 | |
| 3 | 2020 | 3 | |
| 4 | 2019 | 6 | |
| 5 | 2017 | 15 | |
| 6 | 2017 | 10 | |
| 7 | 2017 | 10 | |
| 8 | 2016 | 8 | |
| 9 | 2014 | 19 | |
| 10 | 2011 | 5 | |
| 11 | 2010 | 13 | |
| 12 | 2009 | 33 | |
| 13 | 2009 | 32 | |
| 14 | 2009 | 37 | |
| 15 | 2008 | 10 | |
| 16 | Cleaning Aluminum Fluoride coatings from plasma reactor walls in SiCl4/Cl2 plasmas | 2007 | 1 |
| 17 | 2007 | 24 | |
| 18 | 2007 | 44 | |
| 19 | 2005 | 87 | |
| 20 | 2003 | 75 |
About B. Pelissier
B. Pelissier is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Ceramics and Composites, Materials Chemistry and Electronic, Optical and Magnetic Materials, having authored 37 papers that have together received 842 indexed citations. Recurring topics across this work include Semiconductor materials and devices (20 papers), Plasma Diagnostics and Applications (9 papers), Advancements in Photolithography Techniques (7 papers), Advancements in Semiconductor Devices and Circuit Design (7 papers), Chalcogenide Semiconductor Thin Films (5 papers), Electron and X-Ray Spectroscopy Techniques (5 papers), Integrated Circuits and Semiconductor Failure Analysis (5 papers) and Phase-change materials and chalcogenides (4 papers). The work is most often cited by research in Electrical and Electronic Engineering (661 citations), Surfaces, Coatings and Films (68 citations), Materials Chemistry (374 citations), Biomedical Engineering (243 citations) and Electronic, Optical and Magnetic Materials (97 citations). B. Pelissier has collaborated with scholars based in France, United States and Switzerland. Frequent co-authors include O. Joubert, G. Cunge, R. Ramos, A. Beaurain, C. Vallée, T. Baron, M. Zelsmann, J. Boussey, E. Gourvest and N. Sadeghi. Their work appears in journals such as Microelectronic Engineering, Applied Physics Letters, Journal of Physics D Applied Physics, Plasma Sources Science and Technology and Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.