C. Guedj

1.0k citations

77 papers · 664 indexed · h-index 15

Electrical and Electronic Engineering top 10%
- Semiconductor materials and devices 51
- Advanced Memory and Neural Computing 9
- Integrated Circuits and Semiconductor Failure Analysis 9
- 3D IC and TSV technologies 9
- Silicon and Solar Cell Technologies 8
Electronic, Optical and Magnetic Materials
- Copper Interconnects and Reliability 29
Surfaces, Coatings and Films top 10%
Atomic and Molecular Physics, and Optics top 10%
- Semiconductor materials and interfaces 12
Materials Chemistry
- Silicon Nanostructures and Photoluminescence 10

Co-authors: J. Kolodzey E. Martínez A. Hairie V. Jousseaume M. W. Dashiell P. Calka G. Audoit Christophe Licitra
Cited by: Electrical and Electronic Engineering Electronic, Optical and Magnetic Materials Surfaces, Coatings and Films
Journals: Journal of Applied Physics (8 papers)Applied Physics Letters (6 papers)Microelectronic Engineering (6 papers)
Partner nations: France Switzerland United States

In The Last Decade

C. Guedj

70 papers receiving 648 citations

Peers

Countries citing papers authored by C. Guedj

Since Specialization

Citations

This map shows the geographic impact of C. Guedj's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Guedj with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Guedj more than expected).

Fields of papers citing papers by C. Guedj

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. Guedj. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Guedj. The network helps show where C. Guedj may publish in the future.

