Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

325.8k citations

16.7k papers · indexed · active since 1950

Electrical and Electronic Engineering top 1%
Materials Chemistry top 1%
Mechanics of Materials top 0.5%
Atomic and Molecular Physics, and Optics top 1%
Biomedical Engineering top 2%

Fields: Surfaces, Coatings and Films (1.9k papers)Electrical and Electronic Engineering (9.3k papers)Mechanics of Materials (3.9k papers)
Topics: Semiconductor materials and devicesMetal and Thin Film MechanicsPlasma Diagnostics and Applications
Top scholars: S. Vepřek John A. Thornton Michael J. Brett H. Holleck G. S. Oehrlein W. M. M. Kessels Lars Hultman Wolf‐Dieter Münz

In The Last Decade

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

16.1k papers receiving 310.4k citations

Peers

Electrical and Electronic Engineering 181.8k
Materials Chemistry 156.0k
Mechanics of Materials 80.4k
Atomic and Molecular Physics, and Optics 78.6k
Biomedical Engineering 43.7k

Replace Applied Physics A with:

Applied Physics A China

Review of Scientific Instruments United States

Journal of Physics D Applied Physics China

Nanotechnology China

Vacuum China

Polymer United States

physica status solidi (b) Germany

Thin Solid Films United States

Journal of Crystal Growth Japan

Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment United States

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films relative to Applied Physics A China Applied Physics A's profile →

Citations per field

00.5×1.6×

Applied Physics A · 1×

×1.2 182k/149k

EEE

×0.9 156k/184k

MC

×1.6 80k/52k

MM

×1.0 79k/78k

AMPO

×0.5 44k/91k

BE

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Countries where authors publish in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Since Specialization

Citations

This map shows the geographic impact of research published in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by papers published in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Journal of Vacuum Science & Technology A Vacuum Surfaces and Films more than expected).

Fields of papers published in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers published in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers published in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

About Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

The 16.7k papers published in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films in the last decades have received a total of 325.8k indexed citations . Papers published in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films usually cover Surfaces, Coatings and Films (1.9k papers), Electrical and Electronic Engineering (9.3k papers) and Mechanics of Materials (3.9k papers) specifically the topics of Semiconductor materials and devices (4.6k papers), Metal and Thin Film Mechanics (3.3k papers) and Plasma Diagnostics and Applications (2.0k papers). The most active scholars publishing in Journal of Vacuum Science & Technology A Vacuum Surfaces and Films are S. Vepřek, John A. Thornton, Michael J. Brett, H. Holleck, G. S. Oehrlein, W. M. M. Kessels, Lars Hultman, Wolf‐Dieter Münz, I. Petrov and Vincent M. Donnelly.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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