C. Vallée
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- Semiconductor materials and devices 70
- Ferroelectric and Negative Capacitance Devices 32
- Advanced Memory and Neural Computing 31
- Plasma Diagnostics and Applications 14
- Materials Chemistry top 5%
- Electronic and Structural Properties of Oxides 14
- ZnO doping and properties 14
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- Copper Interconnects and Reliability 16
- Surfaces, Coatings and Films top 5%
- Polymers and Plastics top 10%
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- Metal and Thin Film Mechanics 20
C. Vallée
129 papers receiving 2.8k citations
Peers
Comparison fields: 5 of 91
- Electrical and Electronic Engineering 2.1k
- Materials Chemistry 1.5k
- Electronic, Optical and Magnetic Materials 399
- Surfaces, Coatings and Films 127
- Polymers and Plastics 211
Countries citing papers authored by C. Vallée
This map shows the geographic impact of C. Vallée's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Vallée with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Vallée more than expected).
Fields of papers citing papers by C. Vallée
This network shows the impact of papers produced by C. Vallée. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Vallée. The network helps show where C. Vallée may publish in the future.
Co-authorship network
The 25 scholars most cited alongside C. Vallée, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2025 | 0 | |
| 2 | 2024 | 2 | |
| 3 | 2024 | 7 | |
| 4 | 2023 | 3 | |
| 5 | 2023 | 7 | |
| 6 | 2021 | 12 | |
| 7 | 2021 | 17 | |
| 8 | 2020 | 5 | |
| 9 | 2020 | 0 | |
| 10 | Hydrogen passivation of silicon/silicon oxide interface by atomic layer deposited hafnium oxide and impact of silicon oxide underlayer | 2018 | 1 |
| 11 | 2015 | 33 | |
| 12 | 2014 | 9 | |
| 13 | 2011 | 8 | |
| 14 | 2010 | 14 | |
| 15 | 2009 | 19 | |
| 16 | 2009 | 48 | |
| 17 | 2008 | 19 | |
| 18 | 2008 | 12 | |
| 19 | 2007 | 47 | |
| 20 | Existence and construction of bipotentials for graphs of multivalued laws | 2006 | 2 |
About C. Vallée
C. Vallée is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials, having authored 133 papers that have together received 2.9k indexed citations. Recurring topics across this work include Semiconductor materials and devices (70 papers), Ferroelectric and Negative Capacitance Devices (32 papers), Advanced Memory and Neural Computing (31 papers), Metal and Thin Film Mechanics (20 papers), Copper Interconnects and Reliability (16 papers), Electronic and Structural Properties of Oxides (14 papers), Plasma Diagnostics and Applications (14 papers) and ZnO doping and properties (14 papers). The work is most often cited by research in Electrical and Electronic Engineering (2.1k citations), Materials Chemistry (1.5k citations) and Electronic, Optical and Magnetic Materials (399 citations). C. Vallée has collaborated with scholars based in France, Germany and Tunisia. Frequent co-authors include P. Gonon, A. Goullet, A. Granier, G. Turban, Thomas Höhne, F. El Kamel, Pierre Noé, Jean‐Yves Raty, F. Fillot and F. Hippert. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Journal of Applied Physics, Applied Physics Letters, Nuclear Engineering and Design and Thin Solid Films.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.