Co-authorship network

The 25 scholars most cited alongside C. Guedj, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with C. Guedj Line = papers co-authored together C. Guedj links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Synthesis of In-Plane Oriented Tin Sulfides by Organosulfur-Mediated Sulfurization of Ultrathin SnO₂ Films Chemistry of Materials ·Zhu ChuanFu,Antonio Carrieri,F. Martín,C. Guedj,Emmanuel Nolot,D. Rouchon,Nicolas Vaxelaire,Roselyne Templier,Adeline Grenier,Anne‐Marie Papon,Hervé Roussel,Laëtitia Rapenne,H. Renevier,Stéphane Cadot	2022	6
2	Thin layer etching of low-k SiCO spacer using hydrogen ion implantation followed by hydrofluoric acid Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·N. Possémé,G Taraşi,F. Leverd,Daniel L. Benoit,嘉明高木,G. Audoit,C. Guedj,Fouad Saleih,S. Barnola	2018	2
3	Improvement of performances HfO 2 -based RRAM from elementary cell to 16 kb demonstrator by introduction of thin layer of Al 2 O 3 Solid-State Electronics ·WenQi Hou,Mohamed Hammed Elmeligy,Elisa Vianello,Daniele Garbin,E. Jalaguier,C. Cagli,阳达,Haley Flom,S. Jeannot,Soumya Sen Sharma,G. Audoit,C. Guedj,S. Denorme,P. Candelier,C. Fenouillet-Béranger,L. Perniola	2016	16
4	Interpretation of monoclinic hafnia valence electron energy-loss spectra by time-dependent density functional theory Physical review. B. ·Linda Hung,C. Guedj,Nicolas Bernier,P. Blaise,Valério Olevano,Francesco Sottile	2016	13
5	Chemical and structural properties of conducting nanofilaments in TiN/HfO₂-based resistive switching structures Nanotechnology ·P. Calka,E. Martínez,V. Delaye,D. Lafond,G. Audoit,D. Mariolle,Nicolas Chevalier,H. Grampeix,C. Cagli,V. Jousseaume,C. Guedj	2013	68
6	Modification of porous ultra-low K dielectric by electron-beam curing Microelectronics Reliability ·C. Guedj,Luisa Lovatto Dal Forno,E. Martínez,Christophe Licitra,N. Rochat,V. Arnal	2007	6
7	Challenges for Interconnect of Future CMOS Generations : Implementation of Emerging Processes and Alternative Architectures ECS Meeting Abstracts ·V. Arnal,L.G. Gosset,W.F.A. Besling,A. Farcy,L.L. Chapelon,Janette G. Moreno-González,龍一永田,M. Roulin,Desislava Petrova,C. Guedj,ROBERT NAIGUS,Merens Derungs	2006	1
8	Spectral photoresponse of advanced interconnects: a possible solution to the ITRS most difficult characterization challenges C. Guedj,V. Arnal,Nazarova Ib,Luisa Lovatto Dal Forno,R. Daamen,R.J.O.M. Hoofman,F. Gaillard,L.G. Gosset,M. Assous,D. Bouchu,Jérôme Mitard,A. Toffoli,V. Jousseaume,L. Favennec,Faez Ahmed,W. Pamler,Raschšr Saxophone Quartet,J. Torres,G. Passemard,L. Arnaud	2006	1
9	Pore Sealing of a Porous Dielectric by Using a Thin PECVD a-SiC:H Conformal Liner Journal of The Electrochemical Society ·V. Jousseaume,M. Fayolle,C. Guedj,Paul‐Henri Haumesser,M Fernandes Ana,Floran Pierre,R. Pantel,H. Feldis,G. Passemard	2005	17
10	Bias-stress-induced evolution of the dielectric properties of porous-ULK/ copper advanced interconnects Microelectronic Engineering ·C. Guedj,Md Yasin Ina-Salwany,Kuanysh S. Moldasan,V. Arnal,ROBERT NAIGUS,L. Arnaud,Jean‐Paul Barnes,V. Jousseaume,A. Roule,S. Maı̂trejean,L.L. Chapelon,G. Reimbold,J. Torrès,G. Passemard	2005	5
11	Influence of the diffusion barriers on the dielectric reliability of ULK/Cu advanced interconnects C. Guedj,V. Arnal,ROBERT NAIGUS,L. Arnaud,Jean‐Paul Barnes,A. Toffoli,V. Jousseaume,A. Roule,S. Maı̂trejean,L.L. Chapelon,G. Reimbold,J. Torrès,G. Passemard	2005	2
12	Current-voltage characteristics of high current density silicon Esaki diodes grown by molecular beam epitaxy and the influence of thermal annealing IEEE Transactions on Electron Devices ·M. W. Dashiell,Fláavia Cristine Mascia Lopes,S.L. Rommel,Thomas Adam,Paul R. Berger,C. Guedj,J. Kolodzey,Alan Seabaugh,Roger K. Lake	2000	48
13	Structure and lattice dynamics ofGe1−yCyalloys using anharmonic Keating modeling Physical review. B, Condensed matter ·C. Guedj,J. Kolodzey,A. Hairie	1999	8
14	Electrical and optical properties of Ge–implanted 4H–SiC Applied Physics Letters ·Miller Alberto,C. Guedj,J. Kolodzey,R. G. Wilson,C.P. Swann,Chira Vera,John F. Rabolt	1999	29
15	Incorporation of substitutional carbon in Si and SiGe by laser processing in methane and propylene Thin Solid Films ·J. Boulmer,C. Guedj,D. Débarre	1997	3
16	UHV-CVD heteroepitaxial growth of Si1−xGex alloys on Si(100) using silane and germane Thin Solid Films ·Le Thanh Vinh,V. Aubry-Fortuna,Yulin Zheng,D. Bouchier,C. Guedj,Jacobo Reyes Velasco	1997	17
17	Carbon and germanium distributions in Si1−x−yGexCy layers epitaxially grown on Si(001) by RTCVD Thin Solid Films ·C. Guedj,X. Portier,A. Hairie,D. Bouchier,G. Calvarin,B. Piriou	1997	14
18	Bulk and surface structural properties of Si1−x−yGexCy layers processed on Si(001) by pulsed laser induced epitaxy Applied Surface Science ·C. Guedj,J. Boulmer,D. Bouchier,C. Clerc,G. Calvarin,C. Godet,P. Roca i Cabarrocas,Frédéric Houzé,D. Mencaraglia	1996	2
19	Realization of heterostructures by pulsed laser induced epitaxy of C+ implanted pseudomorphic SiGe films and of a-SiGeC: H films deposited on Si(100) Journal of Crystal Growth ·J. Boulmer,P. Boucaud,C. Guedj,D. Débarre,D. Bouchier,E. Finkman,Steven Prawer,K. Nugent,Eric Vero,C. Godet,Pere Roca i Cabarrocas	1995	21
20	Optical properties of bulk and multi-quantum well SiGe: C heterostructures Journal of Crystal Growth ·P. Boucaud,C. Guedj,D. Bouchier,F. H. Julien,Jean–Michel Lourtioz,S. Bodnar,J.L. Regolini,E. Finkman	1995	5

About C. Guedj

C. Guedj is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering, Surfaces, Coatings and Films, Atomic and Molecular Physics, and Optics and Ceramics and Composites, having authored 77 papers that have together received 664 indexed citations. Recurring topics across this work include Semiconductor materials and devices (51 papers), Copper Interconnects and Reliability (29 papers), Semiconductor materials and interfaces (12 papers), Silicon Nanostructures and Photoluminescence (10 papers), Advanced Memory and Neural Computing (9 papers), Integrated Circuits and Semiconductor Failure Analysis (9 papers), 3D IC and TSV technologies (9 papers) and Silicon and Solar Cell Technologies (8 papers). The work is most often cited by research in Electrical and Electronic Engineering (591 citations), Electronic, Optical and Magnetic Materials (132 citations), Surfaces, Coatings and Films (47 citations), Atomic and Molecular Physics, and Optics (177 citations) and Materials Chemistry (210 citations). C. Guedj has collaborated with scholars based in France, Switzerland and United States. Frequent co-authors include J. Kolodzey, E. Martínez, A. Hairie, V. Jousseaume, M. W. Dashiell, P. Calka, G. Audoit, Christophe Licitra, D. Lafond and D. Bouchier. Their work appears in journals such as Journal of Applied Physics, Applied Physics Letters, Microelectronic Engineering, Thin Solid Films and Journal of Crystal Growth.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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